Search Results - "Rossnagel, Stephen M."

Atomic layer deposition of Ge2Sb2Te5 thin films by RITALA, Mikko, PORE, Viljami, HATANPÄÄ, Timo, HEIKKILA, Mikko, LESKELÄ, Markku, MIZOHATA, Kenichiro, SCHROTT, Alejandro, RAOUX, Simone, ROSSNAGEL, Stephen M

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Electrochemical Characterization of Thin Film Electrodes Toward Developing a DNA Transistor by Harrer, Stefan, Ahmed, Shafaat, Afzali-Ardakani, Ali, Luan, Binquan, Waggoner, Philip S, Shao, Xiaoyan, Peng, Hongbo, Goldfarb, Dario L, Martyna, Glenn J, Rossnagel, Stephen M, Deligianni, Lili, Stolovitzky, Gustavo A

“…The DNA-Transistor is a device designed to control the translocation of single-stranded DNA through a solid-state nanopore. Functionality of the device is…”
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Ionic Field Effect Transistors with Sub-10 nm Multiple Nanopores by Nam, Sung-Wook, Rooks, Michael J, Kim, Ki-Bum, Rossnagel, Stephen M

“…We report a new method to fabricate electrode-embedded multiple nanopore structures with sub-10 nm diameter, which is designed for electrofluidic applications…”
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Morphological stability and specific resistivity of sub-10 nm silicide films of Ni1−xPtx on Si substrate by Zhang, Zhen, Zhang, Shi-Li, Yang, Bin, Zhu, Yu, Rossnagel, Stephen M., Gaudet, Simon, Kellock, Andrew J., Jordan-Sweet, Jean, Lavoie, Christian

“…This letter studies the morphological stability and specific resistivity of sub-10 nm silicide films of Ni, Ni0.95Pt0.05, and Ni0.9Pt0.1 formed on Si(100)…”
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Magnetron sputtering by Rossnagel, Stephen M.

“…Magnetron sputtering developed rapidly in the 1980s for semiconductor, hard coating, and architectural glass applications. While the general operating…”
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Numerical simulation of etching and deposition processes by HAMAGUCHI, S, MAYO, A. A, ROSSNAGEL, S. M, KOTECKI, D. E, MILKOVE, K. R, WANG, C, FARRELL, C. E

“…Accurate numerical simulation of microscopic surface topography evolution can facilitate the development of various etching and deposition processes for…”
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Handbook of plasma processing technology: fundamentals, etching, deposition, and surface interactions/ edited by Stephen M. Rossnagel, Jerome J. Cuomo, William D. Westwood by Rossnagel, Stephen M, Cuomo, Jeromo J, Westwood, William D

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Functionalizing a Nanopore with Nano-Electrodes Towards the Control of the Translocation of DNA with Single Base Resolution by Peng, Hongbo, Luan, Binquan, Waggoner, Philip S., Harrer, Stefan, Martyna, Glenn J., Polonsky, Stanislav, Rossnagel, Stephen M., Stolovitzky, Gustavo

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Morphological stability and specific resistivity of sub-10 nm silicide films of Ni 1 − x Pt x on Si substrate by Zhang, Zhen, Zhang, Shi-Li, Yang, Bin, Zhu, Yu, Rossnagel, Stephen M., Gaudet, Simon, Kellock, Andrew J., Jordan-Sweet, Jean, Lavoie, Christian

“…This letter studies the morphological stability and specific resistivity of sub-10 nm silicide films of Ni, Ni 0.95 Pt 0.05 , and Ni 0.9 Pt 0.1 formed on…”
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Morphological stability and specific resistivity of sub-10 nm silicide films of Ni[sub 1 - x]Pt[sub x] on Si substrate by Zhang, Zhen, Shi-Li, Zhang, Bin, Yang, Yu, Zhu, Stephen, M. Rossnagel, Simon, Gaudet, Andrew, J. Kellock, Jean, Jordan-Sweet, Christian, Lavoie

“…This letter studies the morphological stability and specific resistivity of sub-10 nm silicide films of Ni, Ni 0.95 Pt 0.05 , and Ni 0.9 Pt 0.1 formed on…”
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Atomic layer deposition of Ge@@d2@Sb@@d2@Te@@d5@ thin films by Ritala, Mikko, Pore, Viljami, Hatanpaeae, Timo, Heikkilae, Mikko, Leskelae, Markku, Mizohata, Kenichiro, Schrott, Alejandro, Raoux, Simone, Rossnagel, Stephen M

“…Ge@@d2@Sb@@d2@Te@@d5@ (GST) thin films were deposited by Atomic Layer Deposition (ALD) method using a novel alkylsilyl tellurium precursor. Film composition…”
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Atomic layer deposition of Ge 2Sb 2Te 5 thin films by Ritala, Mikko, Pore, Viljami, Hatanpää, Timo, Heikkilä, Mikko, Leskelä, Markku, Mizohata, Kenichiro, Schrott, Alejandro, Raoux, Simone, Rossnagel, Stephen M.

“…Ge 2Sb 2Te 5 (GST) thin films were deposited by Atomic Layer Deposition (ALD) method using a novel alkylsilyl tellurium precursor. Film composition was studied…”
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Directional copper deposition using dc magnetron self-sputtering by Radzimski, Zbigniew J., Posadowski, Witold M., Rossnagel, Stephen M., Shingubara, Shoso

“…A directional copper deposition process has been developed that uses a dc magnetron source operating in self-sputtering mode. The process is performed at 10 −5…”
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Sputtered atom transport processes by Rossnagel, S.M.

“…It is noted that the transport of sputtered atoms can be described in terms of three pressure regimes: low pressure, where no collisions occur during the…”
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Grain growth in copper films exposed to magnetically enhanced plasmas by Naeem, Munir D., Rossnagel, Stephen M., Rajan, Krishna

“…The effects of low‐energy plasma bombardment have been quantified for the first time. The plasma effects on thin copper films (∼50 nm) have been studied by…”
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