Search Results - "Rosner, S.J"

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  1. 1

    The role of threading dislocations in the physical properties of GaN and its alloys by Speck, J.S., Rosner, S.J.

    Published in Physica. B, Condensed matter (01-12-1999)
    “…In this paper, we review progress on understanding the role of threading dislocations (TDs) in the physical properties of GaN and its alloys. A growing body of…”
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    Journal Article
  2. 2

    Failure mode analysis of oxide VCSELs in high humidity and high temperature by Suning Xie, Herrick, R.W., Chamberlin, D., Rosner, S.J., McHugo, S., Girolami, G., Mayonte, M., Seongsin Kim, Widjaja, W.

    Published in Journal of lightwave technology (01-04-2003)
    “…High-speed fiber-optic transceiver modules using parallel optics require that oxide-confined vertical-cavity surface-emitting lasers (VCSELs) be moisture…”
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    Journal Article
  3. 3

    High-efficiency InGaN MQW blue and green LEDs by Lester, S.D, Ludowise, M.J, Killeen, K.P, Perez, B.H, Miller, J.N, Rosner, S.J

    Published in Journal of crystal growth (01-06-1998)
    “…High-efficiency blue and green light-emitting diodes (LEDs) with multiple quantum well (MQW) InGaN active regions have been grown by low-pressure MOCVD on…”
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    Journal Article
  4. 4

    Electrical conduction through compound semiconductor wafer bonded interfaces by Vanderwater, D.A., Kish, F.A., Peansky, M.J., Rosner, S.J.

    Published in Journal of crystal growth (01-04-1997)
    “…The recent introduction of a family of very high-efficiency transparent-substrate (TS) ( Al x Ga 1 −x) 0.5 In 0.5 P GaP LEDs was made possible by the…”
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    Journal Article
  5. 5

    Growth of vertical cavity surface emitting laser material on (3 1 1)B GaAs by MBE by Mars, D.E., Rosner, S.J., Kaneko, Y., Nakagawa, S., Takeuchi, T., Yamada, N.

    Published in Journal of crystal growth (01-05-1997)
    “…We report on the growth of VCSEL structures on (3 1 1)B GaAs substrates. For the growth of AlGaAs and AlAs, the best morphology and material quality were…”
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    Journal Article
  6. 6

    Double-diffused graded SiGe-base bipolar transistors by Vook, D., Kamins, T.I., Burton, G., Vande Voorde, P.J., Wang, H.-H., Coen, R., Lin, J., Pettengill, D.F., Yu, P.-K., Rosner, S.J., Turner, J.E., Laderman, S.S., Horng-Sen Fu, Wang, A.S.

    Published in IEEE transactions on electron devices (01-06-1994)
    “…Self-aligned SiGe/Si bipolar transistors have been fabricated using a single-polysilicon, double-diffused process with the base in a graded SiGe layer to…”
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    Journal Article
  7. 7

    Characterization of p-N Si/sub 1-x/Ge/sub x//Si heterojunctions grown by limited reaction processing by King, C.A., Hoyt, J.L., Gronet, C.M., Gibbons, J.F., Scott, M.P., Rosner, S.J., Reid, G., Laderman, S., Nauka, K., Kamins, T.I.

    Published in IEEE transactions on electron devices (01-12-1988)
    “…p-n Si/sub 1-x/Ge/sub x//Si heterojunction diodes were grown by limited reaction processing (LRP) and fabricated into device structures. Alloy layer…”
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    Journal Article
  8. 8

    A high-speed bipolar technology featuring self-aligned single-poly base and submicrometer emitter contacts by Huang, W.M., Drowley, C.I., Vande Voorde, P.J., Pettengill, D., Turner, J.E., Kapoor, A.K., Lin, C.-H., Burton, G., Rosner, S.J., Brigham, K., Fu, H.-S., Oh, S.-Y., Scott, M.P., Chiang, S.-Y., Wang, A.

    Published in IEEE electron device letters (01-09-1990)
    “…An experimental bipolar transistor structure with self-aligned base-emitter contacts formed using one polysilicon layer is presented with geometries and…”
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    Journal Article
  9. 9
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  11. 11

    STRIPE-a high-speed VLSI bipolar technology featuring self-aligned single-poly base and submicron emitter contacts by Drowley, C.I., Huang, W.M., Vande Voorde, P.J., Pettengill, D., Turner, J.E., Kapoor, A.K., Lin, C.-H., Burton, G., Rosner, S.J., Brigham, K., Fu, H.-S., Oh, S.-Y., Scott, M.P., Chiang, S.-Y., Wang, A.

    “…Experimental results are presented for a high-performance silicon bipolar transistor structure utilizing a single layer of polysilicon for both the base and…”
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    Conference Proceeding
  12. 12

    Interface control in double diffused polysilicon bipolar transistors by Turner, J.E., Coen, D., Burton, G., Kapoor, A., Rosner, S.J., Johnson, W.

    “…The properties of the polysilicon/silicon interface which contribute to variations in DC performance of bipolar transistors are investigated. Measurements of…”
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    Conference Proceeding
  13. 13

    High frequency Si/Si/sub 1-x/Ge/sub x/ heterojunction bipolar transistors by Kamins, T.I., Nauka, K., Camnitz, L.H., Kruger, J.B., Turner, J.E., Rosner, S.J., Scott, M.P., Hoyt, J.L., King, C.A., Noble, D.B., Gibbons, J.F.

    “…Small-geometry, high-performance Si-Si/sub 1-x/Ge/sub x/ heterojunction bipolar transistors have been fabricated using chemical vapor deposition to form the…”
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    Conference Proceeding
  14. 14

    Si/Si/sub 1-x/Ge/sub x/ heterojunction bipolar transistors fabricated by limited reaction processing by Gibbons, J.F., King, C.A., Hoyt, J.L., Noble, D.B., Gronet, C.M., Scott, M.P., Rosner, S.J., Reid, G., Laderman, S., Nauka, K., Turner, J.

    “…The DC performance of Si/Si/sub 1-x/Ge heterojunction bipolar transistors (HBTs) fabricated from epitaxial layers grown by limited reaction processing is…”
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    Conference Proceeding
  15. 15

    Wafer bonding of InP and GaAs: interface characterization and device applications by Yang, L., Carey, K., Ludowise, M., Perez, W., Mars, D.E., Fouquet, J.E., Nauka, K., Rosner, S.J., Ram, R.J., Dudley, J.J., Babic, D.I., Bowers, J.

    “…Wafer bonding is a technique used to form a single hybrid solid from dissimilar materials by rearrangement of surface bonds. While the bonding of…”
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    Conference Proceeding