Search Results - "Roozeboom, F"

Spatial Atomic Layer Deposition of Zinc Oxide Thin Films by Illiberi, A, Roozeboom, F, Poodt, P

“…Zinc oxide thin films have been deposited at high growth rates (up to ∼1 nm/s) by spatial atomic layer deposition technique at atmospheric pressure. Water has…”
Get full text

3-D Integrated All-Solid-State Rechargeable Batteries by Notten, P. H. L., Roozeboom, F., Niessen, R. A. H., Baggetto, L.

“…Portable society urgently calls for integrated energy supplies. This holds for autonomous devices but even more so for future medical implants. Evidently,…”
Get full text

Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO 2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy by Mione, M A, Vandalon, V, Mameli, A, Kessels, W M M, Roozeboom, F

“…An atmospheric-pressure plasma-enhanced spatial atomic layer deposition (PE-s-ALD) process for SiO using bisdiethylaminosilane (BDEAS, SiH [NEt ] ) and O…”
Get full text

Atmospheric-Pressure Plasma-Enhanced Spatial ALD of SiO2 Studied by Gas-Phase Infrared and Optical Emission Spectroscopy by Mione, M. A, Vandalon, V, Mameli, A, Kessels, W. M. M, Roozeboom, F

“…An atmospheric-pressure plasma-enhanced spatial atomic layer deposition (PE-s-ALD) process for SiO2 using bisdiethylaminosilane (BDEAS, SiH2[NEt2]2) and O2…”
Get full text

Isotropic Atomic Layer Etching of ZnO Using Acetylacetone and O 2 Plasma by Mameli, A, Verheijen, M A, Mackus, A J M, Kessels, W M M, Roozeboom, F

“…Atomic layer etching (ALE) provides Ångström-level control over material removal and holds potential for addressing the challenges in nanomanufacturing faced…”
Get full text

Spatial atmospheric atomic layer deposition of InxGayZnzO for thin film transistors by Illiberi, A, Cobb, B, Sharma, A, Grehl, T, Brongersma, H, Roozeboom, F, Gelinck, G, Poodt, P

“…We have investigated the nucleation and growth of InGaZnO thin films by spatial atmospheric atomic layer deposition. Diethyl zinc (DEZ), trimethyl indium…”
Get full text

Infrared and optical emission spectroscopy study of atmospheric pressure plasma-enhanced spatial ALD of Al2O3 by Mione, M. A., Engeln, R., Vandalon, V., Kessels, W. M. M., Roozeboom, F.

“…Atmospheric-pressure Plasma-Enhanced spatial Atomic Layer Deposition (PE-s-ALD) is a high-throughput technique for synthesizing thin films at low temperatures…”
Get full text

Enhanced Doping Efficiency of Al-Doped ZnO by Atomic Layer Deposition Using Dimethylaluminum Isopropoxide as an Alternative Aluminum Precursor by Wu, Y, Potts, S. E, Hermkens, P. M, Knoops, H. C. M, Roozeboom, F, Kessels, W. M. M

“…Atomic layer deposition offers the unique opportunity to control, at the atomic level, the 3D distribution of dopants in highly uniform and conformal thin…”
Get full text

The kinetics of low-temperature spatial atomic layer deposition of aluminum oxide by Poodt, P., Illiberi, A., Roozeboom, F.

“…Spatial atomic layer deposition can be used as a high-throughput manufacturing technique in functional thin film deposition for applications such as flexible…”
Get full text

Ultrahigh Capacitance Density for Multiple ALD-Grown MIM Capacitor Stacks in 3-D Silicon by Klootwijk, J.H., Jinesh, K.B., Dekkers, W., Verhoeven, J.F., van den Heuvel, F.C., Kim, H.-D., Blin, D., Verheijen, M.A., Weemaes, R., Kaiser, M., Ruigrok, J., Roozeboom, F.

“…ldquoTrenchrdquo capacitors containing multiple metal-insulator-metal (MIM) layer stacks are realized by atomic-layer deposition (ALD), yielding an ultrahigh…”
Get full text

Isotropic Atomic Layer Etching of ZnO Using Acetylacetone and O2 Plasma by Mameli, A, Verheijen, M. A, Mackus, A. J. M, Kessels, W. M. M, Roozeboom, F

“…Atomic layer etching (ALE) provides Ångström-level control over material removal and holds potential for addressing the challenges in nanomanufacturing faced…”
Get full text

Encapsulation method for atom probe tomography analysis of nanoparticles by Larson, D.J., Giddings, A.D., Wu, Y., Verheijen, M.A., Prosa, T.J., Roozeboom, F., Rice, K.P., Kessels, W.M.M., Geiser, B.P., Kelly, T.F.

“…Open-space nanomaterials are a widespread class of technologically important materials that are generally incompatible with analysis by atom probe tomography…”
Get full text

Anti-stiction coating for mechanically tunable photonic crystal devices by Petruzzella, M, Zobenica, Ž, Cotrufo, M, Zardetto, V, Mameli, A, Pagliano, F, Koelling, S, van Otten, F W M, Roozeboom, F, Kessels, W M M, van der Heijden, R W, Fiore, A

“…A method to avoid the stiction failure in nano-electro-opto-mechanical systems has been demonstrated by coating the system with an anti-stiction layer of Al O…”
Get full text

Spatially separated atomic layer deposition of Al2O3, a new option for high-throughput Si solar cell passivation by Vermang, B., Rothschild, A., Racz, A., John, J., Poortmans, J., Mertens, R., Poodt, P., Tiba, V., Roozeboom, F.

“…A next generation material for surface passivation of crystalline Si is Al2O3. It has been shown that both thermal and plasma‐assisted (PA) atomic layer…”
Get full text

Energetics of Self-Interstitial Clusters in Si by Cowern, N. E. B., Mannino, G., Stolk, P. A., Roozeboom, F., Huizing, H. G. A., van Berkum, J. G. M., Cristiano, F., Claverie, A., Jaraíz, M.

Get full text

MIM in 3D: Dream or reality? (invited) by Klootwijk, J.H., Jinesh, K.B., Roozeboom, F.

“…[Display omitted] ► 3D structures for higher capacitance density. ► Multi layer capacitors in 3D. ► ALD in 3D. ► Adaptation of ALD for compensating Knudsen…”
Get full text

Spatial Atmospheric Atomic Layer Deposition of In x Ga y Zn z O for Thin Film Transistors by Illiberi, A, Cobb, B, Sharma, A, Grehl, T, Brongersma, H, Roozeboom, F, Gelinck, G, Poodt, P

“…We have investigated the nucleation and growth of InGaZnO thin films by spatial atmospheric atomic layer deposition. Diethyl zinc (DEZ), trimethyl indium…”
Get full text

Influence of stoichiometry on the performance of MIM capacitors from plasma-assisted ALD SrxTiyOz films by Aslam, N., Longo, V., Keuning, W., Roozeboom, F., Kessels, W. M. M., Waser, R., Hoffmann-Eifert, S.

“…Strontium titanate, SrxTiyOz (STO), thin films with various cation stoichiometries were deposited by plasma‐assisted atomic layer deposition (ALD) using…”
Get full text

Groups III and V impurity solubilities in silicon due to laser, flash,and solid-phase-epitaxial-regrowth anneals by Duffy, R., Dao, T., Tamminga, Y., van der Tak, K., Roozeboom, F., Augendre, E.

“…In this work the authors studied impurity solubilities of groups III and V elements in silicon resulting from laser anneal, flash anneal, and…”
Get full text

Passive and heterogeneous integration towards a Si-based System-in-Package concept by Roozeboom, F., Kemmeren, A.L.A.M., Verhoeven, J.F.C., van den Heuvel, F.C., Klootwijk, J., Kretschman, H., Frič, T., van Grunsven, E.C.E., Bardy, S., Bunel, C., Chevrie, D., LeCornec, F., Ledain, S., Murray, F., Philippe, P.

“…Recently Philips launched their first highly integrated cellular RF-transceiver systems using a new Si-based System-in-Package (SiP) technology. This…”
Get full text