Industrialization of a laser produced plasma EUV light source for lithography

ASML is committed to develop high power EUV source technology for use in EUV lithography for high-volume-manufacturing (HVM) of semiconductors. A stable dose controlled Laser-Produced-Plasma (LPP) EUV source has been successfully developed and introduced using a CO2 laser and small tin (Sn) droplets...

Full description

Bibliographic Details

Published in:	2017 Conference on Lasers and Electro-Optics (CLEO) p. 1
Main Authors:	Fomenkov, I., Schafgans, A., Rokitski, S., Kats, M., Stewart, J., LaForge, A., Ershov, A., Purvis, M., Tao, Y., Vargas, M., Grava, J., Das, P., Urbanski, L., Rafac, R., Lukens, J., Rajyaguru, C., Vaschenko, G., Abraham, M., Brandt, D.
Format:	Conference Proceeding
Language:	English
Published:	The Optical Society 01-05-2017
Subjects:	Laser applications Power lasers Semiconductor lasers Tin Ultraviolet sources X-ray lasers
Online Access:	Get full text
Tags:	Add Tag No Tags, Be the first to tag this record!