Search Results - "Richley, James C"

Boron Incorporation at a Diamond Surface: A QM/MM Study of Insertion and Migration Pathways during Chemical Vapor Deposition by Richley, James C, Harvey, Jeremy N, Ashfold, Michael N. R

“…Quantum mechanical and hybrid quantum mechanical/molecular mechanical (QM/MM) cluster models have been used to investigate the energetics of (i) B atom and BH…”
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Optical Emission from Microwave Activated C/H/O Gas Mixtures for Diamond Chemical Vapor Deposition by Richley, James C, Kelly, Mark W, Ashfold, Michael N. R, Mankelevich, Yuri A

“…The spatial distributions and relative abundances of electronically excited H atoms, OH, CH, C2 and C3 radicals, and CO molecules in microwave (MW) activated…”
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On the Role of Carbon Radical Insertion Reactions in the Growth of Diamond by Chemical Vapor Deposition Methods by Richley, James C, Harvey, Jeremy N, Ashfold, Michael N. R

“…Potential energy profiles for the insertion of gas phase C atoms, and CH, CH2, C2, C2H, and C3 radicals, into C−H and C−C bonds on a 2 × 1 reconstructed,…”
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Boron doping: B/H/C/O gas-phase chemistry; H atom density dependences on pressure and wire temperature; puzzles regarding the gas-surface mechanism by Mankelevich, Yuri A., Ashfold, Michael N.R., Comerford, Dane W., Ma, Jie, Richley, James C.

“…Experimental and modeling studies of the gas-phase chemistry occurring in dilute, hot filament (HF) activated B 2H 6/CH 4/H 2 gas mixtures appropriate for…”
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Comparison of Simultaneous Shock Temperature Measurements from Three Different Pyrometry Systems by Ota, Thomas A., Amott, Russell, Carlson, C. A., Chapman, David J., Collinson, Mark A., Corrow, R. B., Eakins, Daniel E., Graves, T. E., Hartsfield, T. M., Holtkamp, David B., Iverson, A. J., Richley, James C., Stone, J. B.

“…Pyrometry is one of the most prevalent techniques for measuring temperature in shock physics experiments. However, the challenges of applying pyrometry in such…”
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Exploring the Plasma Chemistry in Microwave Chemical Vapor Deposition of Diamond from C/H/O Gas Mixtures by Kelly, Mark W, Richley, James C, Western, Colin M, Ashfold, Michael N. R, Mankelevich, Yuri A

“…Microwave (MW)-activated CH4/CO2/H2 gas mixtures operating under conditions relevant to diamond chemical vapor deposition (i.e., X C/Σ = X elem(C)/(X elem(C) +…”
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Spectroscopic and Modeling Investigations of the Gas Phase Chemistry and Composition in Microwave Plasma Activated B2H6/CH4/Ar/H2 Mixtures by Ma, Jie, Richley, James C, Davies, David R. W, Ashfold, Michael N. R, Mankelevich, Yuri A

“…A comprehensive study of microwave (MW) activated B2H6/CH4/Ar/H2 plasmas used for the chemical vapor deposition of B-doped diamond is reported. Absolute column…”
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Spectroscopic and Modeling Investigations of the Gas-Phase Chemistry and Composition in Microwave Plasma Activated B2H6/Ar/H2 Mixtures by Ma, Jie, Richley, James C, Davies, David R. W, Cheesman, Andrew, Ashfold, Michael N. R, Mankelevich, Yuri A

“…This paper describes a three-pronged study of microwave (MW) activated B2H6/Ar/H2 plasmas as a precursor to diagnosis of the B2H6/CH4/Ar/H2 plasmas used for…”
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CH 2 Group Migration between H-Terminated 2 × 1 Reconstructed {100} and {111} Surfaces of Diamond by Richley, James C., Harvey, Jeremy N., Ashfold, Michael N. R.

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CH2 Group Migration between H-Terminated 2 × 1 Reconstructed {100} and {111} Surfaces of Diamond by Richley, James C, Harvey, Jeremy N, Ashfold, Michael N. R

“…Successful growth of diamond by chemical vapor deposition requires that chemisorbed hydrocarbon species, most notably CH2 groups, are able to migrate on the…”
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Spectroscopic and Modeling Investigations of the Gas Phase Chemistry and Composition in Microwave Plasma Activated B 2 H 6 /CH 4 /Ar/H 2 Mixtures by Ma, Jie, Richley, James C., Davies, David R. W., Ashfold, Michael N. R., Mankelevich, Yuri A.

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Spectroscopic and Modeling Investigations of the Gas-Phase Chemistry and Composition in Microwave Plasma Activated B 2 H 6 /Ar/H 2 Mixtures by Ma, Jie, Richley, James C., Davies, David R. W., Cheesman, Andrew, Ashfold, Michael N. R., Mankelevich, Yuri A.

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Boron doping: B/H/C/O gas-phase chemistry; H atom density dependences on pressure and wire temperature; puzzles regarding the gas-surface mechanism by MANKELEVICH, Yuri A, ASHFOLD, Michael N. R, COMERFORD, Dane W, JIE MA, RICHLEY, James C

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