Search Results - "Rice, Bryan J."

The limits of CD metrology by Rice, Bryan J., Cao, Heidi, Grumski, Michael, Roberts, Jeanette

“…One of the many technology decisions facing the semiconductor industry for the 32 nm node (and beyond) is the selection of the best critical dimension (CD)…”
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Exposing extreme ultraviolet lithography at Intel by Roberts, Jeanette, Bacuita, Terence, Bristol, Robert L., Cao, Heidi, Chandhok, Manish, Lee, Sang H., Leeson, Michael, Liang, Ted, Panning, Eric, Rice, Bryan J., Shah, Uday, Shell, Melissa, Yueh, Wang, Zhang, Guojing

“…In this paper we present the latest results on developing and integrating extreme ultraviolet lithography (EUVL) at Intel. The world’s first commercial EUV…”
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Value-Added Metrology by Bunday, B., Allgair, J., Caldwell, M., Solecky, E., Archie, C., Rice, B., Singh, B., Cain, J., Emami, I.

“…The conventional premise, long-touted among the semiconductor processing community, that metrology is a ldquonon-value-added necessary evil,rdquo is a…”
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Phenomenology of ArF photoresist shrinkage trends by Bunday, Benjamin, Cordes, Aaron, Allgair, John, Piscani, Emil, Rice, Bryan J., Avitan, Yohanan, Peltinov, Ram, Adan, Ofer

“…This paper focuses on ArF and iArF photoresist shrinkage. We evaluate the shrinkage magnitude on both R&D resists and mature resists as a function of chemical…”
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