Search Results - "Resnick, Doug"

Lithography by Neisser, Mark, Levinson, Harry J., Wurm, Stefan, Kyser, David, Watanabe, Takeo, Macwilliams, Ken, Ishiuchi, Hidemi, Trybula, Walt, Hayashi, Naoya, Fedynyshyn, Ted, Higgins, Craig, Nakamura, Tsuyoshi, Resnick, Doug, Preil, Moshe, Lercel, Michael, Aoyama, Hajime, Hosler, Erik

“…Historically, improvements in lithography have enabled improved chip technologies. The International Roadmap for Devices and Systems (IRDS) Lithography roadmap…”
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Extendibility of x‐ray lithography to ⩽130 nm ground rules in complex integrated circuit patterns by Hector, Scott, Chu, William, Thompson, Matthew, Pol, Victor, Dauksher, Bill, Cummings, Kevin, Resnick, Doug, Pendharkar, Sandeep, Maldonado, Juan, McCord, Mark, Krasnoperova, Azalia, Liebmann, Lars, Silverman, Jerry, Guo, Jerry, Khan, Mumit, Bollepalli, Srinivas, Capodieci, Luigi, Cerrina, Franco

“…Previous experimental and theoretical evidence indicates that x‐ray lithography can be used to pattern ≤180 nm features. In order to be used in manufacturing,…”
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Proceedings of the Symposium and Summer School on: Nano and Giga Challenges in Microelectronics Research and Opportunities in Russia by ARONZON, Boris, DEMKOV, Alex, GOLANT, Konstantin, GREER, Jim, GUSEV, Evgeni, KORKIN, Anatoli, LABANOWSKI, Jan, RESNICK, Doug

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New developments in S-FIL technology by Watts, M.P.C., Miller, M., Stacey, N., Choi, J., Subramanian, M., Schumaker, P., McMackin, I., Jin Choi, Resnick, D., Sreenivasan, S.V., Falcon, M.

“…The Step and Flash/spl trade/ Imprint Lithography (S-FIL/spl trade/) process has been developed around a low viscosity, UV curable monomer that allows…”
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