Search Results - "Rennon, S."
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1
Selective growth of InP on focused-ion-beam-modified GaAs surface by hydride vapor phase epitaxy
Published in Applied physics letters (17-09-2001)“…The growth of InP islands on a planar focused-ion-beam (FIB)-modified (001) GaAs substrate was investigated in a hydride vapor phase epitaxy system. InP grew…”
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Journal Article -
2
Complex coupled distributed-feedback and Bragg-reflector lasers for monolithic device integration based on focused-ion-beam technology
Published in IEEE journal of selected topics in quantum electronics (01-03-2001)“…Complex coupled distributed feedback (CC-DFB) and distributed Bragg-reflector (DBR) GaInAsP-InP lasers were fabricated by focused-ion-beam lithography. Due to…”
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Journal Article -
3
Laterally coupled DBR laser emitting at 1.55 μm fabricated by focused ion beam lithography
Published in IEEE photonics technology letters (01-08-2002)“…By using focused ion beam lithography high performance 1.55-μm emitting distributed Bragg reflector lasers were realized suitable for high-speed optical…”
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Journal Article -
4
High-frequency properties of 1.55 μm laterally complex coupled distributed feedback lasers fabricated by focused-ion-beam lithography
Published in Applied physics letters (17-07-2000)“…Laterally complex coupled distributed feedback lasers have been fabricated by focused-ion-beam lithography on completely grown InGaAsP/InP laser structures…”
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Journal Article -
5
1.55 μm single mode lasers with complex coupled distributed feedback gratings fabricated by focused ion beam implantation
Published in Applied physics letters (13-09-1999)“…Complex coupled GaInAsP/InP distributed feedback lasers were developed based on maskless focused ion beam lithography. By combining implantation enhanced wet…”
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Journal Article -
6
Grazing-incidence diffraction strain analysis of a laterally-modulated multiquantum well system produced by focused-ion-beam implantation
Published in Applied physics letters (25-12-2000)“…Focused Ga+ ion beam implantation was used to define a laterally periodic modulation of the electronic band gap in a GaAs/Ga0.97In0.03As/Al0.2Ga0.8As/GaAs…”
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Journal Article -
7
Nanoscale patterning by focused ion beam enhanced etching for optoelectronic device fabrication
Published in Microelectronic engineering (01-09-2001)“…A technique for highly resolved maskless patterning is obtained by combining focused ion beam lithography with wet chemical etching. When exposing InP to a…”
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Journal Article Conference Proceeding -
8
Reactive ion etching of deeply etched DBR-structures with reduced air-gaps for highly reflective monolithically integrated laser mirrors
Published in Microelectronic engineering (01-09-2001)“…An electron cyclotron resonance reactive ion etching process is investigated for the fabrication of third order deeply etched distributed Bragg reflectors…”
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Journal Article Conference Proceeding -
9
Edge-emitting microlasers with one active layer of quantum dots
Published in IEEE journal of selected topics in quantum electronics (01-03-2001)“…High performance edge-emitting microlasers with deeply etched distributed Bragg reflectors (DBRs) were fabricated on an AlGaAs-GaAs laser structure with a…”
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Journal Article -
10
Monolithic integration of laterally complex coupled DFB lasers with passive waveguides by positive wavelength detuning
Published in Conference Digest. 2000 IEEE 17th International Semiconductor Laser Conference. (Cat. No.00CH37092) (2000)“…We have fabricated single mode lasers with lateral gratings by focused ion beam lithography. The transmission of the DFB mode through a passive unpumped…”
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Conference Proceeding -
11
Ultrashort quantum dot microlasers
Published in LEOS 2000. 2000 IEEE Annual Meeting Conference Proceedings. 13th Annual Meeting. IEEE Lasers and Electro-Optics Society 2000 Annual Meeting (Cat. No.00CH37080) (2000)“…We have fabricated high performance ultrashort quantum dot microlasers based on deeply etched distributed Bragg reflector (DBR) mirrors with cavity lengths…”
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Conference Proceeding -
12
Edge-emitting microlasers with a single quantum dot active layer
Published in Conference Digest. 2000 IEEE 17th International Semiconductor Laser Conference. (Cat. No.00CH37092) (2000)“…We have realized edge emitting microlasers on a GaInAs-AlGaAs quantum dot laser structure with deeply etched DBR mirrors. Lasers with 40 /spl mu/m cavity…”
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Conference Proceeding -
13
Laterally coupled DBR laser emitting at 1.55 [mu]m fabricated by focused ion beam lithography
Published in IEEE photonics technology letters (01-08-2002)Get full text
Journal Article -
14
Laterally coupled DBR laser emitting at 1.55 micron fabricated by focused ion beam lithography
Published in IEEE photonics technology letters (01-08-2002)“…By using focused ion beam lithography high performance 1.55-micron emitting distributed Bragg reflector lasers suitable for high-speed optical…”
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Journal Article -
15
Laterally coupled DBR laser emitting at 1.55 mum fabricated by focused ion beam lithography
Published in IEEE photonics technology letters (01-08-2002)“…By using focused ion beam lithography high performance 1.55-mum emitting distributed Bragg reflector lasers were realized suitable for high-speed optical…”
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Journal Article -
16
Complex coupled 1.55 /spl mu/m DFB-lasers based on focused ion beam enhanced wet chemical etching and quantum well intermixing
Published in Conference Proceedings. Eleventh International Conference on Indium Phosphide and Related Materials (IPRM'99) (Cat. No.99CH36362) (1999)“…A simplified method for the fabrication of complex coupled gratings for distributed feedback lasers was developed for 1.55 /spl mu/m wavelength applications…”
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Conference Proceeding -
17
Quantum-dot microlasers as high-speed light sources for monolithic integration
Published in Proceedings 27th European Conference on Optical Communication (Cat. No.01TH8551) (2001)“…Short cavity lasers based on deeply etched Bragg-mirrors were fabricated on GaInAs/AlGaAs lasers structures with self-organised GaInAs quantum-dots as active…”
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Conference Proceeding