Search Results - "Raval, Mehul C."
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Characterization of electroless nickel as a seed layer for silicon solar cell metallization
Published in Bulletin of materials science (01-02-2015)“…Electroless nickel plating is a suitable method for seed layer deposition in Ni–Cu-based solar cell metallization. Nickel silicide formation and hence contact…”
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Journal Article -
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Impact of Post-deposition Plasma Treatment on Surface Passivation Quality of Silicon Nitride Films
Published in IEEE journal of photovoltaics (01-01-2016)“…Exposing a plasma-enhanced chemical vapor deposition-deposited silicon nitride (SiNx) film to an inert gasoxidizing plasma ambient results in a significant…”
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Journal Article -
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Study of Nickel Silicide Formation and Associated Fill-Factor Loss Analysis for Silicon Solar Cells With Plated Ni-Cu Based Metallization
Published in IEEE journal of photovoltaics (01-11-2015)“…In this study, the impact of impurities incorporated into plated nickel seed layer on silicide formation and the influence of annealing temperature on the…”
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Journal Article -
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Novel PV module cleaning system using ambient moisture and self-cleaning coating
Published in 2013 IEEE 39th Photovoltaic Specialists Conference (PVSC) (01-06-2013)“…Soiling is a major concern for PV modules installed in field with power losses ranging from 15% to 65%. In current work, we propose an improved design for a PV…”
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Conference Proceeding -
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Analyzing impact of background plating from alkaline Ni bath for Ni-Cu metallization
Published in 2013 IEEE 39th Photovoltaic Specialists Conference (PVSC) (01-06-2013)“…Ni-Cu based front contacts for c-Si cells are plated on patterned SiN x and there could be undesirable background plating leading to shading and shunting…”
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Conference Proceeding -
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Inductively Coupled Plasma Atomic Emission Spectroscopy: A bulk analysis and process monitoring technique for silicon solar cell fabrication
Published in 2013 IEEE 39th Photovoltaic Specialists Conference (PVSC) (01-06-2013)“…We report on the investigation of Inductively Coupled Plasma Atomic Emission Spectroscopy (ICP AES), a trace element analysis technique, as a bulk impurity…”
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Conference Proceeding -
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N2O plasma treatment for minimization of background plating in silicon solar cells with Ni–Cu front side metallization
Published in Solar energy materials and solar cells (01-01-2016)“…In this paper we demonstrate that an additional nitrous oxide (N2O) plasma treatment step after the regular SiNx:H anti-reflective coating (ARC) deposition…”
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Journal Article