Search Results - "Ramirez, Alma Vela"

Lipid-Functionalized Single-Walled Carbon Nanotubes as Probes for Screening Cell Wall Disruptors by Kallmyer, Nathaniel E., Agarwal, Sparsh, Eeg, Danielle, Khor, Rachel, Roby, Nathan, Vela Ramirez, Alma, Hillier, Andrew C., Reuel, Nigel F.

“…Membrane-active molecules are of great importance to drug delivery and antimicrobials applications. While the ability to prototype new membrane-active…”
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Solution-Processed Bismuth Halide Perovskite Thin Films: Influence of Deposition Conditions and A‑Site Alloying on Morphology and Optical Properties by Hamdeh, Umar H, Ryan, Bradley J, Nelson, Rainie D, Zembrzuski, Michael, Slobidsky, Jonathan, Prince, Kevin J, Cleveland, Iver, Vela-Ramirez, Alma, Hillier, Andrew C, Panthani, Matthew G

“…Bismuth-based halide perovskites have been proposed as a potential nontoxic alternative to lead halide perovskites; however, they have not realized suitable…”
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Wet Etch Recipe Optimization for Enabling RMG Multi Vt Scheme by Ramirez, Alma Vela, Sankarapandian, M., Bao, Ruqiang, Parkin, William, Makoto, Takaoka, Takuya, Kishimoto

“…Three chemistries are compared on metal oxide films to facilitate a stable and repeatable wet etching process to be used in the replacement metal gate module…”
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Creating Two-Dimensional Quasicrystal, Supercell, and Moiré Lattices with Laser Interference Lithography: Implications for Photonic Bandgap Materials by Mahmood, Russell, Ramirez, Alma Vela, Hillier, Andrew C

“…We extend the patterning capability of laser interference lithography (LIL) to fabricate complex two-dimensional quasicrystal lattices, superlattices, and…”
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Synthesis and Fabrication of Nanostructured Materials and Surfaces by Vela Ramirez, Alma M

“…This dissertation can be divided into 2 sections: 1. employing a laser interference lithographic technique to fabricate nanostructured surfaces for…”
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ScCO2 Drying for Preventing Pattern Collapse in Advanced Logic Device Structures by Sankarapandian, M., Lo, Wei-Shang, Ramirez, Alma Vela, Flores, Nash, Liu, Xuan, Yamanaka, Reijiro, Inoue, Saya, Shimomura, Shinichiro, Iwanaga, Koji

“…Supercritical CO 2 (ScCO 2 ) drying has been demonstrated to prevent pattern collapse causing Line Flop-over (LF) during post gate reactive ion etching (RIE)…”
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