Search Results - "Ram, Mamidala Saketh"
-
1
Low-frequency Noise in Vertical InAs/InGaAs Gate-all-around MOSFETs at 15 K for Cryogenic Applications
Published in IEEE electron device letters (01-12-2022)“…Low-frequency noise (LFN), or 1/ f -noise, can be used effectively to evaluate device reliability which is a major concern in analog as well as digital…”
Get full text
Journal Article -
2
Tuning oxygen vacancies and resistive switching properties in ultra-thin HfO2 RRAM via TiN bottom electrode and interface engineering
Published in Applied surface science (15-06-2021)“…[Display omitted] •Two OxRRAM stacks -TiN bottom metal electrode were fabricated by PVD and ALD.•The HfOx layer in HfOx/PVD-TiN is found to be more oxygen…”
Get full text
Journal Article -
3
Effects of Interface Oxidation on Noise Properties and Performance in III–V Vertical Nanowire Memristors
Published in ACS applied materials & interfaces (19-04-2023)“…Memristors implemented as resistive random-access memories (RRAMs) owing to their low power consumption, scalability, and speed are promising candidates for…”
Get full text
Journal Article -
4
Low-Power Resistive Memory Integrated on III-V Vertical Nanowire MOSFETs on Silicon
Published in IEEE electron device letters (01-09-2020)“…III-V vertical nanowire MOSFETs (VNW-FETs) have the potential to extend Moore's law owing to their excellent material properties. To integrate highly scaled…”
Get full text
Journal Article -
5
Performance, Analysis, and Modeling of III-V Vertical Nanowire MOSFETs on Si at Higher Voltages
Published in IEEE transactions on electron devices (01-06-2022)“…Heterostructure engineering in III-V vertical nanowire (VNW) MOSFETs enables tuning of transconductance and breakdown voltage. In this work, an In x…”
Get full text
Journal Article -
6
Ultra-Scaled AlOx Diffusion Barriers for Multibit HfOx RRAM Operation
Published in IEEE journal of the Electron Devices Society (01-01-2021)“…For dense very large scale integration (VLSI) of high performance, multibit resistive memory (RRAM), scalability of material dimensions, as well as the…”
Get full text
Journal Article -
7
Cross‐Point Arrays with Low‐Power ITO‐HfO2 Resistive Memory Cells Integrated on Vertical III‐V Nanowires
Published in Advanced electronic materials (01-06-2020)“…Vertical nanowires with cointegrated metal‐oxide‐semiconductor field‐effect‐transistor (MOSFET) selectors and nonvolatile resistive random access memory (RRAM)…”
Get full text
Journal Article -
8
Self-Heating in Gate-All-Around Vertical III-V InAs/InGaAs MOSFETs
Published in IEEE electron device letters (01-07-2023)“…We investigate self-heating in vertical, gate-all-around III-V InAs/InGaAs nanowire MOSFETs using pulsed IV measurements at various temperatures. Low…”
Get full text
Journal Article -
9
Increased Breakdown Voltage in Vertical Heterostructure III-V Nanowire MOSFETs With a Field Plate
Published in IEEE electron device letters (01-11-2021)“…Vertical III-V heterostructure MOSFETs exhibit outstanding performance at reduced supply voltages. In this letter, we report on a novel process of extending…”
Get full text
Journal Article -
10
Submicrometer Top-Gate Self-Aligned a-IGZO TFTs by Substrate Conformal Imprint Lithography
Published in IEEE transactions on electron devices (01-04-2019)“…Thin-film transistors (TFTs) are the fundamental building blocks of today's display industry. To achieve higher drive currents and device density, it is…”
Get full text
Journal Article -
11
High-density logic-in-memory devices using vertical indium arsenide nanowires on silicon
Published in Nature electronics (21-12-2021)“…In-memory computing can be used to overcome the von Neumann bottleneck—the need to shuffle data between separate memory and computational units—and help…”
Get full text
Journal Article -
12
Single Grain Boundary Tunnel Field Effect Transistors on Recrystallized Polycrystalline Silicon: Proposal and Investigation
Published in IEEE electron device letters (01-10-2014)“…A single grain boundary tunnel field effect transistor (TFET) on recrystallized polycrystalline silicon is reported in this letter. By varying the position of…”
Get full text
Journal Article -
13
Controlling Filament Stability in Scaled Oxides (3 nm) for High Endurance (>106) Low Voltage ITO/HfO2 RRAMs for Future 3D Integration
Published in 2021 Device Research Conference (DRC) (20-06-2021)“…Non-volatile resistive-random-access-memories (RRAMs), which are highly scalable, cost-efficient and fast, are needed to meet the future computational needs…”
Get full text
Conference Proceeding -
14
The Effect of Deposition Conditions on Heterointerface‐Driven Band Alignment and Resistive Switching Properties
Published in Advanced electronic materials (01-11-2022)“…Titanium nitride and hafnium oxide stack have been widely used in various resistive memory elements since the materials are…”
Get full text
Journal Article -
15
Single Grain Boundary Dopingless PNPN Tunnel FET on Recrystallized Polysilicon: Proposal and Theoretical Analysis
Published in IEEE journal of the Electron Devices Society (01-05-2015)“…A single grain boundary dopingless PNPN tunnel field effect transistor (TFET) on recrystallized polycrystalline silicon is studied by varying the position of…”
Get full text
Journal Article -
16
Performance Investigation of Single Grain Boundary Junctionless Field Effect Transistor
Published in IEEE journal of the Electron Devices Society (01-11-2016)“…In this paper, we report a single grain boundary (GB) junctionless thin film transistor (JLFET) on recrystallized polycrystalline silicon (poly-Si JLFET)…”
Get full text
Journal Article -
17
Investigation of Reverse Filament Formation in ITO/HfO2-based RRAM
Published in 2019 Device Research Conference (DRC) (01-06-2019)“…To overcome the large discrepancy in speed between computational devices and that of contemporary large capacity non-volatile memory (NVM) technologies,…”
Get full text
Conference Proceeding -
18
A 4F2 Vertical Gate-all-around Nanowire Compute-in-memory Device Integrated in (1T1R) Cross-Point Arrays on Silicon
Published in 2022 IEEE Silicon Nanoelectronics Workshop (SNW) (11-06-2022)“…Complete 4F2 vertical nanowire (VNW) 1T1R cells with 10 6 cycles switching endurance and with a demonstrated capability of performing Boolean logic are…”
Get full text
Conference Proceeding -
19
Ultra-Scaled AlO x Diffusion Barriers for Multibit HfO x RRAM Operation
Published in IEEE journal of the Electron Devices Society (2021)Get full text
Journal Article -
20
Read Noise Analysis in Analog Conductive-Metal-Oxide/HfOx ReRAM Devices
Published in 2024 Device Research Conference (DRC) (24-06-2024)“…Analog in-memory computing with resistive memory devices is a compelling alternative to conventional digital von Neumann computers [1]. Recent advancements in…”
Get full text
Conference Proceeding