Search Results - "Rakhlin, V. I"

Thermal properties of some organosilicon precursors for chemical vapor deposition by Ermakova, E. N., Sysoev, S. V., Nikolaev, R. E., Nikulina, L. D., Lis, A. V., Tsyrendorzhieva, I. P., Rakhlin, V. I., Plyusnin, P. E., Kosinova, M. L.

“…Five volatile organosilicon compounds: trimethyl(phenyl)silane Me 3 SiC 6 H 5 ( I ), trimethyl(cyclohexyl)silane Me 3 SiC 6 H 11 ( II ),…”
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Preparation of a mixed Mg–Si cellosolvate by Strelnikova, I. E., Grinberg, E. E., Levin, Yu. I., Amelina, A. E., Rakhlin, V. I.

“…We have studied reactions of metallic magnesium with ethyl cellosolve and a mixture of ethyl cellosolve and tetraethyl orthosilicate and demonstrated the…”
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Synthesis and investigation of properties of N-[[bis(trimethylsilyl)amino](fluoro)boryl]-(trimethyl)-N-(trimethylsilyl)silanamine by Sysoev, S. V., Nikulina, L. D., Gostevskii, B. A., Merenkov, I. S., Pushkarev, R. V., Rakhlin, V. I., Kosinova, M. L.

“…The synthesis and investigation of properties of N-[[bis(trimethylsilyl)amino](fluoro)boryl]-(trimethyl)-N-(trimethylsilyl)silanamine as a possible precursor…”
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Tris(diethylamino)silane—A new precursor compound for obtaining layers of silicon carbonitride by Fainer, N. I., Golubenko, A. N., Rumyantsev, Yu. M., Kesler, V. G., Ayupov, B. M., Rakhlin, V. I., Voronkov, M. G.

“…Silicon carbonitride layers have been obtained by chemical deposition from the gas phase with thermal (LPCVD) and plasma (PECVD) activation of the gas mixture…”
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Plasma enhanced chemical deposition of nanocrystalline silicon carbonitride films from trimethyl(phenylamino)silane by Rumyantsev, Yu. M., Fainer, N. I., Ayupov, B. M., Rakhlin, V. I.

“…Synthetic process for nanocrystalline silicon carbonitride films was developed using plasma-chemical decomposition of a new organosilicon reagent, namely,…”
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Films based on the phases in the Si-C-N System: Part 1. Synthesis and characterization of bis(trimethylsilyl)ethylamine as a precursor by Sysoev, S. V., Kolontaeva, A. O., Nikulina, L. D., Kosinova, M. L., Kuznetsov, F. A., Rakhlin, V. I., Lis, A. V., Voronkov, M. G.

“…The characterization of bis(trimethylsilyl)ethylamine was carried out using a combination of IR, UV, 1 H, 13 C, 29 Si, and 15 N NMR spectroscopy, as well as…”
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4-(Trimethylsilyl)morpholine: synthesis, characterization, and prospects of use in film deposition processes by Rakhlin, V. I., Tsyrendorzhieva, I. P., Sysoev, S. V., Rumyantsev, Yu. M., Maslova, O. V., Kosinova, M. L.

“…4-(Trimethylsilyl)morpholine (TMSM) was synthesized and shown to be applicable as a precursor for plasma-enhanced chemical vapor deposition of films. The…”
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On the possibility of homolytic addition of N-bromohexamethyldisilazane to the triple carbon–carbon bond by Rakhlin, V. I., Tsyrendorzhieva, I. P., Albanov, A. I.

“…By an example of a reaction of N -bromohexamethyldisilazane with phenylacetylene the possibility of its homolytic addition to the triple carbon-carbon bond…”
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N-bromohexamethyldisilazane: Investigation of properties and thermodynamic simulation of precipitation of thin-layer structures from the vapor phase by Rakhlin, V. I., Nikulina, L. D., Sysoev, S. V., Chernyavskii, L. I., Kosinova, M. L., Titov, A. A., Podgorbunskaya, T. A., Voronkov, M. G.

“…N -Bromohexamethyldisilazane has been characterized using an elemental analysis and IR, UV, 1 H NMR, 13 C NMR, and 29 Si NMR spectroscopy. The spectral…”
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Plasma-chemical synthesis of silicon carbonitride films from trimethyl(diethylamino)silane by Kosinova, M. L., Rumyantsev, Yu. M., Chernyavskii, L. I., Nikulina, L. D., Kesler, V. G., Maximovskii, E. A., Fainer, N. I., Rakhlin, V. I., Voronkov, M. G., Kuznetsov, F. A.

“…Silicon carbonitride films of different compositions have been synthesized by plasma-enhanced chemical vapor deposition with the use of…”
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Reaction of sodium bis(trimethylsilyl)amide with 2-bromopyridine by Lis, A. V., Tsyrendorzhieva, I. P., Albanov, A. I., Rakhlin, V. I.

“…A reaction of sodium bis(trimethylsilyl)amide with 2-bromopyridine leads to N , N -bis(trimethylsilyl)- and N ,3-bis(trimethylsilyl)-2-pyridinamine…”
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Synthesis of volatile bis[bis(trimethylsilyl)amide]-substituted boron derivatives by Lis, A. V., Gostevskii, B. A., Albanov, A. I., Yarosh, N. O., Rakhlin, V. I.

“…General strategy for the synthesis of organoboron compounds containing bis(trimethylsilyl)amide substituents has been suggested…”
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Acyl iodides in organic synthesis: XI. Unusual N-C bond cleavage in tertiary amines by Voronkov, M. G., Tsyrendorzhieva, I. P., Rakhlin, V. I.

“…Acyl iodides reacted with excess primary and secondary amines in a way similar to acyl chlorides, yielding the corresponding carboxylic acid amide and initial…”
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Acyl iodides in organic synthesis. Reactions with morpholine, piperidine, and N-hydrocarbylpiperidines by Voronkov, M. G, Tsyrendorzhieva, I. P, Rakhlin, V. I

“…Acyl iodides RCOI (R = Me, Ph) reacted with morpholine and piperidine to give the corresponding N-acyl derivatives and morpholine or piperidine hydroiodides…”
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Acyl Iodides in Organic Synthesis. Reaction of Acyl Iodides with N,N-Dimethyl Carboxylic Acid Amides by Voronkov, M. G, Tsyrendorzhieva, I. P, Rakhlin, V. I

“…Acyl iodides RCOI (R = Me, Ph) reacted with N,N-dimethylformamide and N,N-dimethylacetamide Me₂NC(=O)R' (R' = H, Me) along two concurrent pathways involving…”
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Acyl iodides in organic synthesis. Reaction of acyl iodides with triphenylethoxy- and triphenylhydroxysilane by Voronkov, M. G, Tsyrendorzhieva, I. P, Rakhlin, V. I

“…The reaction of triphenylethoxysilane with acetyl or benzoyl iodide led to the formation of triphenyliodosilane and ethyl ester of the corresponding carboxylic…”
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Characterization of some trimethyl(organylamino)silanes—precursors for preparation of silicon carbonitride films by Rakhlin, V. I., Tsirendorzhieva, I. P., Voronkov, M. G., Nikulina, L. D., Sysoev, S. V., Kosinova, M. L.

“…A series of aminosilanes has been synthesized by the reaction of carboxylic acid di(organyl)amides with trimethyliodsilane. A purification method providing an…”
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Plasma-chemical deposition of SiCN films from volatile N-bromhexamethyldisilazane by Smirnova, T. P., Badalian, A. M., Borisov, V. O., Bakhturova, L. F., Kaichev, V. V., Podgorbunskaya, T. A., Rakhlin, V. I.

“…Process of silicon-carbonitride (SiCN) film production from a new volatile organosilicon, N-bromhexamethyldisilazane, is developed. The use of this chemical…”
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Et3GeN(SiMe3)2 and Et3SnN(SiMe3)2: New precursors for chemical vapor deposition processes by Sysoev, S. V., Nikulina, L. D., Ermakova, E. N., Kosinova, M. L., Rakhlin, V. I., Tsyrendorzhieva, I. P., Lis, A. V., Voronkov, M. G.

“…We have synthesized the germanium- and tin-containing organosilicon compounds Et 3 GeN(SiMe 3 ) 2 and Et 3 SnN(SiMe 3 ) 2 as new precursors for the preparation…”
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Effect of the chemical structure of silyl derivatives of unsymmetrical dimethylhydrazine on the composition and structure of silicon carbonitride films: Theoretical and experimental studies by Smirnova, T. P., Shainyan, B. A., Borisov, V. O., Rakhlin, V. I.

“…Quantum-chemical calculations are used to analyze the homolytic decomposition of 1,1-dimethyl-2-(dimethylhydrazino)silane (DMDMHS) and…”
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