Search Results - "Radzimski, Zbigniew J."

Investigation on defects in Czochralski silicon with high-sensitive laser/microwave photoconductance technique by KATAYAMA, K.-I, AGARWAL, A, RADZIMSKI, Z. J, SHIMURA, F

“…High sensitivity of a noncontact laser/microwave photoconductance (LM-PC) technique for defects in heat-treated Czochralski (CZ) silicon crystals was confirmed…”
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Medium-energy ion spectroscopy using ion implanter by RADZIMSKI, Z. J, YOKOYAMA, S, ISHIBASHI, K, NISHIYAMA, F, HIROSE, M

“…An ion-implanter-based medium-energy ion spectroscopy system equipped with a solid-state detector has been developed and its performance has been studied with…”
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Sustained self‐sputtering using a direct current magnetron source by Posadowski, Witold M., Radzimski, Zbigniew J.

“…Sustained self‐sputtering of copper and silver targets has been achieved using a direct current magnetron source. The sputtering was carried out successfully…”
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Evaluation of Plasma-Induced Damage by Medium-Energy Ion Scattering by Yokoyama, Shin, Radzimski, Zbigniew J., Ishibashi, Kensaku, Miyazaki, Seiichi, Hirose, Masataka

“…The plasma-induced Si surface damage in CF 4 +H 2 and Ar plasmas which are used for the SiO 2 contact hole etching and Si surface cleaning, respectively, have…”
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Directional copper deposition using dc magnetron self-sputtering by Radzimski, Zbigniew J., Posadowski, Witold M., Rossnagel, Stephen M., Shingubara, Shoso

“…A directional copper deposition process has been developed that uses a dc magnetron source operating in self-sputtering mode. The process is performed at 10 −5…”
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Image simulation using Monte Carlo methods: Electron beam and detector characteristics by Radzimski, Zbigniew J., Russ, John C.

“…The rapid increase of computer speed allows using Monte Carlo simulation procedures for the analysis of complicated structures not only in a line scan mode but…”
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Selectivity variations of electron beam patterned silicon dioxide films by Kimball, John F., Allen, Patricia E., Griffis, Dieter P., Radzimski, Zbigniew J., Russell, Phillip E.

“…This work is a study of the effect of low‐energy e‐beam radiation on subsequent wet chemical etching of silicon dioxide (SiO2). The silicon dioxide etch…”
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