Search Results - "Rabadanov, M. Kh"

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  1. 1

    Studying the Atomic Layer Deposition of Molybdenum Oxide and Titanium–Molybdenum Oxide Films Using Quartz Crystal Microbalance by Maksumova, A. M., Abdulagatov, I. M., Palchaev, D. K., Rabadanov, M. Kh, Abdulagatov, A. I.

    Published in Russian Journal of Physical Chemistry A (01-10-2022)
    “…A study is performed of the thermal atomic layer deposition (ALD) of molybdenum oxide (MoO x ) films using MoOCl 4 and H 2 O and titanium–molybdenum oxide (Ti…”
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    Journal Article
  2. 2

    Molecular Layer Deposition and Pyrolysis of Polyamide Films on Si(111) with Formation of β-SiC by Amashaev, R. R., Abdulagatov, I. M., Rabadanov, M. Kh, Abdulagatov, A. I.

    Published in Russian Journal of Physical Chemistry A (01-07-2021)
    “…Molecular layer deposition (MLD) of thin polyamide films was performed using 1,3,5-benzenetricarbonyltrichloride (trimesoyl chloride, TMC) and…”
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  3. 3

    Atomic Layer Deposition and Thermal Transformations of Thin Titanium–Vanadium Oxide Films by Abdulagatov, A. I., Maksumova, A. M., Palchaev, D. K., Rabadanov, M. Kh, Abdulagatov, I. M.

    Published in Russian journal of applied chemistry (01-07-2021)
    “…Titanium–vanadium oxide (Ti x V y O z ) nanofilms were prepared by atomic layer deposition using TiCl 4 , VOCl 3 , and water. The film growth was monitored in…”
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  4. 4

    Growth of Aluminum Molybdenum Oxide Films by Atomic Layer Deposition with Using Trimethylaluminum, Molybdenum Oxytetrachloride, and Water by Maksumova, A. M., Bodalev, I. S., Suleimanov, S. I., Alikhanov, N. M.-R., Abdulagatov, I. M., Rabadanov, M. Kh, Abdulagatov, A. I.

    Published in Inorganic materials (01-04-2023)
    “…— In this paper, we report on the growth of aluminum molybdenum oxide (Al x Mo y O z ) films via atomic layer deposition (ALD) with the use of…”
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  5. 5

    Thermal Atomic Layer Deposition of TiNx Using TiCl4 and N2H4 by Abdulagatov, A. I., Rabadanov, M. Kh, Abdulagatov, I. M.

    Published in Russian microelectronics (01-11-2020)
    “…Atomic layer deposition (ALD) of titanium nitride (TiN) is carried out by the alternate surface reactions of titanium tetrachloride (TiCl 4 ) and hydrazine (N…”
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  6. 6

    Electrical Resistivity of Stabilized Polycrystalline Intermetallide Ti67Al33 by Iskhakov, M. E., Emirov, R. M., Rabadanov, M. Kh, Murlieva, Zh. Kh, Palchaev, D. K., Popov, P. V.

    Published in High temperature (01-04-2022)
    “…The temperature dependences of the electrical resistivity of the Ti 67 Al 33 intermetallic compound in the temperature range of 300–1000 K are presented,…”
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  7. 7

    Atomic Layer Deposition and Thermal Transformations of Aluminum-Vanadium Oxide Thin Films by Abdulagatov, A. I., Maksumova, A. M., Palchaev, D. K., Rabadanov, M. Kh, Abdulagatov, I. M.

    Published in Russian journal of general chemistry (01-08-2022)
    “…Aluminum-vanadium oxide (Al x V y O z ) nanofilms were obtained by atomic layer deposition using trimethylaluminum, vanadium oxychloride, and water. The growth…”
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  8. 8

    Surface Structure of the YBa2Cu3O7 – δ Ceramics after Exposure to Plasma Flow by Gadzhimagomedov, S. Kh, Presnyakov, M. Y., Muslimov, A. E., Gadzhiev, M. Kh, Rabadanov, M. Kh, Palchaev, D. K., Alikhanov, N. M.-R., Emirov, R. M., Murlieva, Zh. Kh, Saypulaev, P. M.

    Published in Crystallography reports (01-12-2022)
    “…A series of experiments has been performed to study the effect of plasma flows of argon, nitrogen, and their mixture with oxygen, produced by a dc plasmatron…”
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  9. 9

    Atomic Layer Deposition of Aluminum Nitride and Oxynitride on Silicon Using Tris(dimethylamido)aluminum, Ammonia, and Water by Abdulagatov, A. I., Amashaev, R. R., Ashurbekova, Kr. N., Ashurbekova, K. N., Rabadanov, M. Kh, Abdulagatov, I. M.

    Published in Russian journal of general chemistry (01-08-2018)
    “…Thin films of aluminum nitride and oxynitride were deposited by atomic layer deposition (ALD) in the temperature range from 170 to 290°C (optimal deposition…”
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  10. 10

    Synthesis of Highly Oriented Zinc-Oxide Films on Amorphous Substrates by the Method of Direct-Current Magnetron Sputtering by Ismailov, A. M., Emiraslanova, L. L., Rabadanov, M. Kh, Rabadanov, M. R., Aliev, I. Sh

    Published in Technical physics letters (01-06-2018)
    “…We describe the technology of obtaining highly oriented zinc-oxide (ZnO) films on amorphous substrates at high growth rates (up to 7 nm/s) by means of…”
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  11. 11

    Nonlinear Dynamics of the Fluctuations of Extrinsic Photoconductivity in Cadmium Sulfoselenide Crystals Doped with Potassium by Magomedbekov, U. G., Khamidov, M. M., Rabadanov, M. Kh

    Published in Moscow University chemistry bulletin (01-05-2018)
    “…The results of a quantitative evaluation of the characteristics of the fluctuations of extrinsic photoconductivity in single crystals of cadmium sulfoselenide…”
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  12. 12

    Atomic Layer Deposition of Aluminum Nitride Using Tris(diethylamido)aluminum and Hydrazine or Ammonia by Abdulagatov, A. I., Ramazanov, Sh. M., Dallaev, R. S., Murliev, E. K., Palchaev, D. K., Rabadanov, M. Kh, Abdulagatov, I. M.

    Published in Russian microelectronics (01-03-2018)
    “…Aluminum nitride (AlN x ) films were obtained by atomic layer deposition (ALD) using tris(diethylamido) aluminum(III) (TDEAA) and hydrazine (N 2 H 4 ) or…”
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  13. 13

    Thermal Expansion and Electrical Resistivity of the Intermetallic Compound Ti67Al33 by Murlieva, Zh. Kh, Palchaev, D. K., Iskhakov, M. E., Rabadanov, M. Kh, Bagomedova, U. U.

    Published in High temperature (01-03-2019)
    “…The thermal expansion coefficient and electrical resistivity are measured simultaneously on the same polycrystalline sample of Ti 67 Al 33 in the temperature…”
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  14. 14

    Molecular Layer Deposition and Thermal Transformations of Titanium(Aluminum)-Vanadium Hybrid Organic-Inorganic Films by Abdulagatov, A. I., Ashurbekova, Kr. N., Ashurbekova, Ka. N., Amashaev, R. R., Rabadanov, M. Kh, Abdulagatov, I. M.

    Published in Russian journal of applied chemistry (01-03-2018)
    “…In this work Molecular layer deposition (MLD) technique used to synthesize titanium-vanadium (TiV x C y O z ) and aluminum-vanadium (AlV x C y O z ) hybrid…”
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  15. 15

    “University of the People” – the third mission of Dagestan State University: an innovative approach to sustainability policy by Petherbridge, G., Rabadanov, M. Kh, Gadzhiev, A. A., Saipov, D. M., Teymurov, A. A., Rabadanov, M. R., Daudova, M. G.

    Published in Ûg Rossii: èkologiâ, razvitie (01-01-2021)
    “…Aim. To develop an effective and innovative policy approach to Dagestan State University’s third mandated mission to support sustainable community development…”
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  16. 16

    AC conductivity of BiFeO3 ceramics obtained by spark plasma sintering of nanopowder by Sadykov, S. A., Palchaev, D. K., Murlieva, Zh. Kh, Alikhanov, N. M.-R., Rabadanov, M. Kh, Gadzhimagomedov, S. Kh, Kallaev, S. N.

    Published in Physics of the solid state (01-09-2017)
    “…The structure and electrical properties of BiFeO 3 ceramics obtained by spark plasma sintering of a nanopowder are investigated. The nanopowder was synthesized…”
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  17. 17
  18. 18

    Fluctuations of the Impurity Photoconductivity in Crystals of Cadmium Sulfoselenide Doped with Potassium: Nonequilibrium Thermodynamics and Mathematical Modeling by Magomedbekov, U. G., Khamidov, M. M., Rabadanov, M. Kh, Soltamuradov, G. D., Khasanov, I. I.

    “…The results of the analysis of the fluctuations of the impurity photoconductivity in monocrystals of cadmium sulfoselenides doped with potassium upon their…”
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  19. 19

    Structure and Properties of Nanostructured YBa2Cu3O7–δ, BiFeO3, and Fe3O4 by Gadzhimagomedov, S. H., Alikhanov, N. M. -R., Emirov, R. M., Palchaev, D. K., Murlieva, Zh. Kh, Rabadanov, M. Kh, Sadykov, S. A., Khamidov, M. M., Hashafa, A. D. H.

    Published in Semiconductors (Woodbury, N.Y.) (01-12-2017)
    “…The development of new nanostructured materials based on YBa 2 Cu 3 O 7–δ , BiFeO 3 , and Fe 3 O 4 compounds is considered. The structure, morphology, and…”
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  20. 20

    Influence of magnetic properties on electric resistivity of iron-group elements by Palchaev, D. K., Murlieva, Zh. Kh, Abdulagatov, I. M., Gadzhimagomedov, S. Kh, Iskhakov, M. E., Rabadanov, M. Kh

    Published in High temperature (01-05-2017)
    “…A novel effective method of distinguishing between phonon and magnetic contributions into the total resistivity of 3 d metals is presented. The method allows…”
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