Search Results - "Qilong Bao"
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Mechanism of Ti/Al/Ti/W Au-free ohmic contacts to AlGaN/GaN heterostructures via pre-ohmic recess etching and low temperature annealing
Published in Applied physics letters (28-12-2015)“…The physical mechanism of low-thermal-budget Au-free ohmic contacts to AlGaN/GaN heterostructures is systematically investigated with current-voltage,…”
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Journal Article -
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High Uniformity Normally-OFF GaN MIS-HEMTs Fabricated on Ultra-Thin-Barrier AlGaN/GaN Heterostructure
Published in IEEE electron device letters (01-12-2016)“…Ultra-thin-barrier (UTB) AlGaN/GaN heterostructure is utilized for fabrication of normally-OFF GaN metal- insulator-semiconductor high-electron-mobility…”
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Normally OFF GaN-on-Si MIS-HEMTs Fabricated With LPCVD-SiNx Passivation and High-Temperature Gate Recess
Published in IEEE transactions on electron devices (01-02-2016)“…Low-current-collapse normally OFF GaN-on-Si MIS high-electron-mobility transistors (MIS-HEMTs) are fabricated with low-pressure chemical-vapor-deposited SiN x…”
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Effect of hydrogen carrier gas on AlN and AlGaN growth in AMEC Prismo D-Blue® MOCVD platform
Published in Journal of crystal growth (01-06-2015)“…Effect of hydrogen flow rate on AlN and AlGaN growth is investigated in AMEC Prismo D-Blue® MOCVD platform. It is found that AlN growth rate increases with the…”
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Journal Article -
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Mechanism of TMAl pre-seeding in AlN epitaxy on Si (111) substrate
Published in Vacuum (01-03-2014)“…Trimethylaluminum (TMAl) pre-seeding time, an important factor in controlling the quality such as morphology and dislocation of AlN on Si(111) substrate, was…”
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Effect of alloying temperature on the capacitance-voltage and current-voltage characteristics of low-pressure chemical vapor deposition SiNx/n-GaN MIS structures
Published in Physica status solidi. A, Applications and materials science (01-12-2015)“…The low‐pressure chemical vapor deposition (LPCVD)‐SiNx layer is deposited prior to the ohmic alloying as the passivation layer and gate dielectric layer in…”
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Journal Article -
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High-performance fully-recessed enhancement-mode GaN MIS-FETs with crystalline oxide interlayer
Published in 2017 29th International Symposium on Power Semiconductor Devices and IC's (ISPSD) (01-05-2017)“…In this work, we developed an effective technique to form a sharp and stable crystalline oxidation interlayer (COIL) between the reliable LPCVD (low pressure…”
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Conference Proceeding -
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Rapid synthesis of zeolitic imidazolate framework-8 (ZIF-8) in aqueous solution via microwave irradiation
Published in Inorganic chemistry communications (01-11-2013)“…Herein we report a new strategy to synthesize zeolitic imidazolate framework-8 (ZIF-8) at a relatively low molar ratio of ligand to metal ion in aqueous…”
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Journal Article -
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Reverse-bias stability and reliability of hole-barrier-free E-mode LPCVD-SiNx/GaN MIS-FETs
Published in 2017 IEEE International Electron Devices Meeting (IEDM) (01-12-2017)“…With substantially limited holes generation, the E-mode n-channel LPCVD-SiNx/GaN MIS-FET delivers small NBTI (with V ds = 0 V and a negative V gs = -30 V) even…”
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Conference Proceeding -
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Hole-Induced Threshold Voltage Shift Under Reverse-Bias Stress in E-Mode GaN MIS-FET
Published in IEEE transactions on electron devices (01-09-2018)“…Under reverse-bias stress (i.e., OFF-state stress with V GS <; V TH ) with high drain voltage, ultraviolet (UV) illumination and larger negative gate bias are…”
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Journal Article -
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Dependence of } Stability on Gate-Bias Under Reverse-Bias Stress in E-mode GaN MIS-FET
Published in IEEE electron device letters (01-03-2018)“…In this letter, we investigated the threshold voltage <inline-formula> <tex-math notation="LaTeX">{V}_{\text {TH}} </tex-math></inline-formula> stability under…”
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Effect of alloying temperature on the capacitance-voltage and current-voltage characteristics of low-pressure chemical vapor deposition SiN sub(x)/n-GaN MIS structures
Published in Physica status solidi. A, Applications and materials science (01-12-2015)“…The low-pressure chemical vapor deposition (LPCVD)-SiN sub(x) layer is deposited prior to the ohmic alloying as the passivation layer and gate dielectric layer…”
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Normally OFF GaN-on-Si MIS-HEMTs Fabricated With LPCVD-SiN sub(x) Passivation and High-Temperature Gate Recess
Published in IEEE transactions on electron devices (01-02-2016)“…Low-current-collapse normally OFF GaN-on-Si MIS high-electron-mobility transistors (MIS-HEMTs) are fabricated with low-pressure chemical-vapor-deposited SiN…”
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Journal Article -
15
Normally OFF GaN-on-Si MIS-HEMTs Fabricated With LPCVD-SiN x Passivation and High-Temperature Gate Recess
Published in IEEE transactions on electron devices (01-02-2016)“…Low-current-collapse normally OFF GaN-on-Si MIS high-electron-mobility transistors (MIS-HEMTs) are fabricated with low-pressure chemical-vapor-deposited SiN x…”
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Journal Article -
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Construction of a PV-driven plasma nitrogen fixation test platform and its application prospect in agricultural production
Published in 2022 IEEE 5th International Electrical and Energy Conference (CIEEC) (27-05-2022)“…Nowadays, countries and regions around the world are doing a solid and effective job of carbon peaking and carbon neutralization, and environment friendly…”
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Conference Proceeding