Search Results - "Puzyrev, Y. S."

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  1. 1

    Radiation-Induced Defect Evolution and Electrical Degradation of AlGaN/GaN High-Electron-Mobility Transistors by Puzyrev, Y. S., Roy, T., Zhang, E. X., Fleetwood, D. M., Schrimpf, R. D., Pantelides, S. T.

    Published in IEEE transactions on nuclear science (01-12-2011)
    “…Threshold-voltage shifts and increases in 1/ f noise are observed in proton-irradiated AlGaN/GaN high-electron-mobility transistors, indicating defect-mediated…”
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    Journal Article
  2. 2

    Role of Fe impurity complexes in the degradation of GaN/AlGaN high-electron-mobility transistors by Puzyrev, Y. S., Schrimpf, R. D., Fleetwood, D. M., Pantelides, S. T.

    Published in Applied physics letters (02-02-2015)
    “…Recent experiments show that GaN/AlGaN high-electron-mobility transistors suffer from significant current collapse, which is caused by an increase in the…”
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    Journal Article
  3. 3

    Prediction of Giant Thermoelectric Efficiency in Crystals with Interlaced Nanostructure by Puzyrev, Y. S, Shen, X, Pantelides, S. T

    Published in Nano letters (13-01-2016)
    “…We present a theoretical study of the thermoelectric efficiency of “interlaced crystals”, recently discovered in hexagonal-CuInS2 nanoparticles. Interlaced…”
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    Journal Article
  4. 4

    Variability of structural and electronic properties of bulk and monolayer Si2Te3 by Shen, X., Puzyrev, Y. S., Combs, C., Pantelides, S. T.

    Published in Applied physics letters (12-09-2016)
    “…Silicon telluride has diverse properties for potential applications in Si-based devices ranging from fully integrated thermoelectrics to optoelectronics to…”
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    Journal Article
  5. 5

    Surface Reactions and Defect Formation in Irradiated Graphene Devices by Puzyrev, Y. S., Wang, B., Zhang, E. X., Zhang, C. X., Newaz, A. K. M., Bolotin, K. I., Fleetwood, D. M., Schrimpf, R. D., Pantelides, S. T.

    Published in IEEE transactions on nuclear science (01-12-2012)
    “…Quantum mechanical-based kinetic Monte-Carlo calculations (KMC) are used to investigate mechanisms of degradation of graphene devices subjected to 10-keV x-ray…”
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    Journal Article
  6. 6

    The Role of Atomic Displacements in Ion-Induced Dielectric Breakdown by Beck, M.J., Puzyrev, Y.S., Sergueev, N., Varga, K., Schrimpf, R.D., Fleetwood, D.M., Pantelides, S.T.

    Published in IEEE transactions on nuclear science (01-12-2009)
    “…Irradiation of electronic devices with heavy ions causes a range of device degradation and failure modes, many of which are characterized and/or triggered by…”
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    Journal Article
  7. 7

    Memristive devices from ZnO nanowire bundles and meshes by Puzyrev, Y. S., Shen, X., Zhang, C. X., Hachtel, J., Ni, K., Choi, B. K., Zhang, E.-X., Ovchinnikov, O., Schrimpf, R. D., Fleetwood, D. M., Pantelides, S. T.

    Published in Applied physics letters (09-10-2017)
    “…We report two types of memristive devices made of ZnO nanowire assemblies and Ag electrodes: nanowire-bundle and nanowire-mesh memristors. Although constructed…”
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    Journal Article
  8. 8

    Theory of hot-carrier-induced phenomena in GaN high-electron-mobility transistors by Puzyrev, Y. S., Tuttle, B. R., Schrimpf, R. D., Fleetwood, D. M., Pantelides, S. T.

    Published in Applied physics letters (01-02-2010)
    “…It has long been known that GaN high-electron-mobility transistors can degrade significantly under hot electron stress. More recently, an increase in the…”
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    Journal Article
  9. 9

    Electrical-stress-induced degradation in AlGaN/GaN high electron mobility transistors grown under gallium-rich, nitrogen-rich, and ammonia-rich conditions by Roy, T., Puzyrev, Y. S., Tuttle, B. R., Fleetwood, D. M., Schrimpf, R. D., Brown, D. F., Mishra, U. K., Pantelides, S. T.

    Published in Applied physics letters (29-03-2010)
    “…We have evaluated the long-term electrical reliability of GaN/AlGaN high-electron-mobility transistors grown under Ga-rich, N-rich, and NH 3 -rich conditions…”
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    Journal Article
  10. 10

    Prediction of Giant Thermoelectric Efficiency in Crystals with Interlaced Nanostructure by Puzyrev, Y. S., Shen, X., Pantelides, S. T.

    Published in Nano letters (23-12-2015)
    “…We present a theoretical study of the thermoelectric efficiency of “interlaced crystals”, recently discovered in hexagonal-CuInS2 nanoparticles. Interlaced…”
    Get full text
    Journal Article
  11. 11

    Temperature-dependence and microscopic origin of low frequency 1/ f noise in GaN/AlGaN high electron mobility transistors by Roy, T., Zhang, E. X., Puzyrev, Y. S., Shen, X., Fleetwood, D. M., Schrimpf, R. D., Koblmueller, G., Chu, R., Poblenz, C., Fichtenbaum, N., Suh, C. S., Mishra, U. K., Speck, J. S., Pantelides, S. T.

    Published in Applied physics letters (14-11-2011)
    “…We have performed low frequency 1/ f noise measurements from 85K to 450K to investigate the energy distribution of defects in GaN/AlGaN high electron mobility…”
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    Journal Article
  12. 12

    Process Dependence of Proton-Induced Degradation in GaN HEMTs by Roy, T, En Xia Zhang, Puzyrev, Y S, Fleetwood, D M, Schrimpf, R D, Choi, B K, Hmelo, A B, Pantelides, S T

    Published in IEEE transactions on nuclear science (01-12-2010)
    “…The 1.8-MeV proton radiation responses are compared for AlGaN/GaN HEMTs grown under Ga-rich, N-rich, and NH 3 -rich conditions. The NH 3 -rich devices are more…”
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    Journal Article
  13. 13

    Automated software for the recovery of the short range order parameters from diffuse X-ray scattering data by Puzyrev, Y.S., Ice, G.E., Sparks, C.J., Robertson, L.

    “…We have developed software to accelerate the analysis of the diffuse scattering data and to recover the short-range-order (SRO) and other parameters. The…”
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    Journal Article
  14. 14

    Reliability-limiting defects in AlGaN/GaN HEMTs by Roy, T, En Xia Zhang, Fleetwood, D M, Schrimpf, R D, Puzyrev, Y S, Pantelides, S T

    “…Low-frequency noise measurements and density functional theory calculations are combined to show that N-anti-site and C impurity defects can lead to changes in…”
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    Conference Proceeding
  15. 15

    Oxygen-related border traps in MOS and GaN devices by Fleetwood, D. M., Roy, T., Shen, X., Puzyrev, Y. S., Zhang, E. X., Schrimpf, R. D., Pantelides, S. T.

    “…Oxygen-related border traps cause low-frequency excess (1/f) noise in MOS transistors with SiO 2 gate dielectrics and GaN/AlGaN HEMTs. In each case, the noise…”
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    Conference Proceeding