Search Results - "Pust, S.E."

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  1. 1

    Effects of the electrolyte species on the electrochemical dissolution of polycrystalline ZnO:Al thin films by Becker, J.-P., Pust, S.E., Hüpkes, J.

    Published in Electrochimica acta (01-12-2013)
    “…•Anodic electrochemical dissociation of sputtered ZnO:Al thin films was investigated.•Reaction kinetics and resulting surface morphology depended on the anion…”
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    Journal Article
  2. 2

    Integrated cantilever probes for SECM/AFM characterization of surfaces by Salomo, M., Pust, S.E., Wittstock, G., Oesterschulze, E.

    Published in Microelectronic engineering (01-05-2010)
    “…Scanning electrochemical microscopy (SECM) has proven to be a valuable technique for the characterization of electrochemical surface properties with high…”
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    Journal Article Conference Proceeding
  3. 3

    Development of two-step etching approach for aluminium doped zinc oxide using a combination of standard HCl and NH4Cl etch steps by Fernández, S., Pust, S.E., Hüpkes, J., Naranjo, F.B.

    Published in Thin solid films (01-05-2012)
    “…An etching method for ZnO:Al films deposited by radio-frequency sputtering is presented. The method is developed to achieve appropriate surface morphology for…”
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    Journal Article Conference Proceeding
  4. 4

    Gradient etching of silicon-based thin films for depth-resolved measurements: The example of Raman crystallinity by Köhler, F., Schicho, S., Wolfrum, B., Gordijn, A., Pust, S.E., Carius, R.

    Published in Thin solid films (31-01-2012)
    “…An etching procedure was applied to microcrystalline silicon (μc-Si:H) thin films in order to obtain a wedge-shaped profile for depth-resolved…”
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    Journal Article