Search Results - "Poyai, A."
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1
Durable nitrate sensor by surface modification
Published in Surface & coatings technology (25-11-2016)“…This work presents the development of nitrate sensor based on Ion Sensitive Field Effect Transistor (ISFET) technology to achieve longer device's lifetime…”
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2
An extreme change in structural and optical properties of indium oxynitride deposited by reactive gas-timing RF magnetron sputtering
Published in Applied surface science (30-09-2008)“…The indium oxynitride (InON) films were achieved by reactive RF magnetron sputtering indium target which has the purity of 99.999% with a novel reactive…”
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3
Very low drift and high sensitivity of nanocrystal-TiO2 sensing membrane on pH-ISFET fabricated by CMOS compatible process
Published in Applied surface science (15-02-2013)“…► We can fabricate sensing membrane layer from TiN with low drift rate. ► The EIS device incorporating TiN film annealed at 850°C exhibited a highest…”
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4
Design, fabrication and analysis of silicon hollow microneedles for transdermal drug delivery system for treatment of hemodynamic dysfunctions
Published in Cardiovascular engineering (Dordrecht, Netherlands) (01-09-2010)“…In this paper, we present design, fabrication and coupled multifield analysis of hollow out-of-plane silicon microneedles with piezoelectrically actuated…”
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5
Magnetotransistor Based on the Carrier Recombination-Deflection Effect
Published in IEEE sensors journal (01-02-2010)“…This paper presents the three-terminal magnetotransistor based on the carrier recombination-deflection effect. Three-terminal magnetotransistor can detect…”
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6
Improved extraction of carrier concentration and depletion width from capacitance–voltage characteristics of silicon n+–p-well junction diodes
Published in Applied physics letters (18-02-2002)“…An accurate method is proposed for the extraction of the carrier concentration profile (pp well) and the depletion width (Wp well) in a p-well region from…”
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7
High-dielectric constant AlON prepared by RF gas-timing sputtering for high capacitance density
Published in Materials science in semiconductor processing (01-10-2008)“…This paper presents the method to prepare and characterize high-dielectric constant aluminum oxynitride (AlON) formed by RF gas-timing sputtering. AlON layers…”
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8
Impact of a high electric field on the extraction of the generation lifetime from the reverse generation current component of shallow n+-p-well diodes
Published in IEEE transactions on electron devices (01-10-2001)“…A procedure is proposed to extract the thermal generation lifetime (tau)g)) profile in the depletion region of shallow n( )-p-well junctions surrounded by…”
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9
Improved extraction of the activation energy of the leakage current in silicon p–n junction diodes
Published in Applied physics letters (02-04-2001)“…An accurate method is proposed for the extraction of the activation energy ET from the volume generation current density JgA in silicon p–n junctions. It…”
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10
Hole-trapping-related transients in shallow n+–p junctions fabricated in a high-energy boron-implanted p well
Published in Applied physics letters (12-02-2001)“…This letter describes a transient phenomenon in the reverse hole current of large-area shallow n+–p-well junctions, giving rise to a hump at a specific reverse…”
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11
Extraction of the carrier generation and recombination lifetime from the forward characteristics of advanced diodes
Published in Materials science & engineering. B, Solid-state materials for advanced technology (15-09-2003)“…This paper proposes to extract the generation and recombination lifetime simultaneously from the recombination current in forward operation. The method is…”
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12
Gated-diode study of corner and peripheral leakage current in high-energy neutron irradiated silicon p-n junctions
Published in IEEE transactions on nuclear science (01-04-2003)“…It will be shown that an analysis of gated-diode (GD) structures enables to investigate the radiation damage in different parts of p-n junctions in a CMOS…”
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13
Shallow trench isolation dimensions effects on leakage current and doping concentration of advanced p–n junction diodes
Published in Materials science & engineering. B, Solid-state materials for advanced technology (15-12-2004)“…This paper describes the impact of active area and shallow trench isolation (STI) width on the junction leakage current and doping concentration. A higher…”
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14
Silicon substrate effects on the current–voltage characteristics of advanced p–n junction diodes
Published in Materials science & engineering. B, Solid-state materials for advanced technology (03-04-2000)“…An in-depth analysis of the forward and reverse current–voltage characteristics allows determination of the different geometrical (area, perimeter and corner)…”
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Journal Article Conference Proceeding -
15
Current transients in almost-ideal Czochralski silicon p–n junction diodes
Published in Applied physics letters (22-11-1999)“…The nature of the reverse current transients in large-area nearly ideal p–n junction diodes fabricated on Czochralski silicon substrates is investigated. It is…”
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16
Radiation effects on the current–voltage and capacitance–voltage characteristics of advanced p–n junction diodes surrounded by shallow trench isolation
Published in Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms (2002)“…This paper investigates the impact of 20 MeV proton irradiation on the current–voltage ( I– V) and capacitance-voltage ( C– V) characteristics of different…”
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Radiation defects in STI silicon diodes and their effects on device performance
Published in Physica. B, Condensed matter (01-12-2001)“…Results are presented of a deep level transient spectroscopy (DLTS) investigation of the radiation induced lattice defects in shallow trench isolation (STI)…”
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18
Irradiation temperature dependence of radiation damage in STI Si diodes
Published in Microelectronic engineering (01-04-2003)“…Results are presented of a detailed study of the effects of a high-temperature 2-MeV electron irradiation on the performance degradation of STI (shallow trench…”
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Journal Article Conference Proceeding -
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Defect assessment of irradiated STI diodes
Published in Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms (2002)“…The device performance degradation and the induced lattice defects of shallow trench isolation (STI) n +p diodes, subjected to different high energy particle…”
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20
Impact of fast-neutron irradiation on the silicon p–n junction leakage and role of the diffusion reverse current
Published in Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms (2002)“…The p–n junction leakage ( I R) at reverse voltage, which sets the leakage and power consumption of state of the art integrated circuits (ICs) and the DRAM…”
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