Search Results - "Pierson, J.F"

VN thin films as electrode materials for electrochemical capacitors by Lucio-Porto, R., Bouhtiyya, S., Pierson, J.F., Morel, A., Capon, F., Boulet, P., Brousse, T.

“…Thin films of VN with different thickness were prepared by D.C. reactive magnetron sputtering. Crystalline films with a preferential growth in the direction…”
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Infrared Plasmonics with Conductive Ternary Nitrides by Metaxa, C, Kassavetis, S, Pierson, J.F, Gall, D, Patsalas, P

“…Conductive transition metal nitrides are emerging as promising alternative plasmonic materials that are refractory and CMOS-compatible. In this work, we show…”
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Application of sputtered ruthenium nitride thin films as electrode material for energy-storage devices by Bouhtiyya, S., Lucio Porto, R., Laïk, B., Boulet, P., Capon, F., Pereira-Ramos, J.P., Brousse, T., Pierson, J.F.

“…RuN films that crystallized in the ZnS-like structure with [111] preferred orientation have been deposited by reactive sputtering. Preliminary results are…”
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Composition-driven transition from amorphous to crystalline films enables bottom-up design of functional surfaces by Borroto, A., García-Wong, A.C., Bruyère, S., Migot, S., Pilloud, D., Pierson, J.F., Mücklich, F., Horwat, D.

“…[Display omitted] •A new growth mode in thin films is reported that enables manipulating functional properties.•Competitive growth between amorphous and…”
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Chemical environment and functional properties of highly crystalline ZnSnN2 thin films deposited by reactive sputtering at room temperature by Alnjiman, F., Diliberto, S., Ghanbaja, J., Haye, E., Kassavetis, S., Patsalas, P., Gendarme, C., Bruyère, S., Cleymand, F., Miska, P., Boulet, P., Pierson, J.F.

“…Zinc tin nitride (ZnSnN2) thin films have been deposited on glass and silicon substrates using a reactive co-sputtering process. Although the deposition…”
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Stability of reactively sputtered silver oxide films by Pierson, J.F., Rousselot, C.

“…Silver oxide films were deposited on glass substrates by RF magnetron sputtering of a silver target in various Ar–O2 reactive mixtures. At low oxygen flow…”
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Chemistry, phase formation, and catalytic activity of thin palladium-containing oxide films synthesized by plasma-assisted physical vapor deposition by Horwat, D., Zakharov, D.I., Endrino, J.L., Soldera, F., Anders, A., Migot, S., Karoum, R., Vernoux, Ph, Pierson, J.F.

“…The chemistry, microstructure, and catalytic activity of thin films incorporating palladium were studied using scanning and transmission electron microscopies,…”
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Surface morphology-optical properties relationship in thermochromic VO2 thin films obtained by air oxidation of vanadium nitride by A.C. García-Wong, D. Pilloud, S. Bruyère, D. Mangin, S. Migot, J.F. Pierson, F. Capon

“…In this paper, vanadium nitride (VN) thin films have been deposited on Al substrates by reactive magnetron sputtering. Thermochromic VO2 films have been…”
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Structure and properties of copper nitride films formed by reactive magnetron sputtering by Pierson, J.F

“…Copper nitride (Cu 3N) coatings are deposited on glass and steel substrates by RF magnetron sputtering of a copper target in various Ar–N 2 reactive mixtures…”
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Oxidation resistance of decorative (Ti,Mg)N coatings deposited by hybrid cathodic arc evaporation-magnetron sputtering process by Hodroj, A., Chaix-Pluchery, O., Steyer, P., Pierson, J.F.

“…Titanium–magnesium nitride coatings (Ti,Mg)N were deposited on steels and silicon substrates by hybrid reactive arc evaporation-magnetron sputtering process…”
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High hardness, low Young's modulus and low friction of nanocrystalline ZrW2 Laves phase and Zr1−xWx thin films by Horwat, D., Jimenez-Pique, E., Pierson, J.F., Migot, S., Dehmas, M., Anglada, M.

“…Zr1−xWx nanocrystalline films of Zr-W solid solutions and ZrW2 Laves phase were synthesized by magnetron co-sputtering. Large values of the H/E ratio up to…”
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Influence of silicon addition on the oxidation resistance of CrN coatings by Thobor-Keck, A., Lapostolle, F., Dehlinger, A.S., Pilloud, D., Pierson, J.F., Coddet, C.

“…Thin CrN and CrSiN films were deposited on steel substrates by DC reactive magnetron sputtering. In this paper, the structure and the oxidation resistance of…”
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Organic/inorganic hybrid composites prepared by polymerization compounding and controlled free radical polymerization by Kasseh, A, Ait-Kadi, A, Riedl, B, Pierson, J.F

“…A new method to produce highly filled and well dispersed polymer solid composites using controlled free radical polymerization has been developed. Grafting of…”
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Study of the structural changes induced by air oxidation in Ti–Si–N hard coatings by Pilloud, D., Pierson, J.F., Marco de Lucas, M.C., Cavaleiro, A.

“…3-μm thick Ti–Si–N coatings were deposited on polished X38CrMoV5 substrates by sputtering a composite Ti–Si target in Ar–N 2 reactive mixture. Oxidation tests…”
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Reactively sputtered zirconium nitride coatings: structural, mechanical, optical and electrical characteristics by Pilloud, D., Dehlinger, A.S., Pierson, J.F., Roman, A., Pichon, L.

“…This paper presents the result of the substrate bias voltage effect on the properties of zirconium nitride films, such as structure, morphology, hardness,…”
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EPMA–EDS surface measurements of interdiffusion coefficients between miscible metals in thin films by Christien, F., Pierson, J.F., Hassini, A., Capon, F., Le Gall, R., Brousse, T.

“…A new technique is developed to study interdiffusion between two miscible metals. The technique is applied to the Ni–Pd system. It consists in measuring the…”
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Influence of the silicon concentration on the optical and electrical properties of reactively sputtered Zr–Si–N nanocomposite coatings by Pilloud, D., Pierson, J.F., Pichon, L.

“…Zr–Si–N films were deposited on silicon and X38CrMoV5 steel substrates by sputtering composite Zr–Si targets in reactive Ar–N 2 mixture. The silicon…”
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Reactive gas pulsing process: A method to extend the composition range in sputtered iron oxynitride films by Petitjean, C., Grafouté, M., Rousselot, C., Pierson, J.F.

“…Fe–O–N films were deposited on glass and silicon substrates using two reactive magnetron sputtering processes. In the first process called conventional process…”
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Influence of substrate temperature on titanium oxynitride thin films prepared by reactive sputtering by Chappé, J.-M., Martin, N., Pierson, J.F., Terwagne, G., Lintymer, J., Gavoille, J., Takadoum, J.

“…Thin films of titanium oxynitride were successfully prepared by dc reactive magnetron sputtering using a titanium metallic target, argon, nitrogen and water…”
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Properties and air annealing of paramelaconite thin films by Thobor, A., Pierson, J.F.

“…Paramelaconite (Cu 4O 3) films were deposited on glass and silicon substrates by magnetron sputtering of a copper target in reactive Ar–O 2 mixtures. Two…”
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