Search Results - "Pierre Perreau"
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On the Variability in Planar FDSOI Technology: From MOSFETs to SRAM Cells
Published in IEEE transactions on electron devices (01-08-2011)“…In this paper, an in-depth variability analysis, i.e., from the threshold voltage V T of metal-oxide-semiconductor field-effect-transistors (MOSFETs) to the…”
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Highly transparent piezoelectric PZT membranes for transducer applications
Published in Sensors and actuators. A. Physical. (16-10-2022)“…Transparent PZT-based membranes were fabricated out of 200 mm silicon wafers thanks to an innovative layer transfer process. The ITO (100 nm)/PZT (1.16 µm)/ITO…”
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Highly transparent PZT capacitors on glass obtained by layer transfer process
Published in Journal of materials science. Materials in electronics (01-12-2022)“…Transparent ITO/PZT/ITO capacitors were fabricated on 200 mm glass substrate. The PZT films of 1 µm and 2 µm thickness were first grown on platinized Si wafer…”
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Experimental investigation of ESD design window for fully depleted SOI N-MOSFETs
Published in Microelectronic engineering (01-07-2011)“…[Display omitted] ► We tested silicided MOS with Transmission Line pulse tool. ► We examine the robustness of the devices and the impact of ground planes and…”
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High-Performance Ultrathin Body c-SiGe Channel FDSOI pMOSFETs Featuring SiGe Source and Drain: V Tuning, Variability, Access Resistance, and Mobility Issues
Published in IEEE transactions on electron devices (01-05-2013)“…We report on ultrascaled (L G = 23 nm) compressively strained SiGe-based FDSOI pMOSFET with ultrathin body. The devices have been fabricated using a high-K…”
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FDSOI Floating Body Cell eDRAM Using Gate-Induced Drain-Leakage (GIDL) Write Current for High Speed and Low Power Applications
Published in 2009 IEEE International Memory Workshop (01-05-2009)“…A Capacitorless IT-DRAM cell using gate-induced drain leakage (GIDL) current for write operation was demonstrated for the first time on FDSOI substrate, 9.5 nm…”
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Fully Depleted Strained Silicon-on-Insulator p-MOSFETs With Recessed and Embedded Silicon-Germanium Source/Drain
Published in IEEE electron device letters (01-10-2010)“…Strained p-MOSFETs with recessed and embedded silicon-germanium (eSiGe) source/drain (S/D) are fabricated on either silicon-on-insulator (SOI) or strained SOI…”
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Study of substrate orientations impact on Ultra Thin Buried Oxide (UTBOX) FDSOI High-K Metal gate technology performances
Published in Solid-state electronics (01-12-2013)“…► Comparison between two substrate orientation for FD-SOI devices. ► We studied the carrier mobility degradation as a function of temperature. ► Impurity such…”
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La brucellose bovine au Tchad
Published in Revue d'élevage et de médecine vétérinaire des pays tropicaux (01-03-1956)“…Aucun résumé disponible en français…”
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Lithium niobate film bulk acoustic wave resonator for sub-6 GHz filters
Published in 2020 IEEE International Ultrasonics Symposium (IUS) (07-09-2020)“…In this work, Film Bulk Acoustic Resonators (FBAR) based on 250 nm-thick Y+163°-cut LiNbO 3 films have been fabricated using a layer transfer process (4-inch)…”
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Conference Proceeding -
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Single-mode high frequency LiNbO3 Film Bulk Acoustic Resonator
Published in 2019 IEEE International Ultrasonics Symposium (IUS) (01-10-2019)“…In this paper, Y+163°-cut LiNbO 3 (LNO) Film Bulk Acoustic Resonators (FBAR) with patterned bottom electrodes (AlSi or W) and a sacrificial layer cavity have…”
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Conference Proceeding -
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Composite Tunable Bulk Acoustic Wave Resonator Based on Lithium Niobate Thin Films
Published in 2023 IEEE International Ultrasonics Symposium (IUS) (03-09-2023)“…Changing the electrical boundary conditions applied to a piezoelectric film by means of an external tunable capacitor is one of the possible mechanisms to…”
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High Frequency LiNbO3 Bulk Wave Resonator
Published in 2019 Joint Conference of the IEEE International Frequency Control Symposium and European Frequency and Time Forum (EFTF/IFC) (01-04-2019)“…Bulk Acoustic Wave Resonators made of lithium niobate thin films obtained by layer transfer techniques relied so far only on full sheet buried electrodes, what…”
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Conference Proceeding -
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ESD robustness of FDSOI gated diode for ESD network design: Thin or thick BOX?
Published in 2010 IEEE International SOI Conference (SOI) (01-10-2010)“…The robustness against Electrostatic Discharge (ESD) events of gated diodes, fabricated in CMOS 45nm FDSOI technology, is compared for 10nm and 145nm Buried…”
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Single Crystal LiNbO3 and LiTaO3 Bulk Acoustic Wave Resonator
Published in 2023 IEEE International Ultrasonics Symposium (IUS) (03-09-2023)“…Since the last decade, new innovative acoustic devices based on single crystal LiNbO3 and LiTaO 3 thin films, i.e. layered surface, Lamb or bulk acoustic wave…”
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5 GHz Lamb wave Wi-Fi channel filters
Published in 2022 IEEE International Ultrasonics Symposium (IUS) (10-10-2022)“…Lamb-wave resonators offer the possibility to adjust their resonance frequency by varying the period of their inter-digitated electrodes. Leveraging the high…”
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Conference Proceeding -
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4.2 GHz LiNbO3 Film Bulk Acoustic Resonator
Published in 2021 IEEE International Ultrasonics Symposium (IUS) (11-09-2021)“…We have designed and fabricated LiNbO 3 Film Bulk Acoustic Resonators operating around 4.2 GHz, suitable for C-band filters, with various bandwidths (60, 170,…”
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Conference Proceeding -
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Transparent PZT MIM Capacitors on Glass for Piezoelectric Transducer Applications
Published in 2019 20th International Conference on Solid-State Sensors, Actuators and Microsystems & Eurosensors XXXIII (TRANSDUCERS & EUROSENSORS XXXIII) (01-06-2019)“…This paper reports on the realization and characterization of a fully transparent Pb(Zr0.52,Ti0.48)O3 (PZT) based MIM capacitor on glass substrate for…”
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Conference Proceeding