Search Results - "Picraux, S.T."

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  1. 1

    Charge Transport Characteristics in Boron-Doped Silicon Nanowires by Ingole, S., Manandhar, P., Chikkannanavar, S.B., Akhadov, E.A., Picraux, S.T.

    Published in IEEE transactions on electron devices (01-11-2008)
    “…We report the charge transport and inferred surface depletion characteristics of silicon nanowires (Si NWs) with diameters of 90-170 nm after boron doping to 8…”
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    Journal Article
  2. 2

    Epitaxial thin films of topological insulator Bi2Te3 with two-dimensional weak anti-localization effect grown by pulsed laser deposition by Zhang, S.X., Yan, L., Qi, J., Zhuo, M., Wang, Y.-Q., Prasankumar, R.P., Jia, Q.X., Picraux, S.T.

    Published in Thin solid films (31-08-2012)
    “…We have grown high quality epitaxial topological insulator Bi2Te3 thin films on silicon (111) substrates by pulsed laser deposition. Systematic structural…”
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    Journal Article
  3. 3

    Ultrafast Electron and Hole Dynamics in Germanium Nanowires by Prasankumar, R. P, Choi, S, Trugman, S. A, Picraux, S. T, Taylor, A. J

    Published in Nano letters (01-06-2008)
    “…We present the first ultrafast time-resolved optical measurements, to the best of our knowledge, on ensembles of germanium nanowires. Vertically aligned…”
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    Journal Article
  4. 4

    Magnetic movement of biological fluid droplets by García, Antonio A., Egatz-Gómez, Ana, Lindsay, Solitaire A., Domínguez-García, P., Melle, Sonia, Marquez, Manuel, Rubio, Miguel A., Picraux, S.T., Yang, Dongqing, Aella, P., Hayes, Mark A., Gust, Devens, Loyprasert, Suchera, Vazquez-Alvarez, Terannie, Wang, Joseph

    “…Magnetic fields can be used to control the movement of aqueous drops on non-patterned, silicon nanowire superhydrophobic surfaces. Drops of aqueous and…”
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    Journal Article Conference Proceeding
  5. 5

    Silicon nanowire and polyethylene superhydrophobic surfaces for discrete magnetic microfluidics by Egatz-Gómez, Ana, Schneider, John, Aella, P., Yang, Dongqing, Domínguez-García, P., Lindsay, Solitaire, Picraux, S.T., Rubio, Miguel A., Melle, Sonia, Marquez, Manuel, García, Antonio A.

    Published in Applied surface science (31-10-2007)
    “…A microfluidic method to manipulate small drops of water is studied on two different superhydrophobic surfaces. Using this digital magnetofluidic method, water…”
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    Journal Article Conference Proceeding
  6. 6

    Tailored Surface Modification by Ion Implantation and Laser Treatment by Picraux, S. T., Pope, L. E.

    “…An important trend in materials science is the use of increasingly sophisticated methods to control composition and microstructure during processing…”
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    Journal Article
  7. 7

    Corrosion behavior of phosphorus-implanted Fe-6Cr and Fe-18Cr amorphous alloys by SORENSEN, N.R, DIEGLE, R.B, PICRAUX, S.T

    Published in Corrosion (Houston, Tex.) (1987)
    “…The passivation of phosphorus-implanted Fe--6Cr and Fe--18Cr alloys has been investigated in 0.1N H sub 2 SO sub 4 with and without the addition of chloride…”
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    Journal Article
  8. 8

    Ion beam analysis of VLS grown Ge nanostructures on Si by Taraci, J.L., Clement, T., Dailey, J.W., Drucker, J., Picraux, S.T.

    “…A rich variety of nanostructures can be synthesized by varying pressure and temperature during vapor–liquid–solid (VLS) epitaxy on Si. The chemical vapor…”
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    Journal Article
  9. 9

    Metastable SiGeC formation by solid phase epitaxy by STRANE, J. W, STEIN, H. J, LEE, S. R, DOYLE, B. L, PICRAUX, S. T, MAYER, J. W

    Published in Applied physics letters (15-11-1993)
    “…We report the synthesis and detailed structural characterization of SiGeC metastable alloys formed by solid phase epitaxial regrowth. Epitaxial layers with 0.7…”
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    Journal Article
  10. 10

    Epitaxial growth of rare-earth silicides on (111)Si by KNAPP, J. A, PICRAUX, S. T

    Published in Applied physics letters (17-02-1986)
    “…Rapid heating with an electron beam has been used to react overlayers of rare-earth (RE) metals with (111) Si, forming epitaxial layers of silicides of Y, Gd,…”
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    Journal Article
  11. 11

    Layer-by-layer sputtering and epitaxy of Si(100) by BEDROSSIAN, P, HOUSTON, J. E, TSAO, J. Y, CHASON, E, PICRAUX, S. T

    Published in Physical review letters (01-07-1991)
    “…We report oscillations in diffracted electron intensities during ion bombardment of Si(100) by 200- and 250-eV Xe, both alone and with sequential and…”
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    Journal Article
  12. 12

    The role of transient ion-induced defects in ion beam-assisted growth by Kellerman, B. K., Chason, E., Floro, J. A., Picraux, S. T., White, J. M.

    Published in Applied physics letters (18-09-1995)
    “…Low-energy ion bombardment, concurrent with growth, can control and improve many aspects of film growth, but confirming the atomistic mechanism responsible for…”
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    Journal Article
  13. 13

    Ion beam enhanced epitaxial growth of Ge (001) by CHASON, E, BEDROSSIAN, P, HORN, K. M, TSAO, J. Y, PICRAUX, S. T

    Published in Applied physics letters (22-10-1990)
    “…An enhancement in surface smoothness during molecular beam epitaxial growth of Ge on Ge (001) by 200 eV Xe ion bombardment has been measured with reflection…”
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    Journal Article
  14. 14
  15. 15

    Surface roughening of Ge(001) during 200 eV Xe ion bombardment and Ge molecular beam epitaxy by Chason, E., Tsao, J.Y., Horn, K.M., Picraux, S.T., Atwater, H.A.

    “…The kinetics of surface roughening of Ge(001) during 200 eV Xe ion bombardment and during Ge molecular beam epitaxy (MBE) are studied by real-time reflection…”
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    Journal Article
  16. 16

    Defect production and recombination during low‐energy ion processing by Kellerman, B. K., Floro, J. A., Chason, E., Brice, D. K., Picraux, S. T., White, J. M.

    “…Low‐energy ion processing produces damaged, microroughened semiconductor surfaces due to the production of point defects. We present a study of point defect…”
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    Conference Proceeding Journal Article
  17. 17

    Displacement-threshold energies in Si calculated by molecular dynamics by Miller, LA, Brice, DK, Prinja, AK, Picraux, ST

    Published in Physical review. B, Condensed matter (15-06-1994)
    “…Molecular-dynamics calculations of simple defect production in bulk Si are reported. The Tersoff three-body potential-energy function is used to provide a…”
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    Journal Article
  18. 18

    Simulations of layer-by-layer sputtering during epitaxy by CHASON, E, BEDROSSIAN, P, HOUSTON, J. E, TSAO, J. Y, DODSON, B. W, PICRAUX, S. T

    Published in Applied physics letters (30-12-1991)
    “…We have performed computer simulations of simultaneous and sequential ion bombardment and epitaxial growth. In agreement with recent reflection high-energy…”
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    Journal Article
  19. 19

    Ultrafast carrier dynamics in semiconductor nanowires by Prasankumar, R.P., Choi, S.G., Wang, G.T., Picraux, S.T., Taylor, A.J.

    “…Ultrafast wavelength-tunable optical measurements on semiconductor nanowires allow us to independently probe the dynamics of electrons, holes, and defect…”
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    Conference Proceeding
  20. 20

    Direct measurement of evaporation during rapid thermal processing of capped GaAs by HAYNES, T. E, CHU, W. K, PICRAUX, S. T

    Published in Applied physics letters (20-04-1987)
    “…We have directly measured the amounts of arsenic evaporated through very thin encapsulating films during rapid thermal processing (RTP). The evaporated…”
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    Journal Article