Search Results - "Picraux, S.T."
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Charge Transport Characteristics in Boron-Doped Silicon Nanowires
Published in IEEE transactions on electron devices (01-11-2008)“…We report the charge transport and inferred surface depletion characteristics of silicon nanowires (Si NWs) with diameters of 90-170 nm after boron doping to 8…”
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2
Epitaxial thin films of topological insulator Bi2Te3 with two-dimensional weak anti-localization effect grown by pulsed laser deposition
Published in Thin solid films (31-08-2012)“…We have grown high quality epitaxial topological insulator Bi2Te3 thin films on silicon (111) substrates by pulsed laser deposition. Systematic structural…”
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3
Ultrafast Electron and Hole Dynamics in Germanium Nanowires
Published in Nano letters (01-06-2008)“…We present the first ultrafast time-resolved optical measurements, to the best of our knowledge, on ensembles of germanium nanowires. Vertically aligned…”
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4
Magnetic movement of biological fluid droplets
Published in Journal of magnetism and magnetic materials (01-04-2007)“…Magnetic fields can be used to control the movement of aqueous drops on non-patterned, silicon nanowire superhydrophobic surfaces. Drops of aqueous and…”
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Journal Article Conference Proceeding -
5
Silicon nanowire and polyethylene superhydrophobic surfaces for discrete magnetic microfluidics
Published in Applied surface science (31-10-2007)“…A microfluidic method to manipulate small drops of water is studied on two different superhydrophobic surfaces. Using this digital magnetofluidic method, water…”
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6
Tailored Surface Modification by Ion Implantation and Laser Treatment
Published in Science (American Association for the Advancement of Science) (09-11-1984)“…An important trend in materials science is the use of increasingly sophisticated methods to control composition and microstructure during processing…”
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Corrosion behavior of phosphorus-implanted Fe-6Cr and Fe-18Cr amorphous alloys
Published in Corrosion (Houston, Tex.) (1987)“…The passivation of phosphorus-implanted Fe--6Cr and Fe--18Cr alloys has been investigated in 0.1N H sub 2 SO sub 4 with and without the addition of chloride…”
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Ion beam analysis of VLS grown Ge nanostructures on Si
Published in Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms (01-01-2006)“…A rich variety of nanostructures can be synthesized by varying pressure and temperature during vapor–liquid–solid (VLS) epitaxy on Si. The chemical vapor…”
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Metastable SiGeC formation by solid phase epitaxy
Published in Applied physics letters (15-11-1993)“…We report the synthesis and detailed structural characterization of SiGeC metastable alloys formed by solid phase epitaxial regrowth. Epitaxial layers with 0.7…”
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Epitaxial growth of rare-earth silicides on (111)Si
Published in Applied physics letters (17-02-1986)“…Rapid heating with an electron beam has been used to react overlayers of rare-earth (RE) metals with (111) Si, forming epitaxial layers of silicides of Y, Gd,…”
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11
Layer-by-layer sputtering and epitaxy of Si(100)
Published in Physical review letters (01-07-1991)“…We report oscillations in diffracted electron intensities during ion bombardment of Si(100) by 200- and 250-eV Xe, both alone and with sequential and…”
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12
The role of transient ion-induced defects in ion beam-assisted growth
Published in Applied physics letters (18-09-1995)“…Low-energy ion bombardment, concurrent with growth, can control and improve many aspects of film growth, but confirming the atomistic mechanism responsible for…”
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13
Ion beam enhanced epitaxial growth of Ge (001)
Published in Applied physics letters (22-10-1990)“…An enhancement in surface smoothness during molecular beam epitaxial growth of Ge on Ge (001) by 200 eV Xe ion bombardment has been measured with reflection…”
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14
The effects of P implantation on passivity of Fe–Cr alloys in acidic electrolytes
Published in Journal of materials research (01-12-1986)Get full text
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15
Surface roughening of Ge(001) during 200 eV Xe ion bombardment and Ge molecular beam epitaxy
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01-05-1990)“…The kinetics of surface roughening of Ge(001) during 200 eV Xe ion bombardment and during Ge molecular beam epitaxy (MBE) are studied by real-time reflection…”
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16
Defect production and recombination during low‐energy ion processing
Published in Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films (01-05-1995)“…Low‐energy ion processing produces damaged, microroughened semiconductor surfaces due to the production of point defects. We present a study of point defect…”
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Conference Proceeding Journal Article -
17
Displacement-threshold energies in Si calculated by molecular dynamics
Published in Physical review. B, Condensed matter (15-06-1994)“…Molecular-dynamics calculations of simple defect production in bulk Si are reported. The Tersoff three-body potential-energy function is used to provide a…”
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18
Simulations of layer-by-layer sputtering during epitaxy
Published in Applied physics letters (30-12-1991)“…We have performed computer simulations of simultaneous and sequential ion bombardment and epitaxial growth. In agreement with recent reflection high-energy…”
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Ultrafast carrier dynamics in semiconductor nanowires
Published in 2008 Conference on Lasers and Electro-Optics and 2008 Conference on Quantum Electronics and Laser Science (01-05-2008)“…Ultrafast wavelength-tunable optical measurements on semiconductor nanowires allow us to independently probe the dynamics of electrons, holes, and defect…”
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Conference Proceeding -
20
Direct measurement of evaporation during rapid thermal processing of capped GaAs
Published in Applied physics letters (20-04-1987)“…We have directly measured the amounts of arsenic evaporated through very thin encapsulating films during rapid thermal processing (RTP). The evaporated…”
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