Search Results - "Petong, N."

The adsorption of cationic surfactants on photoresist surfaces and its effect on the pattern collapse in high aspect ratio patterning by Drechsler, A., Bellmann, C., Synytska, A., Petong, N., Grundke, K., Stamm, M., Reichelt, J., Wunnicke, O.

“…The collapse of photoresist patterns in high aspect ratio patterning is a defect that may reduce the production yield drastically. Recently, a novel method to…”
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Robustness of wetting and morphology of maleimide copolymer films to choice of solvent and annealing by Zschoche, S., David, R., Tavana, H., Pöschel, K., Petong, N., Dutschk, V., Grundke, K., Neumann, A.W.

“…We report the surface properties of thin polymer films prepared by spin coating from different solvents and subsequent annealing. Surface morphology is studied…”
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Contact Angles and Coating Film Thickness by Tavana, H., Petong, N., Hennig, A., Grundke, K., Neumann, A. W.

“…The effect of film thickness and surface preparation techniques on contact angles of water, 1-bromonaphtalene, and n-hexadecane on Teflon® AF 1600 polymeric…”
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Adsorption of Cationic Surfactants onto Photoresist Surfaces-A Way to Reduce Pattern Collapse in High Aspect Ratio Patterning by Drechsler, A., Petong, N., Bellmann, C., Synytska, A., Busch, P., Stamm, M., Grundke, K., Wunnicke, O.

“…The collapse of photoresist patterns in the production process is a problem stringently limiting the miniaturizing of microchips. Recently, it has been found…”
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Force measurements between Teflon AF and colloidal silica particles in electrolyte solutions by Drechsler, Astrid, Petong, Nicole, Zhang, Junfeng, Kwok, Daniel Y., Grundke, Karina

“…The interaction force between a very hydrophobic polymer surface and colloidal silica particles with a roughness of 10–15 nm has been measured in aqueous…”
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On the effect of cationic surfactants in the rinse to reduce pattern collapse in high aspect ratio patterning of photoresists by Grundke, K., Drechsler, A., Petong, N., Bellmann, C., Stamm, M., Wunnicke, O., Reichelt, J., Mage, I., Pinter, B., Pearce, T., Voigt, M.

“…This paper presents a novel concept based on the mechanism of cationic surfactant adsorption on the photoresist surface. The minimum capillary forces…”
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