Search Results - "Pengchan, Weera"
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1
The Influence of Gate Scaling to Electrical Characteristics on n-MOS FinFET
Published in MATEC web of conferences (01-01-2017)“…This paper investigates effects from gate scaling in Tri-gate FinFET structure by simulation method, to avoid problems and improve a structure to be good…”
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Journal Article Conference Proceeding -
2
Three-Phase Oscillator with Cascade Ability Using Voltage Current Conveyor
Published in 2024 10th International Conference on Engineering, Applied Sciences, and Technology (ICEAST) (01-05-2024)“…This paper presents a new circuit configuration employing voltage current conveyors (VCII) in conjunction with a minimal number of passive elements to achieve…”
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Conference Proceeding -
3
The local generation and recombination lifetime based on forward diode characteristics diagnostics
Published in Journal of crystal growth (01-01-2013)“…This paper is proposed to extract the local carrier generation and recombination lifetime from forward characteristics of diode. The different geometry p–n…”
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Journal Article Conference Proceeding -
4
The defects analysis in CMOS fabrication by arrhenius activation energy technique
Published in 2011 6th IEEE International Conference on Nano/Micro Engineered and Molecular Systems (01-02-2011)“…Low power consumption device can be realized by low junction leakage current. This leakage current relates to the defects in the depletion region of p-n…”
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Conference Proceeding -
5
Implantation-induced defects analysis base on activation energy diagnostics
Published in Proceedings of the 2009 12th International Symposium on Integrated Circuits (01-12-2009)“…Low power consumption device can be realized by low junction leakage current. This leakage current relates to the defects in the depletion region of p-n…”
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Conference Proceeding -
6
Effect of Base Width and Implantation Dose on Performance of 3-Terminal Magnetotransistor
Published in 2007 International Symposium on Integrated Circuits (01-09-2007)“…This paper presents the effect of base width and implantation dose on electrical carriers in the magnetotransistor deflected by the Lorentz force (FL) from…”
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Conference Proceeding