Search Results - "Pelissier, Bernard"

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  1. 1

    Impact of Substrate Biasing During AlN Growth by PEALD on Al2O3/AlN/GaN MOS Capacitors by Legallais, Maxime, Lefevre, Gauthier, Martin, Simon, Labau, Sébastien, Bassani, Franck, Pélissier, Bernard, Baron, Thierry, Vauche, Laura, Le Royer, Cyrille, Charles, Matthew, Vandendaele, William, Plissonnier, Marc, Gwoziecki, Romain, Salem, Bassem

    Published in Advanced materials interfaces (01-02-2022)
    “…In this article, the role of the substrate biasing during the passivation of GaN with AlN deposited by plasma enhanced atomic layer deposition (PEALD) is…”
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    Journal Article
  2. 2

    200 mm-scale growth of 2D layered GaSe with preferential orientation by Martin, Mickaël, Pochet, Pascal, Okuno, Hanako, Alvarez, Carlos, Bellet-Amalric, Edith, Hauchecorne, Pauline, Levert, Théo, Pelissier, Bernard, Borowik, Łukasz, Bassani, Franck, David, Sylvain, Moeyaert, Jeremy, Baron, Thierry

    Published in APL materials (01-05-2022)
    “…In this article, we present a fab-compatible metal–organic chemical vapor deposition growth process, realized in a hydrogen ambience, of two-dimensional (2D)…”
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    Journal Article
  3. 3

    Generation of fertile transplastomic soybean by Dufourmantel, N, Pelissier, B, Garcon, F, Peltier, G, Ferullo, J.M, Tissot, G

    Published in Plant molecular biology (01-07-2004)
    “…We describe here the development of a plastid transformation method for soybean, a leguminous plant of major agronomic interest. Chloroplasts from embryogenic…”
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    Journal Article
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    p-Hydroxyphenylpyruvate dioxygenase inhibitor-resistant plants by Matringe, Michel, Sailland, Alain, Pelissier, Bernard, Rolland, Anne, Zink, Olivier

    Published in Pest management science (01-03-2005)
    “…The enzyme p‐hydroxyphenylpyruvate dioxygenase (HPPD) catalyzes the formation of homogentisic acid, the aromatic precursor of plastoquinone and vitamin E. HPPD…”
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    Journal Article Conference Proceeding
  6. 6

    H3PO4-based wet chemical etching for recovery of dry-etched GaN surfaces by Benrabah, Sabria, Legallais, Maxime, Besson, Pascal, Ruel, Simon, Vauche, Laura, Pelissier, Bernard, Thieuleux, Chloé, Salem, Bassem, Charles, Matthew

    Published in Applied surface science (30-04-2022)
    “…[Display omitted] •Phosphoric acid induces significant changes on GaN surface chemistry and morphology.•Phosphoric acid can recover damaged dry-etched GaN…”
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    Journal Article
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    Improvement of AlN Film Quality Using Plasma Enhanced Atomic Layer Deposition with Substrate Biasing by Legallais, Maxime, Mehdi, Hussein, David, Sylvain, Bassani, Franck, Labau, Sébastien, Pelissier, Bernard, Baron, Thierry, Martinez, Eugenie, Ghibaudo, Gérard, Salem, Bassem

    Published in ACS applied materials & interfaces (02-09-2020)
    “…In recent years, plasma enhanced atomic layer deposition (PEALD) has emerged as a key method for the growth of conformal and homogeneous aluminum nitride (AlN)…”
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    Journal Article
  9. 9

    Renewable Lignin-Derived Graphene-like/PVDF Nanocomposites with High Dielectric Constant and Low Loss Tangent by Meeporn, Keerati, Morvezen, Gwenn, de Vecchy, Jon, Mareau, Vincent H., Wanmolee, Wanwitoo, Butburee, Teera, Pelissier, Bernard, Sylvestre, Alain

    Published in Journal of physical chemistry. C (31-08-2023)
    “…Dielectric materials with high dielectric constant, low loss tangent, and lower cost need to be developed, given the growing demand for advanced electronic…”
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    Journal Article
  10. 10

    Spectroscopic investigation of oxidation in GaSe 2D layered materials by Smiri, Badreddine, Bernardin, Rémy, Martin, Mickael, Roussel, Hervé, Deschanvres, Jean Luc, Nolot, Emmanuel, Rochat, Névine, Bassani, Franck, Baron, Thierry, Pelissier, Bernard

    Published in Microelectronic engineering (15-11-2024)
    “…GaSe, a two-dimensional layered metal monochalcogenide, has recently attracted growing interest due to its unique electronic properties and potential…”
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    Journal Article
  11. 11

    H$_3$PO$_4$-based wet chemical etching for recovery of dry-etched GaN surfaces by Benrabah, Sabria, Legallais, Maxime, Besson, Pascal, Ruel, Simon, Vauche, Laura, Pelissier, Bernard, Thieuleux, Chloé, Salem, Bassem, Charles, Matthew

    Published in Applied surface science (25-12-2021)
    “…The impact of several wet etchants commonly encountered in the microelectronic industry on the surface chemistry of GaN on silicon was explored. In order to…”
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    Journal Article
  12. 12

    Hybridization of ellipsometry and energy loss spectra from XPS for bandgap and optical constants determination in SiON thin films by Resende, Joao, Fuard, David, Le Cunff, Delphine, Tortai, Jean-Herve, Pelissier, Bernard

    Published in Materials chemistry and physics (01-02-2021)
    “…In this study, we first compare the bandgap determination methods in SiON thin films using two established techniques: Ellipsometry and the Energy Loss…”
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    Journal Article
  13. 13

    Chemical Bath Deposition of ZnO Nanowires Using Copper Nitrate as an Additive for Compensating Doping by Lausecker, Clément, Salem, Bassem, Baillin, Xavier, Chaix-Pluchery, Odette, Roussel, Hervé, Labau, Sébastien, Pelissier, Bernard, Appert, Estelle, Consonni, Vincent

    Published in Inorganic chemistry (01-02-2021)
    “…The controlled incorporation of dopants like copper into ZnO nanowires (NWs) grown by chemical bath deposition (CBD) is still challenging despite its critical…”
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    Journal Article
  14. 14

    Hybridization of ellipsometry and Xps energy loss: robust band gap and broadband optical constants determination of SiGe, HfON and MoOx thin films by Levert, Théo, Zakhtser, Alter, Duval, Julien, Raguenez, Chloé, Verdier, Stéphane, Le Cunff, Delphine, Tortai, Jean-Hervé, Pelissier, Bernard

    Published in Microelectronic engineering (2023)
    “…In this study, we compare the robustness of optical constants and optical band gap determination of three different materials: SiGe, N-doped HfO$_2$ and…”
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    Journal Article
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    Surface oxidation phenomena in Ge-rich GeSbTe alloys and N doping influence for Phase-Change Memory applications by Goffart, Ludovic, Pelissier, Bernard, Lefèvre, Gauthier, Le–Friec, Yannick, Vallée, Christophe, Navarro, Gabriele, Reynard, Jean–Philippe

    Published in Applied surface science (30-01-2022)
    “…[Display omitted] •Double oxidation kinetic has been observed for the first time in Ge-rich GeSbTe alloys.•Higher N contents leads to higher oxidation rate in…”
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    Journal Article
  17. 17

    Hybridization of ellipsometry and XPS energy loss: Robust band gap and broadband optical constants determination of SiGe, HfON and MoOx thin films by Levert, Théo, Zakhtser, Alter, Duval, Julien, Raguenez, Chloé, Verdier, Stéphane, Le Cunff, Delphine, Tortai, Jean-Hervé, Pelissier, Bernard

    Published in Microelectronic engineering (01-01-2024)
    “…Efficiently passivating germanium (Ge) surfaces is crucial to reduce the unwanted recombination current in high-performance devices. Chemical surface cleaning…”
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    Journal Article
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    Effect of explant orientation, pH, solidifying agent and wounding on initiation of soybean somatic embryos by Santarem, E.R. (Universidade Federal do Rio Grande do Sul, Porto Alegre, RS, Brazil.), Pelissier, B, Finer, J.J

    “…Several methods have been developed to obtain somatic embryos of soybean. We report here a new procedure that results in high frequency somatic embryo…”
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    Journal Article
  19. 19

    Plastid transformation in soybean by Dubald, Manuel, Tissot, Ghislaine, Pelissier, Bernard

    “…The biotechnological potential of plastid genetic engineering has been illustrated in a limited number of higher plant species. We have developed a…”
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    Journal Article
  20. 20

    Investigation of N2 plasma GaAs surface passivation efficiency against air exposure: Towards an enhanced diode by Mehdi, H., Réveret, F., Robert-Goumet, C., Bideux, L., Gruzza, B., Hoggan, P.E., Leymarie, J., Andre, Y., Gil, E., Pelissier, B., Levert, T., Paget, D., Monier, G.

    Published in Applied surface science (30-03-2022)
    “…[Display omitted] •Effective chemical passivation of GaAs surface is got with nitridation at 500 °C.•Nitriding GaAs at 500 °C gives the optimal electrical…”
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    Journal Article