Search Results - "Pavick, J. W."

Performance enhancements on IBM’s EL‐4 electron‐beam lithography system by Butsch, R., Enichen, W. A., Gordon, M. S., Groves, T. R., Hartley, J. G., Pavick, J. W., Pfeiffer, H. C., Quickle, R. J., Rockrohr, J. D., Stickel, W.

“…IBM’s latest electron‐beam mask maker, EL‐4, is installed at IBM’s Advanced Mask Facility in Essex Junction, Vermont. The EL‐4 system is a 75 kV…”
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EL5: One tool for advanced x-ray and chrome on glass mask making by Sturans, M. A., Hartley, J. G., Pfeiffer, H. C., Dhaliwal, R. S., Groves, T. R., Pavick, J. W., Quickle, R. J., Clement, C. S., Dick, G. J., Enichen, W. A., Gordon, M. S., Kendall, R. A., Kostek, C. A., Pinckney, D. J., Robinson, C. F., Rockrohr, J. D., Safran, J. M., Senesi, J. J., Tressler, E. V.

“…The state-of-the-art for mask making continues to be driven by 1× x-ray masks. The IBM EL4+ e-beam mask writer at the Advanced Mask Facility in Burlington,…”
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