Search Results - "Pavelescu, C"

Thoracoscopic left splanchnicectomy - role in pain control in unresectable pancreatic cancer. Initial experience by Lică, I, Jinescu, G, Pavelescu, C, Beuran, M

“…The management of opiate-dependent intractable abdominal pain caused by unresectable pancreatic cancer remains challenging. The aim of this study was to…”
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Risk of malignancy in complex cystic renal masses (Bosniak category III-IV) by Mirvald, C, Pavelescu, C, Surcel, C, Mihai, V, Najjar, S, Cerempei, V, Savu, C, Sinescu, I

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Management of oligo-recurrent prostate cancer: Is salvage super extended pelvic lymphadenectomy an option? by Surcel, C, Mirvald, C, Mihai, V, Pavelescu, C, Najjar, S, Gingu, C, Manu, M.A, Cerempei, V, Sau, C, Sinescu, I

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Robotic assisted cystoprostatectomy (RARC) in the management of muscle invasive bladder cancer – a critical assessment over the last 10 years by Mirvald, C, Surcel, C, Gianluca, G, Pavelescu, C, Mihai, V, Najjar, S, Cerempei, V, Savu, C, Sinescu, I

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C134: Early complication rates and perioperative mortality after radical cystectomy in the elderly by Mirvald, C, Surcel, C, Gingu, C, Pavelescu, C, Cerempei, V, Najjar, S, Olaru, V, Chirita, M, Savu, C, Gluck, G, Sinescu, I

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1 MHz dielectric constants of phosphosilicate glass films chemically vapour-deposited in the SiH4-PH3-O2-N2 system at low temperature by Pavelescu, C., Serghi, D.

“…The ac relative dielectric constant (RDC) and resistivity of as-deposited and annealed phosphosilicate glass (PSG) films, with phosphorus concentrations in the…”
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Multimodal analgesia - a standard of care in severe surgical thoracic trauma patients?: 14AP7-7 by Pavelescu, D., Mirea, L., Luca, Vasiliu I., Grintescu, I., Pavelescu, C., Dumitrascu, M.

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An etch rate study on thermally annealed SiO2 films deposited in a TEOS-LPCVD system by Orfescu, C., Pavelescu, C., Badila, M.

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Thermally annealed phosphosilicate glass films deposited in the SiH4-PH3-O2-N2 system by BANTOIU, R, PAVELESCU, C

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Correlations between the properties and the deposition kinetics of low-temperature chemical vapour deposited SiO2 films: the effect of O2/SiH4 mole ratio by Pavelescu, C., Cobianu, C.

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A mechanism for the surface reaction between silane and oxygen at low temperature and correlations with the properties of the deposited SiO2 films by PAVELESCU, C, COBIANU, C

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Analysis of the linear regime of thermal oxidation of silicon in dry oxygen at atmospheric pressure and correlation with film properties by PAVELESCU, C, COBIANU, C

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The infrared absorption of antimony-doped SiO2 films chemically vapour deposited in the TEOS-SbCl5-O2 system at low temperature by VLAHOVICI, N, PAVELESCU, C, KLEPS, I

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Dry etching of low-temperature chemically vapour deposited phosphosilicate glass films in CF4-Q2 plasma by BANTOIU, R, PAVELESCU, C, AVRAMESCU, V

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An etch-rate study of thermally annealed LTCVD SiO2 films as a function of initial deposition conditions by COBIANU, C, PAVELESCU, C

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An analysis of the initial oxidation regions of silicon in dry oxygen at atmospheric pressure by PAVELESCU, C, BADILA, M, COBIANU, C

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Dielectric constant and dissipation factor in LTCVD SiO2 films by COBIANU, C, PAVELESCU, C, CATUNEANU, V. M

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A fitting analysis of dry O2 atmospheric pressure silicon oxidation data and correlations with film properties by PAVELESCU, C, COBIANU, C, BERCU, M

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Etch rate of low-temperature chemically vapour deposited SiO2 films in P-etch solution: the effect of deposition conditions by PAVELESCU, C, COBIANU, C, SEGAL, E

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The effect of deposition conditions on the refractive index of LTCVD SiO2 films by COBIANU, C, PAVELESCU, C, PAUNESCU, A

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