Search Results - "Pauleau, Y"
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1
Generation and evolution of residual stresses in physical vapour-deposited thin films
Published in Vacuum (14-05-2001)“…Residual stresses in films produced by physical vapour deposition (PVD) techniques result from the contribution of thermal, intrinsic and extrinsic stresses…”
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Journal Article Conference Proceeding -
2
Deposition and characterization of nanostructured metal/carbon composite films
Published in Surface & coatings technology (01-03-2004)“…Films with high hardness and reduced friction coefficient are required for the protection of materials surface against wear in sliding contacts. The surface of…”
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3
Surface alloying of stainless steel 316 with copper using pulsed electron-beam melting of film–substrate system
Published in Surface & coatings technology (20-06-2006)“…The surface morphology, chemical composition, microstructure, nanohardness, and tribological properties of a film (Cu)–substrate (stainless steel 316) system…”
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4
Nanostructured copper–carbon composite thin films produced by sputter deposition/microwave plasma-enhanced chemical vapor deposition dual process
Published in Materials letters (01-11-2002)“…Pure copper and copper–carbon composite films have been deposited on silicon substrates by sputtering of a copper target associated with microwave…”
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5
Mechanical properties of nanostructured copper-hydrogenated amorphous carbon composite films studied by nanoindentation
Published in Surface & coatings technology (01-03-2004)“…Nanostructured copper/amorphous hydrogenated carbon (a-C:H) composite films approximately 500 nm in thickness have been deposited on silicon substrates by an…”
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6
Composition, mechanical properties and friction behavior of nickel/hydrogenated amorphous carbon composite films
Published in Surface & coatings technology (20-06-2006)“…Nickel/hydrogenated amorphous carbon composite films have been deposited on silicon and stainless steel substrates by combining sputter-deposition of metal and…”
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Journal Article Conference Proceeding -
7
Effect of the substrate bias voltage on the physical characteristics of copper films deposited by microwave plasma-assisted sputtering technique
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01-01-2004)“…Pure copper films have been deposited by microwave plasma-assisted sputtering on (100)-oriented single crystal silicon substrates mounted on a water-cooled…”
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8
Characteristics of copper/carbon and nickel/carbon composite films produced by microwave plasma-assisted deposition techniques from argon–methane gas mixtures
Published in Surface & coatings technology (01-11-2004)“…Copper/hydrogenated amorphous carbon (a-C:H) and nickel/a-C:H composite films have been deposited on Si substrates by combining sputter-deposition of metal and…”
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9
Tribological properties of copper/carbon films formed by microwave plasma-assisted deposition techniques
Published in Surface & coatings technology (01-03-2004)“…Copper/hydrogenated amorphous carbon (a-C:H) composite have been deposited on silicon substrates by sputtering of a copper target associated with microwave…”
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10
Phase composition and tribological properties of copper/carbon composite films
Published in Surface & coatings technology (21-12-2005)“…Copper/carbon composite films have been deposited on steel and silicon substrates by an hybrid technique combining sputter-deposition of copper and microwave…”
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11
Structure and mechanical properties of nickel/carbon nanocomposite films formed by microwave plasma-assisted deposition technique from argon–acetylene gas mixture
Published in Surface & coatings technology (25-02-2008)“…The structure and mechanical properties of nickel/hydrogenated amorphous carbon (Ni/a-C:H) films formed by microwave plasma-assisted deposition technique were…”
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12
Mechanisms of intrinsic stress generation in amorphous carbon thin films prepared by magnetron sputtering
Published in Diamond and related materials (01-07-1997)“…Amorphous carbon (a-C) films have been deposited on biased silicon substrates at room temperature by conventional and unbalanced magnetron sputtering from a…”
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13
Electron field emission and surface morphology of a-C and a-C:H thin films
Published in Thin solid films (22-06-2005)“…Hydrogen-free amorphous carbon (a-C) and hydrogenated amorphous carbon (a-C:H) films have been deposited on (100)-oriented single crystal Si substrates by…”
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14
Structural characteristics of copper/hydrogenated amorphous carbon composite films prepared by microwave plasma-assisted deposition processes from methane–argon and acetylene–argon gas mixtures
Published in Thin solid films (01-11-2004)“…Copper/hydrogenated amorphous carbon (Cu/a-C:H) composite films have been deposited on silicon substrates by a hybrid technique combining microwave…”
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15
Mechanical properties of copper/carbon nanocomposite films formed by microwave plasma assisted deposition techniques from argon–methane and argon–acetylene gas mixtures
Published in Composites science and technology (01-04-2005)“…Nanostructured copper/amorphous hydrogenated carbon (a-C:H) composite films have been deposited on silicon substrates by a hybrid technique combining microwave…”
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Journal Article Conference Proceeding -
16
Mechanical behaviour of hard PVD multilayered coatings
Published in Surface & coatings technology (01-03-2000)“…The aim of this work was to investigate the cracking behaviour and adhesion of tungsten–carbon-based multilayered coatings deposited on steel substrates by…”
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Journal Article Conference Proceeding -
17
Characterization of magnesium fluoride thin films produced by argon ion beam-assisted deposition
Published in Thin solid films (01-02-2001)“…Magnesium fluoride thin films have been deposited on silica glass and single crystal silicon substrates by argon ion beam-assisted deposition (IBAD). The…”
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18
Characterization of magnesium fluoride thin films deposited by direct electron beam evaporation
Published in Journal of vacuum science & technology. A, Vacuum, surfaces, and films (01-03-2000)“…Magnesium fluoride films have been deposited on quartz and silicon substrates by direct electron beam evaporation. The structure, composition, and mass density…”
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19
Failure and adhesion characterization of tungsten–carbon single layers, multilayered and graded coatings
Published in Surface & coatings technology (01-09-1999)“…Hard multilayered and graded coatings based on a stacking arrangement of ductile layers and hard layers appear to be promising wear- or erosion-resistant…”
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20
Effect of the substrate temperature on the physical characteristics of amorphous carbon films deposited by d.c. magnetron sputtering
Published in Diamond and related materials (01-12-1996)“…The growth rate, composition, electrical resistivity, mass density, refractive index and microstructure of amorphous carbon (a-C) films prepared by direct…”
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