Search Results - "Park, Jubong"
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Threshold-switching characteristics of a nanothin-NbO2-layer-based Pt/NbO2/Pt stack for use in cross-point-type resistive memories
Published in Microelectronic engineering (01-07-2013)“…[Display omitted] ► We fabricated a nanothin layer of Pt/NbO2/Pt stack which shows threshold-switching property. ► The Pt/NbO2/Pt device exhibited a high…”
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2
Investigation of State Stability of Low-Resistance State in Resistive Memory
Published in IEEE electron device letters (01-05-2010)“…We investigated the state stability of the low-resistance state (LRS) in a resistive switching memory having a Pt/Cu:MoO x /GdO x /Pt structure. Various…”
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3
Improved Switching Variability and Stability by Activating a Single Conductive Filament
Published in IEEE electron device letters (01-05-2012)“…We successfully fabricated a single-filament-activated resistive memory having limited conductive filament (CF) source through a novel fabrication technique…”
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4
Improved Switching Uniformity and Speed in Filament-Type RRAM Using Lightning Rod Effect
Published in IEEE electron device letters (01-01-2011)“…Improved switching uniformity and speed were demonstrated using a filament-type resistive memory. By using a gradual reset operation, a leaky high resistance,…”
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Parallel memristive filaments model applicable to bipolar and filamentary resistive switching
Published in Applied physics letters (12-09-2011)“…The concept of memristive filaments (MFs) is introduced, which is based on the memristors developed by the Hewlett-Packard group. The effects of key parameters…”
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6
Effect of Program/Erase Speed on Switching Uniformity in Filament-Type RRAM
Published in IEEE electron device letters (01-07-2011)“…We investigated the effect of program/erase speed on switching uniformity in filament-type resistive memory with Mo/SiO x /Pt structure. The RRAM device…”
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7
Excellent State Stability of Cu/SiC/Pt Programmable Metallization Cells for Nonvolatile Memory Applications
Published in IEEE electron device letters (01-05-2011)“…We have investigated silicon carbide (SiC) as a new programmable metallization cell material for nonvolatile memory applications. Our Cu/SiC/Pt devices showed…”
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Journal Article -
8
Operation Voltage Control in Complementary Resistive Switches Using Heterodevice
Published in IEEE electron device letters (01-04-2012)“…For the high-density memory application of resistive random access memory (ReRAM), we study the complementary resistive switch (CRS) behavior of a HfO x -based…”
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9
Excellent resistive switching in nitrogen-doped Ge2Sb2Te5 devices for field-programmable gate array configurations
Published in Applied physics letters (07-11-2011)“…The nitrogen-doped Ge2Sb2Te5 (GST) programmable metallization cell is investigated to address the low switching voltage and need for a high resistance ratio,…”
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10
Varistor-type bidirectional switch (JMAX>107A/cm2, selectivity∼104) for 3D bipolar resistive memory arrays
Published in 2012 Symposium on VLSI Technology (VLSIT) (01-06-2012)“…We demonstrate a varistor-type bidirectional switch (VBS) with excellent selection property for future 3D bipolar resistive memory array. A highly non-linear…”
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Conference Proceeding -
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Self-formed Schottky barrier induced selector-less RRAM for cross-point memory applications
Published in Physica status solidi. PSS-RRL. Rapid research letters (01-11-2012)“…We propose a selector‐less Pr0.7Ca0.3MnO3 (PCMO) based resistive‐switching RAM (RRAM) for high‐density cross‐point memory array applications. First, we…”
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Journal Article -
12
MIM-type cell selector for high-density and low-power cross-point memory application
Published in Microelectronic engineering (01-05-2012)“…A resistive memory can be highly integrated using a cross-point architecture; however, it requires appropriate cell selectors in order to suppress sneak paths…”
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13
New Set/Reset Scheme for Excellent Uniformity in Bipolar Resistive Memory
Published in IEEE electron device letters (01-03-2011)“…We proposed a new set/reset operation scheme to improve the switching uniformity of filament-type resistive memory. By controlling the magnitude of the sweep…”
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14
Improved switching uniformity of a carbon-based conductive-bridge type ReRAM by controlling the size of conducting filament
Published in Microelectronic engineering (01-06-2011)“…We investigated the resistive switching properties of a amorphous carbon-based ReRAM device. In order to minimize the fluctuations of switching parameters, we…”
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15
Noise-Analysis-Based Model of Filamentary Switching ReRAM With \hbox/\hbox Stacks
Published in IEEE electron device letters (01-07-2011)“…In this letter, we propose a model based on noise analysis for the filamentary switching mechanism in resistance random access memory having ZrOx/HfOx bilayer…”
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Journal Article -
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Co-Occurrence of Threshold Switching and Memory Switching in \hbox/\hbox/\hbox Cells for Crosspoint Memory Applications
Published in IEEE electron device letters (01-02-2012)“…To integrate bipolar resistive switching cells into crosspoint structures, we serially connect a threshold-switching (TS) Pt/NbO 2 /Pt device with a…”
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17
Effect of \hbox\hbox\hbox Thermal Barrier on Reset Operations in Filament-Type Resistive Memory
Published in IEEE electron device letters (01-11-2011)“…We have investigated the effect of a Ge 2 Sb 2 Te 5 (GST) thermal barrier on the reset operations in TiN/Cu/SiC/Pt devices. When the GST film was introduced as…”
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18
Excellent Selector Characteristics of Nanoscale \hbox for High-Density Bipolar ReRAM Applications
Published in IEEE electron device letters (01-11-2011)“…We herein present a nanoscale vanadium oxide (VO 2 ) device with excellent selector characteristics such as a high on/off ratio (>; 50), fast switching speed…”
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19
Proton Irradiation Effects on Resistive Random Access Memory With ZrO /HfO Stacks
Published in IEEE transactions on nuclear science (01-12-2011)“…In this study, we investigated proton irradiation effects on resistive random access memory (ReRAM) comprising ZrO x /HfO x stacks. After irradiation, changes…”
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Self-Selective Characteristics of Nanoscale \hbox Devices for High-Density ReRAM Applications
Published in IEEE electron device letters (01-05-2012)“…We herein present a hybrid-type memory device in which threshold switching and bipolar resistive switching are combined. The nanoscale vanadium oxide (VO x )…”
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