Search Results - "Panasci, Salvatore E."
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Multiscale Investigation of the Structural, Electrical and Photoluminescence Properties of MoS2 Obtained by MoO3 Sulfurization
Published in Nanomaterials (Basel, Switzerland) (01-01-2022)“…In this paper, we report a multiscale investigation of the compositional, morphological, structural, electrical, and optical emission properties of 2H-MoS2…”
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2
Esaki Diode Behavior in Highly Uniform MoS2/Silicon Carbide Heterojunctions
Published in Advanced materials interfaces (01-08-2022)“…The heterogeneous integration with 2D materials enables new functionalities and novel devices in state‐of‐the‐art bulk (3D) semiconductors. In this work,…”
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3
Direct Atomic Layer Deposition of Ultrathin Aluminum Oxide on Monolayer MoS2 Exfoliated on Gold: The Role of the Substrate
Published in Advanced materials interfaces (01-11-2021)“…In this paper, the authors demonstrate the atomic layer deposition (ALD) of highly homogeneous and ultrathin (≈3.6 nm) Al2O3 films with very good insulating…”
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4
Esaki Diode Behavior in Highly Uniform MoS 2 /Silicon Carbide Heterojunctions
Published in Advanced materials interfaces (01-08-2022)“…Abstract The heterogeneous integration with 2D materials enables new functionalities and novel devices in state‐of‐the‐art bulk (3D) semiconductors. In this…”
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Journal Article -
5
Direct Atomic Layer Deposition of Ultrathin Aluminum Oxide on Monolayer MoS 2 Exfoliated on Gold: The Role of the Substrate
Published in Advanced materials interfaces (01-11-2021)“…Abstract In this paper, the authors demonstrate the atomic layer deposition (ALD) of highly homogeneous and ultrathin (≈3.6 nm) Al 2 O 3 films with very good…”
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Journal Article -
6
Multiscale Investigation of the Structural, Electrical and Photoluminescence Properties of MoS 2 Obtained by MoO 3 Sulfurization
Published in Nanomaterials (Basel, Switzerland) (06-01-2022)“…In this paper, we report a multiscale investigation of the compositional, morphological, structural, electrical, and optical emission properties of 2H-MoS…”
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Journal Article -
7
Direct atomic layer deposition of ultrathin aluminium oxide on monolayer $MoS_2$ exfoliated on gold: the role of the substrate
Published 21-08-2021“…In this paper we demonstrated the thermal Atomic Layer Deposition (ALD) growth at 250 {\deg}C of highly homogeneous and ultra-thin ($\approx$ 3.6 nm) $Al_2O_3$…”
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