Search Results - "PINYOL, A"

Mechanical integrity of thin inorganic coatings on polymer substrates under quasi-static, thermal and fatigue loadings by Leterrier, Y., Mottet, A., Bouquet, N., Gilliéron, D., Dumont, P., Pinyol, A., Lalande, L., Waller, J.H., Månson, J.-A.E.

“…The interplay between residual stress state, cohesive and adhesive properties of coatings on substrates is reviewed in this article. Attention is paid to thin…”
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Mechanical failure analysis of thin film transistor devices on steel and polyimide substrates for flexible display applications by Leterrier, Y., Pinyol, A., Gilliéron, D., Månson, J.-A. E., Timmermans, P.H.M., Bouten, P.C.P., Templier, F.

“…The crack onset strain (COS) of 4-level thin film transistor (TFT) devices on both steel foils and thin polyimide (PI) films was investigated using tensile…”
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RF sputtering deposition of Ag/ITO coatings at room temperature by Bertran, E., Corbella, C., Vives, M., Pinyol, A., Person, C., Porqueras, I.

“…Indium tin oxide (ITO) thin films were deposited on unheated polyester and glass substrates by RF sputtering from ceramic ITO and metal targets. ITO films…”
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Preparation of metal (W, Mo, Nb, Ti) containing a-C:H films by reactive magnetron sputtering by Corbella, C., Vives, M., Pinyol, A., Bertran, E., Canal, C., Polo, M.C., Andújar, J.L.

“…We discuss the preparation of metal containing hydrogenated amorphous carbon (a-C:H) thin films by means of reactive magnetron sputtering with pulsed d.c…”
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Influence of the porosity of RF sputtered Ta2O5 thin films on their optical properties for electrochromic applications by Corbella, C, Vives, M, Pinyol, A, Porqueras, I, Person, C, Bertran, E

“…Thin films of Ta2O5 were deposited at room temperature by RF-magnetron reactive sputtering from a tantalum oxide target. Fused silica, aluminised glasses and…”
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Characteristics of e-beam deposited electrochromic CeO2 thin films by Porqueras, I, Person, C, Corbella, C, Vives, M, Pinyol, A, Bertran, E

“…Cerium oxide (CeO2) thin films were deposited by e-beam PVD on various substrates, such as glass, ITO-coated glass, Si wafers and fused silica. Substrate…”
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Si3N4 single-crystal nanowires grown from silicon micro- and nanoparticles near the threshold of passive oxidation by Farjas Silva, Jordi, Rath, Chandana, Pinyol i Agelet, Albert, Roura Grabulosa, Pere, Bertrán Serra, Enric

“…A simple and most promising oxide-assisted catalyst-free method is used to prepare silicon nitride nanowires that give rise to high yield in a short time…”
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Kinetic study of the oxide-assisted catalyst-free synthesis of silicon nitride nanowires by Farjas, J., Pinyol, A., Rath, Chandana, Roura, P., Bertran, E.

“…The synthesis of Si3N4 nanowires from the reaction of silicon nanoparticles with N2 in the 1200–1440 °C temperature range is reported. The nitridation…”
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Comparative study of metal/amorphous-carbon multilayer structures produced by magnetron sputtering by Bertran, E., Corbella, C., Pinyol, A., Vives, M., Andújar, J.L.

“…The present study discusses the structural and mechanical properties of metal/amorphous carbon (a-C) multilayer structures of a-C/Mo/a-C/…/Mo/substrate and…”
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Si 3 N 4 single-crystal nanowires grown from silicon micro- and nanoparticles near the threshold of passive oxidation by Farjas, J., Rath, Chandana, Pinyol, A., Roura, P., Bertran, E.

“…A simple and most promising oxide-assisted catalyst-free method is used to prepare silicon nitride nanowires that give rise to high yield in a short time…”
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Effects of gas pressure and r.f. power on the growth and properties of magnetron sputter deposited amorphous carbon thin films by Andújar, J.L., Pino, F.J., Polo, M.C., Pinyol, A., Corbella, C., Bertran, E.

“…We discuss the effects of both the electrical power supplied to an r.f. magnetron discharge and the Ar gas pressure on the growth of amorphous carbon (a-C)…”
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Degradation of a solid state electrochromic device by Person, C, Porqueras, I, Vives, M, Corbella, C, Pinyol, A, Bertran, E

“…A full monolithic inorganic electrochromic device was deposited by means of plasma assisted physical vapor deposition. The layer stack was evaporated under…”
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FTIR phase-modulated ellipsometry characterization of hydrogenated amorphous silicon nitride thin films with embedded nanoparticles by Canillas, A., Pinyol, A., Sancho-Parramon, J., Ferré-Borrull, J., Bertran, E.

“…FTIR phase-modulated ellipsometry was used to characterize the time evolution of the optical properties of hydrogenated amorphous silicon nitride thin films…”
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Properties of W/a-C nanometric multilayers produced by RF-pulsed magnetron sputtering by Pinyol, A., Bertran, E., Corbella, C., Polo, M.C., Andújar, J.L.

“…Single-layer W and a-C thin films and multilayer W/a-C coatings were deposited by either continuous or pulsed RF magnetron sputtering. The films were deposited…”
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Influence of the porosity of RF sputtered Ta 2O 5 thin films on their optical properties for electrochromic applications by Corbella, C., Vives, M., Pinyol, A., Porqueras, I., Person, C., Bertran, E.

“…Thin films of Ta 2O 5 were deposited at room temperature by RF-magnetron reactive sputtering from a tantalum oxide target. Fused silica, aluminised glasses and…”
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Characteristics of e-beam deposited electrochromic CeO 2 thin films by Porqueras, I., Person, C., Corbella, C., Vives, M., Pinyol, A., Bertran, E.

“…Cerium oxide (CeO 2) thin films were deposited by e-beam PVD on various substrates, such as glass, ITO-coated glass, Si wafers and fused silica. Substrate…”
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Preparation of metal (W, Mo, Nb, Ti) containing a-C:H films by reactive magnetron sputtering by CORBELLA, C, VIVES, M, PINYOL, A, BERTRAN, E, CANAL, C, POLO, M. C, ANDUJAR, J. L

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FTIR phase-modulated ellipsometry characterization of hydrogenated amorphous silicon nitride thin films with embedded nanoparticles by CANILLAS, A, PINYOL, A, SANCHO-PARRAMON, J, FERRE-BORRULL, J, BERTRAN, E

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Kinetic study of the oxide-assisted catalyst-free synthesis of silicon nitride nanowires by Farjas, J, Pinyol, A, Rath, Chandana, Roura, P, Bertran, E

“…phys. stat. sol. (a) 203, No. 6, 1307-1312 (2006) The synthesis of Si3N4 nanowires from the reaction of silicon nanoparticles with N2 in the 1200-1440 C…”
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Si3N4 single-crystal nanowires grown from silicon micro and nanoparticles near the threshold of passive oxidation by Farjas, J, Rath, C, Pinyol, A, Roura, P, Bertran, E

“…Appl. Phys. Lett. 87, 192114 (2005) A simple and most promising oxide-assisted catalyst-free method is used to prepare silicon nitride nanowires that give rise…”
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