Fabrication and characterization of sub-500 nm channel organic field effect transistor using UV nanoimprint lithography with cheap Si-mold

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Bibliographic Details
Published in:	Microelectronic engineering Vol. 97; pp. 38 - 42
Main Authors:	LICHAO TENG, KIRCHNERA, Robert, PIÖTNER, Matthias, TÜRKE, Alexander, JAHN, Andreas, JIAN HE, HAGEMANN, Falk, FISCHERA, Wolf-Joachim
Format:	Journal Article
Language:	English
Published:	Amsterdam Elsevier 01-09-2012
Subjects:	Applied sciences Cross-disciplinary physics: materials science; rheology Electronics Exact sciences and technology Materials science Methods of nanofabrication Microelectronic fabrication (materials and surfaces technology) Nanolithography Nanoscale pattern formation Physics Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Transistors Gold UV-nanoimprint lithography Short channel Drain Nanolithography IV-VI compound Opaque Si-mold Field effect transistor Organic transistor Lift off Microelectronic fabrication Ultraviolet radiation Thiophene derivative polymer UV lithography Silicon oxides p type semiconductor Short channel effect Silicon Lift-off process Photolithography Electrical characteristic Organic electronics
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ISSN:	0167-9317 1873-5568
DOI:	10.1016/j.mee.2012.04.004