Search Results - "PARMETER, J"

The thermal stability of diamond-like carbon by Tallant, D.R., Parmeter, J.E., Siegal, M.P., Simpson, R.L.

“…Diamond-like carbon (DLC) is a potential, low-cost substitute for diamond in certain applications, but little is known of the temperature range over which its…”
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Quantitative calibration of vapor levels of TNT, RDX, and PETN using a diffusion generator with gravimetry and ion mobility spectrometry by Eiceman, G.A., Preston, D., Tiano, G., Rodriguez, J., Parmeter, J.E.

“…A prototype generator for creating a continuous stream of explosive vapor was referenced quantitatively both to a standard weight from the National Institute…”
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High temperature electron cyclotron resonance etching of GaN, InN, and AlN by Shul, R. J., Kilcoyne, S. P., Hagerott Crawford, M., Parmeter, J. E., Vartuli, C. B., Abernathy, C. R., Pearton, S. J.

“…Electron cyclotron resonance etch rates for GaN, InN, and AlN are reported as a function of temperature for Cl2/H2/CH4/Ar and Cl2/H2/Ar plasmas. Using…”
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Interaction of ethylene with the Ru(001) surface by HILLS, M. M, PARMETER, J. E, MULLINS, C. B, WEINBERG, W. H

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Interaction of formamide with the Ru(001) surface by Parmeter, J. E, Schwalke, U, Weinberg, W. H

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High density plasma etching of III–V nitrides by Vartuli, C. B., Pearton, S. J., Abernathy, C. R., Shul, R. J., Howard, A. J., Kilcoyne, S. P., Parmeter, J. E., Hagerott‐Crawford, M.

“…Two broad classes of plasma chemistry were examined for dry etching of GaN, AlN, and InN. The etch rates for CH4/H2‐based plasmas are low (∼ 400 Å/min) even…”
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Interaction of acetylene with the Ru(001) surface by PARMETER, J. E, HILLS, M. M, WEINBERG, W. H

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Chemical additives for improved copper chemical vapour deposition processing by Norman, John A.T., Roberts, David A., Hochberg, Arthur K., Smith, Paul, Petersen, Gary A., Parmeter, John E., Apblett, Chris A., Omstead, Thomas R.

“…Techniques for improved copper chemical vapour deposition (CVD) processing by the addition of trimethylvinylsilane (tmvs) and hexafluoroacetylacetone (Hhfac)…”
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Coadsorption of hydrogen and ethylene, and carbon monoxide and ethylene on the Ru(001) surface by HILLS, M. M, PARMETER, J. E, WEINBERG, W. H

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Isolation and characterization of vinylidene from the dehydrogenation of ethylidyne on the Ru(001) p(2.times.2)O surface by Hills, M. M, Parmeter, J. E, Weinberg, W. H

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The chemistry of acetylene on the Ru(001)-p(2×2)O and Ru(001)-p(1×2)O surfaces by PARMETER, J. E, HILLS, M. M, WEINBERG, W. H

“…The chemisorption and decomposition of acetylene on Ru(001) surfaces with ordered p(2{times}2) and p(1{times}2) overlayers of oxygen adatoms has been studied…”
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Chemisorption and reaction of ethylene on chemically modified Ru(001) surfaces by HILLS, M. M, PARMETER, J. E, WEINBERG, W. H

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The coadsorption of hydrogen and acetylene on the Ru(001) surface by PARMETER, J. E, HILLS, M. M, WEINBERG, W. H

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Interaction of formamide with the Ru(001)-p(1×2)-O surface by PARMETER, J. E, SCHWALKE, U, WEINBERG, W. H

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Copper CVD chemistry on a reactive substrate : Cu(hfac)2 and hfacH on Pt(111) by PARMETER, J. E

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Interaction of formamide with the ruthenium(001)-p(1.times.2)-O surface by Parmeter, J. E, Schwalke, U, Weinberg, W. H

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Chemisorption and thermal decomposition of methylamine on the Ru(001) surface by JOHNSON, D. F, YOUQI WANG, PARMETER, J. E, HILLS, M. M, HENRY WEINBERG, W

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The chemistry of acetylene on the ruthenium(001)-p(2X2)0 and ruthenium(001)-p(1X2)0 surfaces by Parmeter, J. E, Hills, M. M, Weinberg, W. H

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Adsorption of formamide on the Ru(001)-p(1 .times. 2)-O-surface: the spectroscopic identification of .eta.2(N,O)-NHCHO by Parmeter, J. E, Schwalke, U, Weinberg, W. H

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Chemisorption and reaction of ethylene on chemically modified ruthenium(001) surfaces by Hills, M. M, Parmeter, J. E, Weinberg, W. H

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