Search Results - "Ostinelli, Olivier"
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Low-Noise Microwave Performance of 30 nm GaInAs MOS-HEMTs: Comparison to Low-Noise HEMTs
Published in IEEE electron device letters (01-09-2020)“…GaInAs-based Metal Oxide Semiconductor High Electron Mobility Transistors (MOS-HEMTs) can in principle combine the wide bandwidth of HEMTs to the low gate…”
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High-Speed Steep-Slope GaInAs Impact Ionization MOSFETs (I-MOS) With SS = 1.25 mV/dec-Part I: Material and Device Characterization, DC Performance, and Simulation
Published in IEEE transactions on electron devices (01-07-2022)“…Digital electronics power consumption evolved into a major concern: at the current pace, general-purpose computing energy consumption will exceed global energy…”
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3
High-Speed Steep-Slope GaInAs Impact Ionization MOSFETs (I-MOS) With SS = 1.25 mV/dec-Part II: Dynamic Switching and RF Performance
Published in IEEE transactions on electron devices (01-07-2022)“…Part I of this work described narrow bandgap GaInAs-based I-MOS devices with a minimum steep slope <inline-formula> <tex-math notation="LaTeX">SS_{min}…”
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Si/SiGe:C and InP/GaAsSb Heterojunction Bipolar Transistors for THz Applications
Published in Proceedings of the IEEE (01-06-2017)“…This paper presents Si/SiGe:C and InP/GaAsSb HBTs which feature specific assets to address submillimeter-wave and THz applications. Process and modeling status…”
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High Power InP/Ga(In)AsSb DHBTs for Millimeter-Wave PAs: 14.5 dBm Output Power and 10.4 mw/μm2 Power Density at 94 GHz
Published in IEEE journal of microwaves (01-10-2022)“…We report the 94 GHz large-signal load-pull performance of (0.3 × 9) μm 2 InP/Ga(In)AsSb double heterojunction bipolar transistors (DHBTs) in the…”
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Advances in InP/Ga(In)AsSb double heterojunction bipolar transistors (DHBTs)
Published in Japanese Journal of Applied Physics (01-04-2019)“…Double heterojunction bipolar transistors (DHBTs) are intended to extend the breakdown voltage beyond what is possible in single heterojunction bipolar…”
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InP/GaAsSb DHBTs Fabricated in a Low-Temperature Teflon Planarization Process
Published in IEEE electron device letters (01-08-2012)“…We demonstrate InP/GaAsSb/InP double heterojunction bipolar transistors (HBTs) fabricated in a low-temperature planarization process based on a spin-on Teflon…”
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8
Multiscale Compact Modelling of UTC-Photodiodes Enabling Monolithic Terahertz Communication Systems Design
Published in Applied sciences (01-12-2021)“…Due to the continuous increase in data traffic, it is becoming imperative to develop communication systems capable of meeting the throughput requirements…”
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Uniform-Base InP/GaInAsSb DHBTs Exhibiting f/f>635/420
Published in IEEE electron device letters (01-02-2014)“…Type-II InP/GaInAsSb-based double heterojunction bipolar transistors (DHBTs) with f MAX =636 GHz and a simultaneous f T =424 GHz were realized with a…”
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10
Dual Gate HEMT: Compact Cascode for Low-Noise Amplification
Published in 2024 15th Global Symposium on Millimeter-Waves & Terahertz (GSMM) (20-05-2024)“…The present work compares single-gate (SG) and dual-gate (DG) HEMTs from a low-noise amplification perspective. Experimental results, obtained through RF and…”
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Conference Proceeding -
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Wideband Type-II GaInAsSb/InP Uni-Traveling Carrier Photodiodes for Near 300 Gbps Communications
Published in Journal of lightwave technology (15-04-2024)“…We report the wideband performance of uniform Type-II GaInAsSb/InP UTC-PDs for optical data communications near 300 Gbps. A wide bandwidth of…”
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InP/GaAsSb Double Heterojunction Bipolar Transistor Emitter-Fin Technology With fMAX = 1.2 THz
Published in IEEE transactions on electron devices (01-04-2022)“…We report a new InP/GaAsSb double heterojunction bipolar transistor (DHBT) emitter fin architecture with a record <inline-formula> <tex-math…”
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13
InAs Channel Inset Effects on the DC, RF, and Noise Properties of InP pHEMTs
Published in IEEE transactions on electron devices (01-11-2019)“…GaInAs/InAs composite channels in InP-based pHEMTs enable wideband and/or low-noise performances because of their superior carrier transport properties. To…”
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14
Impact of Reduced Gate‐to‐Source Spacing on Indium Phosphide High Electron Mobility Transistor Performance
Published in Physica status solidi. A, Applications and materials science (01-02-2021)“…Indium phosphide (InP)‐based high electron mobility transistors (HEMTs) with an offset gate enable higher maximum oscillation frequency (fMAX) values because…”
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Type-II GaInAsSb/InP Uniform Absorber High Speed Uni-Traveling Carrier Photodiodes
Published in Journal of lightwave technology (01-04-2021)“…We report uniform Type-II GaInAsSb/InP UTC-PDs, and compare their performance to devices fabricated with GaAsSb uniform and graded (composition and doping)…”
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InP/GaAsSb Double Heterojunction Bipolar Transistor Emitter-Fin Technology With f MAX = 1.2 THz
Published in IEEE transactions on electron devices (01-04-2022)“…[Formula Omitted] larger than previously reported terahertz (THz) DHBTs, representing a breakthrough in THz transistor scalability. This attractive performance…”
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A Multiscale TCAD Approach for the Simulation of InP DHBTs and the Extraction of Their Transit Times
Published in IEEE transactions on electron devices (01-12-2019)“…A multiscale technology computer-aided design (TCAD) simulation methodology is presented to calculate the intrinsic transit time of InP double heterojunction…”
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18
GaAsSb-Based DHBTs With a Reduced Base Access Distance and f}/f}= 503/780 GHz
Published in IEEE electron device letters (01-12-2014)“…We report InP/GaAsSb/InP double heterojunction bipolar transistors (DHBTs) with simultaneous current and power gain cutoff frequencies of f T /f MAX = 503/780…”
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Quaternary Graded-Base InP/GaInAsSb DHBTs With } / } = 547/784 GHz
Published in IEEE electron device letters (01-08-2018)“…We report a "Type-II" metal-organic chemical vapor deposition (MOCVD)-grown compositionally graded quaternary base InP/GaInAsSb/InP double heterojunction…”
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20
Pt Gate Sink-In Process Details Impact on InP HEMT DC and RF Performance
Published in IEEE transactions on semiconductor manufacturing (01-11-2017)“…A Pt/Ti/Pt/Au gate electrode stack is commonly used in AlInAs/GaInAs/InP high electron mobility transistors due to the high Schottky barrier height of Pt on…”
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