Search Results - "Opsal, J."

Analytic representations of the dielectric functions of materials for device and structural modeling by Leng, J., Opsal, J., Chu, H., Senko, M., Aspnes, D.E.

“…Analytic representations of the dielectric function ε are needed for the analysis of optical data of complex materials and structures. Here, we examine various…”
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Broadband spectral operation of a rotating-compensator ellipsometer by Opsal, J., Fanton, J., Chen, J., Leng, J., Wei, L., Uhrich, C., Senko, M., Zaiser, C., Aspnes, D.E.

“…We show that a rotating-compensator ellipsometer (RCE) with a zero-order retarder can be used for broadband spectroscopy, for example from 200 to 800 nm, when…”
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Nonlinear fundamental photothermal response : Experimental results for tungsten by SALNICK, A, OPSAL, J, ROSENCWAIG, A, MANDELIS, A

“…A quantitative analysis based on a new three-dimensional nonlinear theoretical model of the experimental fundamental nonlinear photothermal response from…”
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Combined beam profile reflectometry, beam profile ellipsometry and ultraviolet-visible spectrophotometry for the characterization of ultrathin oxide-nitride-oxide films on silicon by Leng, J. M., Opsal, J., Aspnes, D. E.

“…We show that a combination of beam profile reflectometry, beam profile ellipsometry, and deep ultraviolet-visible spectroreflectometry can accurately…”
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Characterization of titanium nitride (TiN) films on various substrates using spectrophotometry, beam profile reflectometry, beam profile ellipsometry and spectroscopic beam profile ellipsometry by Leng, J.M., Chen, J., Fanton, J., Senko, M., Ritz, K., Opsal, J.

“…Titanium nitride (TiN) films on various substrates (Si, 1000 Å of oxide on Si, and Al) were characterized using spectrophotometry, beam-profile reflectometry…”
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Analytic representations of the dielectric functions of crystalline and amorphous Si and crystalline Ge for very large scale integrated device and structural modeling by Leng, J., Opsal, J., Chu, H., Senko, M., Aspnes, D. E.

“…Various representations of the dielectric functions of semiconducting materials have been proposed. We compare five different models for representing the…”
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Simultaneous measurement of six layers in a silicon on insulator film stack using visible-near-IR spectrophotometry and single-wavelength beam profile reflectometry by Leng, J.M., Sidorowich, J.J., Senko, M., Opsal, J.

“…Visible-near-IR spectrophotometry was combined with single-wavelength beam profile reflectometry to measure all six layer thicknesses of a silicon on oxide…”
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Thermal Wave Imaging with Thermoacoustic Detection by Rosencwaig, A., Opsal, J.

“…Thermoacoustic imaging is a new technique that permits the detection and imaging of microscopic surface and subsurface features in a sample. A detailed…”
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Superconductivity in Lightly Doped Crystalline Bismuth by Uher, C., Opsal, J. L.

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Detection of thermal waves through optical reflectance by ROSENCWAIG, A, OPSAL, J, SMITH, W. L, WILLENBERG, D. L

“…We show that thermal wave detection and analysis can be performed, in a noncontact and highly sensitive manner, through the dependence of sample optical…”
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Thermal and plasma wave depth profiling in silicon by OPSAL, J, ROSENCWAIG, A

“…We describe a depth-profiling concept using the critically damped plasma wave corresponding to the propagation of the free-carrier plasma density generated by…”
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Thickness and Topography of Dielectric Dual-Sidewall Spacers on Metal Gate of DRAM Extracted by Spectroscopic Ellipsometry by Jun-Wei Gong, Yeh-Chang Fang, Ta-Yung Wang, Jia-Rui Hu, Chung-I Chang, Tings Wang, Shih-Jung Lee, Opsal, J., Nicolaides, L.

“…As the design rule of devices decreases with shrinking gate width dimensions, the properties of sidewall layers are becoming increasingly important for…”
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Beam profile reflectometry : a new technique for dielectric film measurements by ROSENCWAIG, A, OPSAL, J, WILLENBORG, D. L, KELSO, S. M, FANTON, J. T

“…We describe a new technique for measuring the thickness and optical constants of dielectric, semiconducting, and thin metal films. Beam profile reflectometry…”
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Simultaneous measurement of six layers in a silicon on insulator film stack using visible-near-IR spectrophotometry and single-wavelength beam profile reflectometry by LENG, J. M, SIDOROWICH, J. J, SENKO, M, OPSAL, J

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Thin-film thickness measurements with thermal waves by ROSENCWAIG, A, OPSAL, J, WILLENBORG, D. L

“…We have developed a method for measuring the thickness of thin films that is nondestructive, noncontact and that can make measurements with 2-μm spatial…”
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Characterization of titanium nitride (TiN) films on various substrates using spectrophotometry, beam profile reflectometry, beam profile ellipsometry and spectroscopic beam profile ellipsometry by LENG, J. M, CHEN, J, FANTON, J, SENKO, M, RITZ, K, OPSAL, J

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Analytic representations of the dielectric functions of materials for device and structural modeling by LENG, J, OPSAL, J, CHU, H, SENKO, M, ASPNES, D. E

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Broadband spectral operation of a rotating-compensator ellipsometer by OPSAL, J, FANTON, J, CHEN, J, LENG, J, WEI, L, SENKO, C. U. M, ZAISER, C, ASPNES, D. E

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Superconductivity in Lightly Doped Crystalline Bi by Uher, C, Opsal, J L

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Nondestructive analysis of ultrashallow junction implant damage by combined technology of thermal wave and spectroscopic methods by Hovinen, Minna, Opsal, Jon

“…Boron and arsenic low-energy (200–5000 eV) implants are studied after implantation, prior to annealing. We present results of optical measurements that provide…”
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