Search Results - "Onstine, A.H."

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  1. 1

    Effect of ozone cleaning on Pt/Au and W/Pt/Au Schottky contacts to n-type ZnO by Ip, K, Gila, B.P, Onstine, A.H, Lambers, E.S, Heo, Y.W, Baik, K.H, Norton, D.P, Pearton, S.J, Kim, S, LaRoche, J.R, Ren, F

    Published in Applied surface science (15-09-2004)
    “…The role of UV ozone cleaning on the characteristics of Pt contacts on n-type (n∼1017cm−3) bulk single-crystal zinc oxide (ZnO) is reported. The contacts are…”
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    Journal Article
  2. 2

    Effects of Sc2O3 and MgO passivation layers on the output power of AlGaN/GaN HEMTs by Gillespie, J.K., Fitch, R.C., Sewell, J., Dettmer, R., Via, G.D., Crespo, A., Jenkins, T.J., Luo, B., Mehandru, R., Kim, J., Ren, F., Gila, B.P., Onstine, A.H., Abernathy, C.R., Pearton, S.J.

    Published in IEEE electron device letters (01-09-2002)
    “…The low temperature (100/spl deg/C) deposition of Sc 2 O 3 or MgO layers is found to significantly increase the output power of AlGaN/GaN HEMTs. At 4 GHz,…”
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    Journal Article
  3. 3

    Novel dielectrics for gate oxides and surface passivation on GaN by Gila, B.P., Thaler, G.T., Onstine, A.H., Hlad, M., Gerger, A., Herrero, A., Allums, K.K., Stodilka, D., Jang, S., Kang, B., Anderson, T., Abernathy, C.R., Ren, F., Pearton, S.J.

    Published in Solid-state electronics (01-06-2006)
    “…We review recent progress in obtaining low interface state densities on GaN and reducing current collapse with dielectrics on AlGaN/GaN high electron mobility…”
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    Journal Article Conference Proceeding
  4. 4

    Gadolinium Oxide and Scandium Oxide: Gate Dielectrics for GaN MOSFETs by Gila, B.P., Johnson, J.W., Mehandru, R., Luo, B., Onstine, A.H., Krishnamoorthy, V., Bates, S., Abernathy, C.R., Ren, F., Pearton, S.J.

    Published in Physica status solidi. A, Applied research (01-11-2001)
    “…Scandium oxide was deposited epitaxially on (0001) GaN via gas‐source molecular beam epitaxy (GSMBE) using elemental Sc and an electron cyclotron resonance…”
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    Journal Article Conference Proceeding
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    New applications advisable for gallium nitride by Pearton, S.J., Abernathy, C.R., Overberg, M.E., Thaler, G.T., Onstine, A.H., Gila, B.P., Ren, F., Lou, B., Kim, J.

    Published in Materials today (Kidlington, England) (30-06-2002)
    “…GaN-based visible light-emitting diodes and laser diodes are already commercialized for a variety of lighting and data storage applications. This materials…”
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    Journal Article
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    Small signal measurement of Sc 2O 3 AlGaN/GaN moshemts by Luo, B., Mehandru, R., Kang, B.S., Kim, J., Ren, F., Gila, B.P., Onstine, A.H., Abernathy, C.R., Pearton, S.J., Gotthold, D., Birkhahn, R., Peres, B., Fitch, R., Gillespie, J.K., Jenkins, T., Sewell, J., Via, D., Crespo, A.

    Published in Solid-state electronics (2004)
    “…The rf performance of 1 × 200 μm 2 AlGaN/GaN MOS-HEMTs with Sc 2O 3 used as both the gate dielectric and as a surface passivation layer is reported. A maximum…”
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    Journal Article
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    Proton irradiation of MgO- or Sc 2O 3 passivated AlGaN/GaN high electron mobility transistors by Luo, B., Ren, F., Allums, K.K., Gila, B.P., Onstine, A.H., Abernathy, C.R., Pearton, S.J., Dwivedi, R., Fogarty, T.N., Wilkins, R., Fitch, R.C., Gillespie, J.K., Jenkins, T.J., Dettmer, R., Sewell, J., Via, G.D., Crespo, A., Baca, A.G., Shul, R.J.

    Published in Solid-state electronics (2003)
    “…AlGaN/GaN high electron mobility transistors with either MgO or Sc 2O 3 surface passivation were irradiated with 40 MeV protons at a dose of 5×10 9 cm −2…”
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    Journal Article
  14. 14

    The role of cleaning conditions and epitaxial layer structure on reliability of Sc 2O 3 and MgO passivation on AlGaN/GaN HEMTS by Luo, B, Mehandru, R.M, Kim, Jihyun, Ren, F, Gila, B.P, Onstine, A.H, Abernathy, C.R, Pearton, S.J, Fitch, R.C, Gillespie, J, Dellmer, R, Jenkins, T, Sewell, J, Via, D, Crespo, A

    Published in Solid-state electronics (2002)
    “…The effect of layer structure (GaN versus AlGaN cap) and cleaning procedure prior to Sc 2O 3 or MgO deposition at 100 °C were examined for their effects on the…”
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    Journal Article
  15. 15

    New Dielectrics for Gate Oxides and Surface Passivation on GaN by Gila, B.P., Thaler, G.T., Onstine, A.H., Hlad, M., Gerger, A., Herrero, A., Allums, K.K., Stodilka, D., Jang, S., Kang, B., Anderson, T., Abernathy, C.R., Ren, F., Pearton, S.J.

    “…In this paper, the authors report the nitride surface preparation and growth of these crystalline oxide dielectrics, efforts to improve the oxide/nitride…”
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    Conference Proceeding
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