Search Results - "Olifan, O.I."

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  1. 1

    Isothermal section of the ZrO2–HfO2–Nd2O3 ternary phase diagram at 1100 °C by Korniienko, O.A., Yurchenko, Yu.V., Olifan, O.I., Samelyuk, A.V., Zamula, M.V.

    Published in Hybrid Advances (01-12-2023)
    “…In the presented work, based on the results obtained by X-ray diffraction and microstructural analysis, phase equilibria have been studied and an isothermal…”
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    Journal Article
  2. 2

    Experimental study of isothermal sections of the ZrO2–HfO2–Eu2O3 ternary diagram at 1500 °С and 1700 °С by Yurchenko, Yu.V, Kornienko, O.A, Olifan, O.I., Sameliuk, A.V., Yushkevych, S.V., Zamula, M.V.

    Published in Calphad (01-09-2024)
    “…In the present work the phase equilibria in a system of zirconium and hafnium dioxides and europium sesquioxide have been studied. The study was conducted at…”
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    Journal Article
  3. 3

    Structural, vibrational and photodegradation properties of CuAl2O4 films by Myroniuk, L.A., Dusheyko, M.G., Karpyna, V.A., Myroniuk, D.V., Bykov, O.I., Olifan, O.I., Kolomys, O.F., Strelchuk, V.V., Korchovyi, A.A., Starik, S.P., Tkach, V.M., Ievtushenko, A.I.

    “…Cu–Al–O thin films were grown on Si (111) substrates by using the reactive ion-beam sputtering (RIBS) method within the temperature range 80 to 380 °C. The…”
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  4. 4

    The influence of substrate temperature on properties of Cu-Al-O films deposited using the reactive ion beam sputtering method by Ievtushenko, A.I.

    “…For the first time, Cu-Al-O films were grown using the reactive ion beam sputtering at temperatures ranging from 80 to 380 °C in 50 °C increments. Correlations…”
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