Search Results - "Okholin, P.N."

Plasma treatment as a versatile tool for tuning of sorption properties of thin nanoporous carbon films by Slobodian, O.M., Okholin, P.N., Lytvyn, P.M., Malyuta, S.V., Khyzhun, O.Yu, Vasin, A.V., Rusavsky, A.V., Gomeniuk, Yu.V., Glotov, V.I., Nazarova, T.M., Gudymenko, O.I., Nazarov, A.N.

“…[Display omitted] •Functionalization of nanoporous carbon films through plasma treatment is proposed.•Hydrophilicity of graphitic surface grows significantly…”
Get full text

RF plasma treatment of shallow ion-implanted layers of germanium by Okholin, P.N., Glotov, V.I., Nazarov, A.N., Yuchymchuk, V.O., Kladko, V.P., Kryvyi, S.B., Lytvyn, P.M., Tiagulskyi, S.I., Lysenko, V.S., Shayesteh, M., Duffy, R.

“…RF plasma annealing (RFPA) and rapid thermal annealing (RTA) of high-dose implanted n-type and p-type amorphized Ge layers have been studied by Raman…”
Get full text

Study of the processes of carbonization and oxidation of porous silicon by Raman and IR spectroscopy by Vasin, A. V., Okholin, P. N., Verovsky, I. N., Nazarov, A. N., Lysenko, V. S., Kholostov, K. I., Bondarenko, V. P., Ishikawa, Y.

“…Porous silicon layers were produced by electrochemical etching of single-crystal silicon wafers with the resistivity 10 Ω cm in the aqueous-alcohol solution of…”
Get full text