Search Results - "Okamoto, Hidekazu"

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  1. 1

    Development of New Low-GWP Refrigerants-Refrigerant Mixtures Including HFO-1123 by Hashimoto, Mai, Otsuka, Tetsuo, Fukushima, Masato, Okamoto, Hidekazu, Hayamizu, Hiroki, Ueno, Katsuya, Akasaka, Ryo

    Published in HVAC&R research (03-07-2019)
    “…New refrigerants with low global warming potential (GWP) are currently being developed to replace conventional higher GWP refrigerants. Recently, we have…”
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    Journal Article
  2. 2

    Analysis of disproportionation process of trifluoroethylene mixtures by Otsuka, Tetsuo, Ueno, Katsuya, Okamoto, Hidekazu, Ippommatsu, Masamichi, Dobashi, Ritsu

    “…Trifluoroethylene (HFO-1123) and its mixtures are useful as the next generation refrigerants because their global warming potential (GWP) are lower than that…”
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    Journal Article
  3. 3

    Analysis of disproportionation process of trifluoroethylene using high power spark ignitions over 5 J by Otsuka, Tetsuo, Ueno, Katsuya, Okamoto, Hidekazu, Ippommatsu, Masamichi, Dobashi, Ritsu

    “…Trifluoroethylene and its mixtures are useful as next generation refrigerants because of their lower global warming potential (GWP) than that of those…”
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    Journal Article
  4. 4

    Theoretical study of disproportionation reaction of fluorinated ethylenes by Fukaya, Haruhiko, Hayakawa, Yoshio, Okamoto, Hidekazu, Ueno, Katsuya, Otsuka, Tetsuo

    Published in Journal of fluorine chemistry (01-08-2017)
    “…[Display omitted] •The disproportionation mechanism of fluorinated ethylenes such as tetrafluoroethylene and trifluoroethylene is proposed.•The…”
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  5. 5

    The role of a low glomerular density and being overweight in the etiology of proteinuria in CKD patients without known glomerular diseases by Okamoto, Hidekazu, Kawamura, Tetsuya, Okonogi, Hideo, Tsuboi, Nobuo, Miyazaki, Yoichi, Yokoo, Takashi

    Published in Clinical and experimental nephrology (01-12-2014)
    “…Background Among the proteinuric patients with chronic kidney disease (CKD) who undergo a renal biopsy, we sometimes encounter those who cannot be classified…”
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  6. 6

    Etching Enhancement Followed by Nitridation on Low-$k$ SiOCH Film in Ar/C5F10O Plasma by Miyawaki, Yudai, Shibata, Emi, Kondo, Yusuke, Takeda, Keigo, Kondo, Hiroki, Ishikawa, Kenji, Okamoto, Hidekazu, Sekine, Makoto, Hori, Masaru

    Published in Jpn J Appl Phys (01-02-2013)
    “…The etching rates of low-dielectric-constant (low-$k$), porous SiOCH (p-SiOCH) films were increased by nitrogen-added Ar/C 5 F 10 O plasma etching in…”
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    Journal Article
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    Photo-on-demand Phosgenation Reactions with Chloroform Triggered by Cl2 upon Irradiation with Visible Light: Syntheses of Chloroformates, Carbonate Esters, and Isocyanates by Suzuki, Yuto, Liang, Fengying, Okazoe, Takashi, Okamoto, Hidekazu, Takeuchi, Yu, Tsuda, Akihiko

    Published in Chemistry letters (01-05-2022)
    “…Chloroform (CHCl3) upon bubbling with O2 containing ∼2% Cl2 underwent oxidative photochemical conversion to phosgene (COCl2) when exposed to a white LED light…”
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    A New Route to Perfluoro(Propyl Vinyl Ether) Monomer: Synthesis of Perfluoro(2-propoxypropionyl) Fluoride from Non-Fluorinated Compounds by Okazoe, Takashi, Watanabe, Kunio, Itoh, Masahiro, Shirakawa, Daisuke, Murofushi, Hidenobu, Okamoto, Hidekazu, Tatematsu, Shin

    Published in Advanced synthesis & catalysis (26-02-2001)
    “…Perfluoro(2‐propoxypropionyl) fluoride (1a), which is the precursor of the perfluorinated propyl vinyl ether (PPVE) monomer of an industrially important…”
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    Journal Article
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    Is Granular Formulation of Lanthanum Carbonate More Effective than Chewable Tablets? by Okamoto, Hidekazu, Haruhara, Koutarou, Kamejima, Sahoko, Mafune, Hana, Manabe, Mayumi, Kanzaki, Goh, Mashiko, Hiroshi, Yokoo, Takashi

    Published in Therapeutic apheresis and dialysis (01-06-2014)
    “…Maintenance dialysis patients at our hospital who had been receiving lanthanum carbonate (LC) chewable tablets were switched to the same dosage of the…”
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    Journal Article
  14. 14

    Etching Enhancement Followed by Nitridation on Low-k SiOCH Film in Ar/C 5 F 10 O Plasma by Miyawaki, Yudai, Shibata, Emi, Kondo, Yusuke, Takeda, Keigo, Kondo, Hiroki, Ishikawa, Kenji, Okamoto, Hidekazu, Sekine, Makoto, Hori, Masaru

    Published in Japanese Journal of Applied Physics (01-02-2013)
    “…The etching rates of low-dielectric-constant (low- k ), porous SiOCH (p-SiOCH) films were increased by nitrogen-added Ar/C 5 F 10 O plasma etching in…”
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    Journal Article
  15. 15

    Etching Enhancement Followed by Nitridation on Low-k SiOCH Film in Ar/C sub(5)F sub(10)O Plasma by Miyawaki, Yudai, Shibata, Emi, Kondo, Yusuke, Takeda, Keigo, Kondo, Hiroki, Ishikawa, Kenji, Okamoto, Hidekazu, Sekine, Makoto, Hori, Masaru

    Published in Japanese Journal of Applied Physics (01-02-2013)
    “…The etching rates of low-dielectric-constant (low-k), porous SiOCH (p-SiOCH) films were increased by nitrogen-added Ar/C sub(5)F sub(10)O plasma etching in…”
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    Journal Article
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