Search Results - "Oka, Tohru"
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Identification of type of threading dislocation causing reverse leakage in GaN p–n junctions after continuous forward current stress
Published in Scientific reports (27-01-2022)“…Power devices are operated under harsh conditions, such as high currents and voltages, and so degradation of these devices is an important issue. Our group…”
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Effects of proton irradiation-induced point defects on Shockley–Read–Hall recombination lifetimes in homoepitaxial GaN p–n junctions
Published in Applied physics letters (13-03-2023)“…This work examined the intentional generation of recombination centers in GaN p–n junctions on freestanding GaN substrates. Irradiation with a 4.2 MeV proton…”
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Increase of reverse leakage current at homoepitaxial GaN p-n junctions induced by continuous forward current stress
Published in Applied physics letters (21-06-2021)“…Reliability tests involving the application of high electrical stresses were employed to assess GaN-based vertical p-n junctions fabricated on freestanding GaN…”
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Recent development of vertical GaN power devices
Published in Japanese Journal of Applied Physics (01-04-2019)“…Gallium nitride (GaN) is an attractive material for high-frequency and high-power devices. Due to the availability of relatively high-quality free-standing…”
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A High-Power Low-Distortion GaAs HBT Power Amplifier for Mobile Terminals Used in Broadband Wireless Applications
Published in IEEE journal of solid-state circuits (01-10-2007)“…This paper describes technologies of miniaturized high-power low-distortion GaAs HBT power amplifiers with a low-voltage operation for mobile terminals used in…”
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Journal Article Conference Proceeding -
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AlGaN/GaN Recessed MIS-Gate HFET With High-Threshold-Voltage Normally-Off Operation for Power Electronics Applications
Published in IEEE electron device letters (01-07-2008)“…This letter reports normally-off operation of an AlGaN/GaN recessed MIS-gate heterostructure field-effect transistor with a high threshold voltage. The…”
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100 A Vertical GaN Trench MOSFETs with a Current Distribution Layer
Published in 2019 31st International Symposium on Power Semiconductor Devices and ICs (ISPSD) (01-05-2019)“…This paper reports on vertical GaN-based trench MOSFETs operating at 100 A for the first time. A current distribution layer (CDL) in a drift layer is employed…”
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Conference Proceeding -
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Over 10 a operation with switching characteristics of 1.2 kV-class vertical GaN trench MOSFETs on a bulk GaN substrate
Published in 2016 28th International Symposium on Power Semiconductor Devices and ICs (ISPSD) (01-06-2016)“…In this paper, we demonstrate 1.2 kV-class vertical GaN trench MOSFETs fabricated on a bulk GaN substrate with high current and switching operations. The…”
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Conference Proceeding Journal Article -
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Fully strained heavily carbon-doped GaAs grown by gas-source molecular beam epitaxy using carbontetrabromide and its application to InGaP/GaAs heterojunction bipolar transistors
Published in Japanese Journal of Applied Physics (01-03-1997)“…The lattice-matching conditions in extremely heavily C-doped GaAs (GaAs:C) layers were systematically investigated by using X-ray diffraction measurements from…”
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Conference Proceeding Journal Article -
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Characterization of InGaP/GaAs Heterojunction Bipolar Transistors with a Heavily Doped Base
Published in Japanese Journal of Applied Physics (2001)“…Characteristics of InGaP/GaAs heterojunction bipolar transistors (HBTs) with a heavily doped base are examined at the base doping level N B ranging from 5×10…”
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Deposition Mechanisms of SiO 2 in Remote Plasma Chemical Vapor Deposition Analyzed by Spatially Resolved Mass Spectroscopy
Published in Japanese Journal of Applied Physics (01-07-1994)“…The decomposition of silane ( SiH 4 ) with activated neutral oxygen is investigated by spatially resolved quadrupole mass spectroscopy (QMS). SiH 4 molecules…”
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Single Crystalline Si Metal/Oxide/Semiconductor Field-Effect Transistors Using High-Quality Gate SiO 2 Deposited at 300°C by Remote Plasma Technique
Published in Japanese Journal of Applied Physics (01-01-1994)“…High-quality gate SiO 2 for metal/oxide/semiconductor field-effect transistors (MOSFETs) could be deposited at as low as 300° C in remote plasma chemical vapor…”
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Reliability issues of gate oxides and p-n junctions for vertical GaN metal-oxide-semiconductor field-effect transistors (Invited)
Published in 2023 IEEE International Reliability Physics Symposium (IRPS) (01-03-2023)“…We focus on reliability issues of gate oxides and p-n junctions to realize vertical GaN metal-oxide-semiconductor field-effect transistors (MOSFETs). An…”
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Conference Proceeding -
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Heart-sound analyzing apparatus
Published in The Journal of the Acoustical Society of America (2004)Get full text
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A WSi base electrode and a heavily-doped thin base layer for high-speed and low-power InGaP/GaAs HBTs
Published in Japanese Journal of Applied Physics (01-03-1997)“…The characteristics of a WSi base electrode and a heavily-doped thin base layer in InGaP/GaAs heterojunction bipolar transistors (HBTs) are demonstrated. An…”
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Conference Proceeding Journal Article -
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Recent topics of vertical GaN power devices
Published in 2017 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK) (01-06-2017)“…In this paper, recent topics of vertical GaN power devices fabricated on GaN substrates are presented with particular emphasis on SBDs and trench MOSFETs we…”
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Conference Proceeding -
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Application of hash to data base machine and its architecture
Published in New generation computing (01-03-1983)Get full text
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Endochondral ossification of the condyle in rats on a strontium or low-calcium diet
Published in Journal of oral and maxillofacial surgery (01-09-1985)“…The mechanism of abnormal endochondral ossification induced by administration of strontium salts was studied in the mandibular condyles of rats by…”
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Low turn-on voltage GaAs heterojunction bipolar transistors with a pseudomorphic GaAsSb base
Published in Applied physics letters (22-01-2001)“…We have developed GaAs heterojunction bipolar transistors (HBTs) with low turn-on voltage by using pseudomorphic GaAsSb as the base layer. The turn-on voltage…”
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