Search Results - "Ohshita, Y."

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  1. 1

    Analysis of interface workfunction and process-induced damage of reactive-plasma-deposited ITO/SiO2/Si stack by Kamioka, T., Hayashi, Y., Isogai, Y., Nakamura, K., Ohshita, Y.

    Published in AIP advances (01-09-2017)
    “…Workfunction of reactive-plasma deposited indium-tin-oxide (RPD-ITO) at the ITO/SiO2 interface, which is referred as interface workfunction, and the…”
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    Journal Article
  2. 2

    Novel material for super high efficiency multi-junction solar cells by Ohshita, Y., Suzuki, H., Kojima, N., Tanaka, T., Honda, T., Inagaki, M., Yamaguchi, M.

    Published in Journal of crystal growth (01-03-2011)
    “…For realizing a future four-junction solar cell InGaP/GaAs/InGaAsN/Ge with high conversion efficiency of over 40% (AM1.5G), we are developing the chemical beam…”
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    Journal Article Conference Proceeding
  3. 3

    In situ three-dimensional X-ray reciprocal-space mapping of GaAs epitaxial films on Si(001) by Takahasi, M., Nakata, Y., Suzuki, H., Ikeda, K., Kozu, M., Hu, W., Ohshita, Y.

    Published in Journal of crystal growth (01-09-2013)
    “…The molecular-beam epitaxial growth processes of GaAs on Si(001) were investigated using in situ synchrotron X-ray diffraction. Three-dimensional X-ray…”
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    Journal Article Conference Proceeding
  4. 4

    Study on defects and impurities in cast-grown polycrystalline silicon substrates for solar cells by Arafune, K., Sasaki, T., Wakabayashi, F., Terada, Y., Ohshita, Y., Yamaguchi, M.

    Published in Physica. B, Condensed matter (01-04-2006)
    “…We focused on the defects and impurities in polycrystalline silicon substrates, which deteriorate solar cell efficiency. Comparison of the minority carrier…”
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    Journal Article
  5. 5

    Evaluation of quantum confinement effect in nanocrystal Si dot layer by Raman spectroscopy by Mizukami, Y, Kosemura, D, Numasawa, Y, Ohshita, Y, Ogura, A

    Published in Journal of nanoscience and nanotechnology (01-11-2012)
    “…Quantum confinement effect in the nanocrystal-Si (nc-Si) was evaluated by Raman spectroscopy. The nc-Si dot layers were fabricated by the H2 plasma treatment…”
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    Journal Article
  6. 6

    Hydrogen reduction in GaAsN thin films by flow rate modulated chemical beam epitaxy by Saito, K., Nishimura, K., Suzuki, H., Ohshita, Y., Yamaguchi, M.

    Published in Thin solid films (01-04-2008)
    “…The amount of residual H in the GaAsN film grown by chemical beam epitaxy (CBE) can be decreased by flow rate modulation growth. Many H atoms in the films…”
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    Journal Article Conference Proceeding
  7. 7

    Microscopic and spectroscopic mapping of dislocation-related photoluminescence in multicrystalline silicon wafers by Inoue, M., Sugimoto, H., Tajima, M., Ohshita, Y., Ogura, A.

    “…Microscopic and spectroscopic photoluminescence (PL) mapping was performed on a region including intra-grain defects in multicrystalline silicon wafers in the…”
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    Journal Article Conference Proceeding
  8. 8

    Carbon incorporation process in GaAsN films grown by chemical beam epitaxy using MMHy or DMHy as the N source by Suzuki, H., Nishimura, K., Lee, H.S., Ohshita, Y., Kojima, N., Yamaguchi, M.

    Published in Thin solid films (23-04-2007)
    “…Crystal quality of GaAsN films can be improved by using CBE for low-temperature growth. However, low-temperature growth increases C incorporation in the films,…”
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    Journal Article Conference Proceeding
  9. 9

    Electrical properties of GaAsN film grown by chemical beam epitaxy by Nishimura, K., Suzuki, H., Saito, K., Ohshita, Y., Kojima, N., Yamaguchi, M.

    Published in Physica. B, Condensed matter (15-12-2007)
    “…The local vibrational modes (LVMs) observed by Fourier transform infrared (FTIR) spectroscopy in GaAsN films grown by chemical beam epitaxy (CBE) was studied,…”
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    Journal Article
  10. 10

    Present status and future of crystalline silicon solar cells in Japan by Yamaguchi, M., Ohshita, Y., Arafune, K., Sai, H., Tachibana, M.

    Published in Solar energy (2006)
    “…Crystalline silicon solar cells show promise for further improvement of cell efficiency and cost reduction by developing process technologies for large-area,…”
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    Journal Article
  11. 11

    Characterization of carrier recombination in lattice-mismatched InGaAs solar cells on GaAs substrates by Sasaki, T., Arafune, K., Metzger, W., Romero, M.J., Jones, K., Al-Jassim, M., Ohshita, Y., Yamaguchi, M.

    Published in Solar energy materials and solar cells (01-06-2009)
    “…Effects of thermal annealing on carrier recombination in lattice-mismatched InGaAs solar cells on GaAs substrates were investigated. Thermal annealing to the…”
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    Journal Article Conference Proceeding
  12. 12
  13. 13

    Chemical beam epitaxy of InGaAsN films for multi-junction tandem solar cells by Lee, Hae-Seok, Nishimura, K., Yagi, Y., Tachibana, M., Ekins-Daukes, N.J., Ohshita, Y., Kojima, N., Yamaguchi, M.

    Published in Journal of crystal growth (15-02-2005)
    “…Chemical beam epitaxy (CBE) offers a new growth technique for InGaAsN films that are expected to provide the third cell in an ultra-efficiency 4-junction…”
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    Journal Article
  14. 14

    Effects of thermal cycle annealing on reduction of defect density in lattice-mismatched InGaAs solar cells by Sasaki, T., Arafune, K., Lee, H.S., Ekins-Daukes, N.J., Tanaka, S., Ohshita, Y., Yamaguchi, M.

    Published in Physica. B, Condensed matter (01-04-2006)
    “…Lattice-mismatched In 0.16Ga 0.84As solar cells were grown on GaAs substrates using graded In x Ga 1− x As buffer layers and homogenous In 0.16Ga 0.84As buffer…”
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    Journal Article
  15. 15

    Effects of defects and impurities on minority carrier lifetime in cast-grown polycrystalline silicon by Ohshita, Y., Nishikawa, Y., Tachibana, M., Tuong, V.K., Sasaki, T., Kojima, N., Tanaka, S., Yamaguchi, M.

    Published in Journal of crystal growth (15-02-2005)
    “…The grain size distribution of B-doped cast-grown polycrystalline Si could not explain the minority carrier lifetime map. The lifetime was not mainly…”
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    Journal Article
  16. 16

    Reactants in SiC chemical vapor deposition using CH3SiH3 as a source gas by Ohshita, Y.

    Published in Journal of crystal growth (01-01-1995)
    “…The growth mechanism of SiC CVD using CH3SiH3 (1% CH3SiH3 diluted by 99%H2) as a source gas is studied by the experiment with macro/microcavity method. It is…”
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    Journal Article
  17. 17

    Identification of N-H related defects in GaAsN grown by chemical beam epitaxy by Tanaka, T, Suzuki, H, Kojima, N, Ohshita, Y, Yamaguchi, M

    “…Three infrared active defects in GaAsN grown by chemical beam epitaxy (CBE) are identified as N-H related defects which are determinative of electrical…”
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    Conference Proceeding
  18. 18

    Ni-silicide precursor for gate electrodes by Ishikawa, M., Muramoto, I., Machida, H., Imai, S., Ogura, A., Ohshita, Y.

    Published in Thin solid films (23-04-2007)
    “…Ni-silicide film was deposited at a low temperature of 160 °C by CVD using a Ni(PF 3) 4/Si 3H 8 gas system. Injecting Si 3H 8 during the Ni deposition does not…”
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    Journal Article Conference Proceeding
  19. 19

    Improvement of minority-carrier lifetime in GaAsN grown by chemical beam epitaxy by Honda, T, Inagaki, M, Suzuki, H, Kojima, N, Ohshita, Y, Yamaguchi, M

    “…Minority-carrier lifetime (electron) in p-type GaAsN film is improved by chemical beam epitaxy (CBE) and thermal annealing. Growth rate (GR) in CBE is an…”
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    Conference Proceeding
  20. 20

    Study of GaAsN thin film structures by X-ray reciprocal space mapping for multi-junction solar cell application by Suzuki, H, Kojima, N, Ohshita, Y, Yamaguchi, M

    “…Structural difference between high and low N induced scattering center (SC N ) concentration GaAsN films grown on GaAs substrates has been investigated by…”
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    Conference Proceeding