Search Results - "Ohsawa, Yusuke"
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The Role of Histamine H1 and H4 Receptors in Atopic Dermatitis: From Basic Research to Clinical Study
Published in Allergology International (2014)“…Histamine plays important roles in inflammation and nervous irritability in allergic disorders, including atopic dermatitis (AD). It has been shown to regulate…”
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Pseudoirreversible inhibition elicits persistent efficacy of a sphingosine 1-phosphate receptor 1 antagonist
Published in Nature communications (19-07-2024)“…Sphingosine 1-phosphate receptor 1 (S1PR1), a G protein-coupled receptor, is required for lymphocyte trafficking, and is a promising therapeutic target in…”
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Highly selective and precisely controlled aluminum etching by Ar/HBr/CH3F/O2 gas chemistry
Published in Japanese Journal of Applied Physics (05-03-2014)“…Highly selective and precisely controlled aluminum etching was investigated by using plasma with a new Ar/HBr/CH3F/O2 gas chemistry. Generally, an aluminum…”
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Synthesis of vinyloxazolidinones by palladium-catalyzed CO2-recycling reaction of 4-(benzylamino)-2-butenyl carbonates
Published in Tetrahedron letters (03-12-2007)Get full text
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Palladium-Catalyzed Carbon Dioxide Elimination−Fixation Reaction of 4-Methoxycarbonyloxy-2-buten-1-ols
Published in Journal of organic chemistry (05-03-2004)“…A new type of palladium-catalyzed CO2 recycling reaction using allylic carbonates is described. Reaction of trans-4-methoxycarbonyloxy-2-buten-1-ols in the…”
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Palladium-catalyzed carbon dioxide elimination–fixation reaction of 6-methoxycarbonyloxy-2,4-hexadien-1-ols
Published in Tetrahedron (27-11-2006)“…Cyclic carbonates substituted with 1,3-butadienyl moiety were synthesized by a palladium-catalyzed reaction of dienylic carbonates including a carbon dioxide…”
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Highly selective and precisely controlled aluminum etching by Ar/HBr/CH 3 F/O 2 gas chemistry
Published in Japanese Journal of Applied Physics (01-03-2014)“…Highly selective and precisely controlled aluminum etching was investigated by using plasma with a new Ar/HBr/CH 3 F/O 2 gas chemistry. Generally, an aluminum…”
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Highly selective and precisely controlled aluminum etching by Ar/HBr/CH sub(3)F/O sub(2) gas chemistry
Published in Japanese Journal of Applied Physics (01-01-2014)“…Highly selective and precisely controlled aluminum etching was investigated by using plasma with a new Ar/HBr/CH sub(3)F/O sub(2) gas chemistry. Generally, an…”
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9
High-Quality SiO 2 Film Formation below 400 °C by Plasma Enhanced Chemical Vapor Deposition Using Tetraethoxysilane Source Gas
Published in Japanese Journal of Applied Physics (01-12-2009)Get full text
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Synthesis of vinyloxazolidinones by palladium-catalyzed CO 2-recycling reaction of 4-(benzylamino)-2-butenyl carbonates
Published in Tetrahedron letters (2007)“…A CO 2-recycling reaction using ( E)-4-(benzylamino)-2-butenyl methyl carbonates has been examined and substituted vinyloxazolidinones were obtained via a CO 2…”
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