Search Results - "Ohba, Tomihito"

Predicting synergy in atomic layer etching by Kanarik, Keren J., Tan, Samantha, Yang, Wenbing, Kim, Taeseung, Lill, Thorsten, Kabansky, Alexander, Hudson, Eric A., Ohba, Tomihito, Nojiri, Kazuo, Yu, Jengyi, Wise, Rich, Berry, Ivan L., Pan, Yang, Marks, Jeffrey, Gottscho, Richard A.

“…Atomic layer etching (ALE) is a multistep process used today in manufacturing for removing ultrathin layers of material. In this article, the authors report on…”
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Atomic layer etching of GaN and AlGaN using directional plasma-enhanced approach by Ohba, Tomihito, Yang, Wenbing, Tan, Samantha, Kanarik, Keren J., Nojiri, Kazuo

“…The directional atomic layer etching (ALE) of GaN and AlGaN has been developed. The GaN ALE process consists of cyclic Cl2 plasma chemisorption and Ar ion…”
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Spatial distribution of nonemissive metastables in a two-frequency capacitively coupled plasma in Ar by using a pair of optical emission lines by Ohba, Tomihito, Makabe, Toshiaki

“…When a pair of short- and long-lived excited molecules are coupled with an upper radiative state, it will be possible to derive the number density of the…”
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