Search Results - "ONO, Y. A"

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  1. 1

    First-principles study of atomic wires on a H-terminated Si(100)-(2 × 1) surface by Watanabe, S., Ono, Y.A., Hashizume, T., Wada, Y.

    Published in Surface science (01-10-1997)
    “…The atomic and electronic structures of several atomic wires have been examined using first-principles calculations within the local density functional…”
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    Journal Article Conference Proceeding
  2. 2

    High performance low-temperature poly-Si n-channel TFTs for LCD by Mimura, A., Konishi, N., Ono, K., Ohwada, J.-I., Hosokawa, Y., Ono, Y.A., Suzuki, T., Miyata, K., Kawakami, H.

    Published in IEEE transactions on electron devices (01-02-1989)
    “…High-performance poly-Si TFTs were fabricated by a low-temperature 600 degrees C process utilizing hard glass substrates. To achieve low threshold voltage…”
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    Journal Article
  3. 3

    Accumulation of cell cycle regulatory proteins, p21 and p27, induced after hyperthermia in human glioma cells by Abe, T, Tamiya, T, Ono, Y, Salker, A H, Akiyama, K, Ohmoto, T

    “…It was investigated whether there was a relationship between p53 p21 and p27 induction pathways in the cellular response of glioma cells to hyperthermia. Two…”
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    Journal Article
  4. 4

    Electron Microscopy Study on Magnetic Flux Lines in Superconductors: Memorial to Akira Tonomura by Harada, K., Osakabe, N., Ono, Y. A.

    “…Using electron holography and coherent beam Lorentz microscopy, Akira Tonomura investigated the physics of magnetic flux lines, or vortices, in metal and…”
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    Journal Article
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    Theory of the low-temperature Seebeck coefficient in dilute alloys by Ono, Y. A., Taylor, P. L.

    Published in Physical review. B, Condensed matter (01-01-1980)
    “…The Seebeck coefficient in dilute alloys at low temp. is investigated in a simple model in which free electrons are scattered by a random array of fixed…”
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    Journal Article
  7. 7

    Peripheral circuit integrated poly-Si TFT LCD with gray scale representation by Ohwada, J.-I., Takabatake, M., Ono, Y.A., Mimura, A., Ono, K., Konishi, N.

    Published in IEEE transactions on electron devices (01-09-1989)
    “…A 3.3-in.-diagonal fully integrated low-temperature (<600 degrees C) processed polycrystalline silicon (poly-Si) thin-film transistor (TFT) liquid-crystal…”
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    Journal Article
  8. 8

    Transferred charge in the active layer and EL device characteristics of TFEL cells by ONO, Y. A, KAWAKAMI, H, FUYAMA, M, ONISAWA, K

    Published in Japanese Journal of Applied Physics (01-09-1987)
    “…The relationship between transferred charge in the active layer of a thin-film electroluminescent (TFEL) cell and EL device characteristics has been…”
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    Journal Article
  9. 9

    Theory of the low-temperature Seebeck coefficient in dilute alloys. II. The empty-core pseudopotential calculation by Ono, Y. A.

    Published in Physical review. B, Condensed matter (15-09-1980)
    “…The Seebeck coefficient S in dilute alloys at low temp. is calculated for an impurity scattering potential derived from the empty-core pseudopotential. In the…”
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    Journal Article
  10. 10

    Effects of oxygen in CaS : Eu active layers on emission properties of thin film electroluminescent cells by ABE, Y, ONISAWA, K.-I, ONO, Y. A, HANAZONO, M

    Published in Japanese Journal of Applied Physics (01-08-1990)
    “…CaS:Eu active layers for thin film electroluminescent (TFEL) cells were deposited by the electron beam evaporation method under several partial pressures of…”
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    Journal Article
  11. 11

    MATERIALS FOR FULL-COLOR ELECTROLUMINESCENT DISPLAYS by Ono, Yoshimasa A

    Published in Annual review of materials science (01-08-1997)
    “…New thin-film electroluminescent (EL) materials with blue and broadband emissions recently have been developed that meet the phosphor requirements for…”
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    Journal Article
  12. 12

    White light emitting thin film electroluminescent cells with SrS:Pr,Ce active layer and their application to multicolor electroluminescent devices by ABE, Y, ONISAWA, K, TAMURA, K, NAKAYAMA, T, HANAZONO, M, ONO, Y. A

    Published in Japanese Journal of Applied Physics (01-08-1989)
    “…White light emission with a maximum luminance of 950 cd/m 2 under a 1 kHz sinusoidal wave drive condition was obtained from a SrS:Pr,Ce thin film…”
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    Journal Article
  13. 13

    Electroluminescence in CaO : Eu thin film by ABE, Y, ONISAWA, K.-I, ONO, Y. A, HANAZONO, M

    Published in Japanese Journal of Applied Physics (01-02-1990)
    “…A CaO:Eu thin film electroluminescent (EL) cell was fabricated and its EL characteristics were studied. A sharp emission at 595 nm, a weak emission around 620…”
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    Journal Article
  14. 14
  15. 15

    CMOS circuits for peripheral circuit integrated poly-Si TFT LCDfabricated at low temperature below 600 deg C by Takabatake, M, Ohwada, J, Ono, Y A, Ono, K, Mimura, A, Konishi, N

    Published in IEEE transactions on electron devices (01-06-1991)
    “…CMOS shift registers, buffers, and gray-scale representation circuits for integrated peripheral drive circuits of poly-Si TFT LCDs were fabricated at…”
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    Journal Article
  16. 16

    CMOS circuits for peripheral circuit integrated poly-Si TFT LCD fabricated at low temperature below 600 degree C by Takabatake, M, Ohwada, J-I, Ono, Y A, Ono, K, Mimura, A, Konishi, N

    Published in IEEE transactions on electron devices (01-01-1991)
    “…CMOS shift registers, buffers, and gray-scale representation circuits for integrated peripheral drive circuits of poly-Si TFT LCD's were fabricated at low…”
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    Journal Article
  17. 17

    CMOS circuits for peripheral circuit integrated poly-Si TFT LCD fabricated at low temperature below 600 degrees C by Takabatake, M., Ohwada, J., Ono, Y.A., Ono, K., Mimura, A., Konishi, N.

    Published in IEEE transactions on electron devices (01-06-1991)
    “…CMOS shift registers, buffers, and gray-scale representation circuits for integrated peripheral drive circuits of poly-Si TFT LCDs were fabricated at…”
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    Journal Article
  18. 18
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    High-performance low-temperature poly-Si TFTs for LCD by Mimura, A., Konishi, N., Ono, K., Ohwada, J., Hosokawa, Y., Ono, Y.A., Suzuki, T., Miyata, K., Kawakami, H.

    “…High-performance low-temperature poly-Si TFTs were developed by a 600°C process so that a glass substrate could be utilized. To achieve low threshold voltage…”
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    Conference Proceeding
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