Search Results - "O'Toole, M.M"

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    Linewidth control in projection lithography using a multilayer resist process by O'Toole, M.M., Liu, E.D., Chang, M.S.

    Published in IEEE transactions on electron devices (01-11-1981)
    “…Linewidth control using a tri-layer resist system on wafers with topography is investigated. An absorbing dye is incorporated in the bottom layer to improve…”
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    Journal Article
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    Characterization of positive resist development by O'Toole, M.M., Grande, W.J.

    Published in IEEE electron device letters (01-12-1981)
    “…The development of positive photoresist is assumed to be a surface limited reaction whose development rate is determined by the local inhibitor concentration…”
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    Simulated performance of a contrast-enhancement material by O'Toole, M.M.

    Published in IEEE electron device letters (01-06-1985)
    “…SAMPLE simulations of the performance of the contrast-enhancement material CEM-388 from General Electric were made using measured material parameters. Addition…”
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