PREVAIL e-beam stepper alpha tool
PREVAIL is the high throughput e-beam projection approach to NGL, which IBM is pursuing in cooperation with Nikon as alliance partner. Key lithographic building blocks of the technology have been demonstrated experimentally with a proof-of-concept (POC) system and results have been reported earlier...
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Published in: | Microelectronic engineering Vol. 57; pp. 163 - 172 |
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Main Authors: | , , , , , , , , , , , , , , , , , , , , , , , , , , |
Format: | Journal Article Conference Proceeding |
Language: | English |
Published: |
Amsterdam
Elsevier B.V
01-09-2001
Elsevier Science |
Subjects: | |
Online Access: | Get full text |
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Summary: | PREVAIL is the high throughput e-beam projection approach to NGL, which IBM is pursuing in cooperation with Nikon as alliance partner. Key lithographic building blocks of the technology have been demonstrated experimentally with a proof-of-concept (POC) system and results have been reported earlier at MNE 99 and elsewhere. This paper reports on the implementation of the PREVAIL technology in a production-level e-beam stepper. The architecture and writing strategy of the tool together with design features of the various tool subsystems are described. |
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Bibliography: | SourceType-Scholarly Journals-2 ObjectType-Feature-2 ObjectType-Conference Paper-1 content type line 23 SourceType-Conference Papers & Proceedings-1 ObjectType-Article-3 |
ISSN: | 0167-9317 1873-5568 |
DOI: | 10.1016/S0167-9317(01)00508-1 |