PREVAIL e-beam stepper alpha tool

PREVAIL is the high throughput e-beam projection approach to NGL, which IBM is pursuing in cooperation with Nikon as alliance partner. Key lithographic building blocks of the technology have been demonstrated experimentally with a proof-of-concept (POC) system and results have been reported earlier...

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Published in:Microelectronic engineering Vol. 57; pp. 163 - 172
Main Authors: Pfeiffer, H.C., Dhaliwal, R.S., Golladay, S.D., Doran, S.K., Gordon, M.S., Kendall, R.A., Lieberman, J.E., Pinckney, D.J., Quickle, R.J., Robinson, C.F., Rockrohr, J.D., Stickel, W., Tressler, E.V., Tanimoto, A., Yamaguchi, T., Okamoto, K., Suzuki, K., Miura, T., Okino, T., Kawata, S., Morita, K., Suzuki, S.C., Shimizu, H., Kojima, S., Varnell, G., Novak, W.T., Sogard, M.
Format: Journal Article Conference Proceeding
Language:English
Published: Amsterdam Elsevier B.V 01-09-2001
Elsevier Science
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Summary:PREVAIL is the high throughput e-beam projection approach to NGL, which IBM is pursuing in cooperation with Nikon as alliance partner. Key lithographic building blocks of the technology have been demonstrated experimentally with a proof-of-concept (POC) system and results have been reported earlier at MNE 99 and elsewhere. This paper reports on the implementation of the PREVAIL technology in a production-level e-beam stepper. The architecture and writing strategy of the tool together with design features of the various tool subsystems are described.
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ISSN:0167-9317
1873-5568
DOI:10.1016/S0167-9317(01)00508-1