Search Results - "Nie, Xianglong"

Thermal stability, structural and electrical characteristics of the modulated HfO2/Al2O3 films fabricated by atomic layer deposition by Nie, Xianglong, Ma, Dayan, Ma, Fei, Xu, Kewei

“…Atomic layer deposition is adopted to fabricate HfO 2 /Al 2 O 3 multilayer thin films to study the sub-layer-thickness-dependent thermal stability. The…”
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Thermal stability, structural and electrical characteristics of the modulated HfO.sub.2/Al.sub.2O.sub.3 films fabricated by atomic layer deposition by Nie, Xianglong, Ma, Dayan, Ma, Fei, Xu, Kewei

“…Atomic layer deposition is adopted to fabricate HfO.sub.2/Al.sub.2O.sub.3 multilayer thin films to study the sub-layer-thickness-dependent thermal stability…”
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Thermodynamics and kinetic behaviors of thickness-dependent crystallization in high-k thin films deposited by atomic layer deposition by Nie, Xianglong, Ma, Fei, Ma, Dayan, Xu, Kewei

“…Atomic layer deposition is adopted to prepare HfO2 and Al2O3 high-k thin films. The HfO2 thin films are amorphous at the initial growth stage, but become…”
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Growth mode evolution of hafnium oxide by atomic layer deposition by Nie, Xianglong, Ma, Fei, Ma, Dayan, Xu, Kewei

“…HfO2 thin films were deposited using tetrakis-ethylmethylamido hafnium and H2O as precursors on silicon by atomic layer deposition (ALD). The morphology and…”
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