Search Results - "Niakoula, Dimitra"

Partially Fluorinated, Polyhedral Oligomeric Silsesquioxane-Functionalized (Meth)Acrylate Resists for 193 nm Bilayer Lithography by Douvas, Antonios M, Van Roey, Frieda, Goethals, Mieke, Papadokostaki, Kyriaki G, Yannakopoulou, Konstantina, Niakoula, Dimitra, Gogolides, Evangelos, Argitis, Panagiotis

“…The influence of partial fluorination on the lithographic performance of photoresists based on (meth)acrylate terpolymers containing polyhedral oligomeric…”
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Glass Transition Temperature Monitoring in Bilayer and Patterned Photoresist Films by Niakoula, Dimitra, Raptis, Ioannis, Goustouridis, Dimitrios, Argitis, Panagiotis

“…Monitoring of glass transition temperature in complex lithographic structures using an interferometry based methodology, is demonstrated. The method is applied…”
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Absolute sensitivity calibration of extreme ultraviolet photoresists by Naulleau, Patrick P, Gullikson, Eric M, Aquila, Andrew, George, Simi, Niakoula, Dimitra

“…One of the major challenges facing the commercialization of extreme ultraviolet (EUV) lithography remains simultaneously achieving resist sensitivity,…”
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22-nm Half-pitch extreme ultraviolet node development at the SEMATECH Berkeley microfield exposure tool by Naulleau, Patrick P., Anderson, Christopher N., Chiu, Jerrin, Denham, Paul, George, Simi, Goldberg, Kenneth A., Goldstein, Michael, Hoef, Brian, Hudyma, Russ, Jones, Gideon, Koh, Chawon, Fontaine, Bruno La, Ma, Andy, Montgomery, Warren, Niakoula, Dimitra, Park, Joo-on, Wallow, Tom, Wurm, Stefan

“…Microfield exposure tools continue to play a dominant role in the development of extreme ultraviolet (EUV) resists. Here we present an update on the SEMATECH…”
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Influence of base and PAG on deprotection blur in EUV photoresists and some thoughts on shot noise by Anderson, Christopher N., Naulleau, Patrick P., Niakoula, Dimitra, Hassanein, Elsayed, Brainard, Robert, Gallatin, Gregg, Dean, Kim

“…A contact-hole deprotection blur metric has been used to monitor the deprotection blur of an experimental open platform resist (EH27) as the weight percent of…”
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