Search Results - "Nguyen, Chi Thang"

Thermal atomic layer deposition of metallic Ru using H2O as a reactant by Nguyen, Chi Thang, Yoon, Jaehong, Khan, Rizwan, Shong, Bonggeun, Lee, Han-Bo-Ram

“…Thin Ruthenium (Ru) films were deposited on native SiO2 on Si substrate by thermal atomic layer deposition (ALD) using…”
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Tunable Color Coating of E‑Textiles by Atomic Layer Deposition of Multilayer TiO2/Al2O3 Films by Khan, Mohammad Rizwan, Kim, Hyun Gu, Park, Jong Seo, Shin, Jong Woo, Nguyen, Chi Thang, Lee, Han-Bo-Ram

“…We successfully fabricated a conductive E-textile and color-coated E-textile by depositing multilayer Al2O3/TiO2 on a conductive E-textile through atomic layer…”
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Gradient area-selective deposition for seamless gap-filling in 3D nanostructures through surface chemical reactivity control by Nguyen, Chi Thang, Cho, Eun-Hyoung, Gu, Bonwook, Lee, Sunghee, Kim, Hae-Sung, Park, Jeongwoo, Yu, Neung-Kyung, Shin, Sangwoo, Shong, Bonggeun, Lee, Jeong Yub, Lee, Han-Bo-Ram

“…The integration of bottom-up fabrication techniques and top-down methods can overcome current limits in nanofabrication. For such integration, we propose a…”
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Publisher Correction: Gradient area-selective deposition for seamless gap-filling in 3D nanostructures through surface chemical reactivity control by Nguyen, Chi Thang, Cho, Eun-Hyoung, Gu, Bonwook, Lee, Sunghee, Kim, Hae-Sung, Park, Jeongwoo, Yu, Neung-Kyung, Shin, Sangwoo, Shong, Bonggeun, Lee, Jeong Yub, Lee, Han-Bo-Ram

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Structure and luminescence properties of K2GdF5:Tb3+ synthesized by solid-state reaction method by Vinh, Ha Xuan, Thang, Nguyen Chi, Tien, Doan Phan Thao, Huy, Bui The

“…K 2 GdF 5 : Tb 3 + material used in dosimetry field was synthesized by solid-state reaction method. The scanning electron microscopy image showed that the…”
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Toward Enhanced Humidity Stability of Triboelectric Mechanical Sensors via Atomic Layer Deposition by Kim, Wook, Yasmeen, Sumaira, Nguyen, Chi Thang, Lee, Han-Bo-Ram, Choi, Dukhyun

“…Humid conditions can disrupt the triboelectric signal generation and reduce the accuracy of triboelectric mechanical sensors. This study demonstrates a novel…”
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Promoting lithium electrodeposition towards the bottom of 3-D copper meshes in lithium-based batteries by Kim, Sujung, Kim, Yena, Nguyen, Chi Thang, Jang, Taegyu, Lee, Han-Bo-Ram, Byon, Hye Ryung

“…Porous and three-dimensional (3-D) copper (Cu) current collectors were extensively developed to suppress dendritic lithium (Li) growth. However, they suffer…”
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Area-Selective Atomic Layer Deposition of Ruthenium via Reduction of Interfacial Oxidation by Cho, Eun-Hyoung, Kong, Dabin, Cho, Iaan, Leem, Youngchul, Lee, Young Min, Kim, Miso, Nguyen, Chi Thang, Lee, Jeong Yub, Shong, Bonggeun, Lee, Han-Bo-Ram

“…Achieving atomic-scale precise control over material layering is critical for the development of future semiconductor technology. Area-selective deposition…”
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Computational Modeling of Physical Surface Reactions of Precursors in Atomic Layer Deposition by Monte Carlo Simulations on a Home Desktop Computer by Gu, Bonwook, Le Trinh, Ngoc, Nguyen, Chi Thang, Yasmeen, Sumaira, Gaiji, Houda, Kang, Youngho, Lee, Han-Bo-Ram

“…The continuously increasing demand for miniaturized devices in the semiconductor industry has increased the need for ultrathin films. Atomic layer deposition…”
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Elucidating the Reaction Mechanism of Atomic Layer Deposition of Al2O3 with a Series of Al(CH3)xCl3-x and Al(CyH2y+1)3 Precursors by Oh, Il-Kwon, Sandoval, Tania E, Liu, Tzu-Ling, Richey, Nathaniel E, Nguyen, Chi Thang, Gu, Bonwook, Lee, Han-Bo-Ram, Tonner-Zech, Ralf, Bent, Stacey F

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Atomic Layer Modulation of Multicomponent Thin Films through Combination of Experimental and Theoretical Approaches by Nguyen, Chi Thang, Gu, Bonwook, Cheon, Taehoon, Park, Jeongwoo, Khan, Mohammad Rizwan, Kim, Soo-Hyun, Shong, Bonggeun, Lee, Han-Bo-Ram

“…We proposed the concept of atomic layer modulation (ALM) based on precursor chemical reactivities and steric hindrance effects to fabricate multicomponent…”
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Area-Selective Deposition of Ruthenium Using Homometallic Precursor Inhibitor by Nguyen, Chi Thang, Cho, Eun-Hyoung, Trinh, Ngoc Le, Gu, Bonwook, Lee, Mingyu, Lee, Sunghee, Lee, Jeong-Yub, Kang, Youngho, Lee, Han-Bo-Ram

“…Area-selective deposition (ASD) using a precursor inhibitor (PI) is a promising alternative to self-assembled monolayer inhibitors due to a wide range of…”
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Tunable Color Coating of E-Textiles by Atomic Layer Deposition of Multilayer TiO 2 /Al 2 O 3 Films by Khan, Mohammad Rizwan, Kim, Hyun Gu, Park, Jong Seo, Shin, Jong Woo, Nguyen, Chi Thang, Lee, Han-Bo-Ram

“…We successfully fabricated a conductive E-textile and color-coated E-textile by depositing multilayer Al O /TiO on a conductive E-textile through atomic layer…”
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Elucidating the Reaction Mechanism of Atomic Layer Deposition of Al 2 O 3 with a Series of Al(CH 3 ) x Cl 3- x and Al(C y H 2 y +1 ) 3 Precursors by Oh, Il-Kwon, Sandoval, Tania E, Liu, Tzu-Ling, Richey, Nathaniel E, Nguyen, Chi Thang, Gu, Bonwook, Lee, Han-Bo-Ram, Tonner-Zech, Ralf, Bent, Stacey F

“…The adsorption of metalorganic and metal halide precursors on the SiO surface plays an essential role in thin-film deposition processes such as atomic layer…”
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Structure and luminescence properties of $$\hbox {K}_{{2}}\hbox {GdF}_{{5}}$$ K 2 GdF 5 : $$\hbox {Tb}^{3+}$$ Tb 3 + synthesized by solid-state reaction method by Vinh, Ha Xuan, Thang, Nguyen Chi, Tien, Doan Phan Thao, Huy, Bui The

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Elucidating the Reaction Mechanism of Atomic Layer Deposition of Al2O3 with a Series of Al(CH3) x Cl3–x and Al(C y H2y+1)3 Precursors by Oh, Il-Kwon, Sandoval, Tania E., Liu, Tzu-Ling, Richey, Nathaniel E., Nguyen, Chi Thang, Gu, Bonwook, Lee, Han-Bo-Ram, Tonner-Zech, Ralf, Bent, Stacey F.

“…The adsorption of metalorganic and metal halide precursors on the SiO2 surface plays an essential role in thin-film deposition processes such as atomic layer…”
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Sự tồn tại và tính nửa liên tục trên của nghiệm bài toán cân bằng tách by Trần Ngọc Tâm, Lâm Văn Đầy, Nguyễn Quốc Thanh, Nguyễn Chí Thắng

“…Bài báo xem xét bài toán cân bằng tách. Bằng cách sử dụng bổ đề KKM-Fan, các điều kiện tồn tại cho bài toán cân bằng tách được thiết lập. Khi hàm mục tiêu và…”
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