Compositional mapping of Mo-doped ZnO thin films: Mechanical, nano-surface and ToF-SIMS analyses

•ZnO and Mo-doped ZnO thin films were grown using the spray pyrolysis process.•Obtained films were characterized by GIXRD, ToF-SIMS, AFM,SEM, EDX and XPS techniques.•XPS, EDX and TOF-SIMS analysis confirmed the presence of all the deposited elements over the surface and over the entire film thicknes...

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Bibliographic Details
Published in:	Journal of molecular structure Vol. 1286; p. 135566
Main Authors:	Nebatti, A.E., Zekri, A., Zakaria, Y., Singh, R., Mukherjee, S.K., Kadari, A.S., Guezzoul, M., Khodja, K.D., Amrani, B., Aïssa, B.
Format:	Journal Article
Language:	English
Published:	Elsevier B.V 15-08-2023
Subjects:	Mo-doped ZnO Spray pyrolyse, Vickers micro-hardness ToF-SIMS X-rays photoelectron spectroscopy (XPS) ToF-SIMS X-rays photoelectron spectroscopy (XPS) Spray pyrolyse, Vickers micro-hardness Mo-doped ZnO
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Summary:	•ZnO and Mo-doped ZnO thin films were grown using the spray pyrolysis process.•Obtained films were characterized by GIXRD, ToF-SIMS, AFM,SEM, EDX and XPS techniques.•XPS, EDX and TOF-SIMS analysis confirmed the presence of all the deposited elements over the surface and over the entire film thickness.•The surface roughness of the films is well controlled with respect to the Mo concentration.•Micro-hardness analysis was performed on films as a function of the Mo content. ZnO and Mo-doped ZnO thin films were grown using the spray pyrolysis process with variations in Mo doping concentrations. The films were characterized with a comprehensive compositional analysis, including electron dispersive X-ray (EDX), X-rays photoelectron spectroscopy (XPS), and time-of-flight secondary ion mass spectrometry (ToF-SIMS), along with grazing incidence X-ray diffraction(GIXRD), atomic force microscopy (AFM), scanning electron microscopy (SEM) and UV–Vis spectroscopy to investigate their structural, morphological, optical and chemical compositions. Micro-hardness analysis was performed on films as a function of the Mo content. GIXRD analysis detected the presence of characteristic peaks of ZnO along the (100), (002) and (101) planes. The presence of Zn, O, and Mo in the synthesized samples was revealed by EDX, XPS, and ToF-SIMS results, which matched the experimental values of a pure and Mo:ZnO-x composition. XPS analysis revealed the Mo6+ oxidation state of molybdenum present in Mo:ZnO films. From UV–Vis absorption spectroscopy, the bang gap was observed to increase with Mo content, up 5 at.%, and located in the 3.18 – 3.24 eV interval. These results will be helpful in the synthesis of Mo:ZnO films for relevant applications, including sensing, optoelectronics and antimicrobial.
ISSN:	0022-2860 1872-8014
DOI:	10.1016/j.molstruc.2023.135566