Search Results - "Nealey, Paul. F"

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  1. 1

    Directed self-assembly of block copolymers on chemical patterns: A platform for nanofabrication by Ji, Shengxiang, Wan, Lei, Liu, Chi-Chun, Nealey, Paul F.

    Published in Progress in polymer science (01-03-2016)
    “…Directed self-assembly (DSA) of block copolymers (BCPs) on lithographically defined chemically nanopatterned surfaces (or chemical patterns) combines…”
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  2. 2

    Directed self-assembly of liquid crystalline blue-phases into ideal single-crystals by Martínez-González, Jose A., Li, Xiao, Sadati, Monirosadat, Zhou, Ye, Zhang, Rui, Nealey, Paul F., de Pablo, Juan J.

    Published in Nature communications (16-06-2017)
    “…Chiral nematic liquid crystals are known to form blue phases—liquid states of matter that exhibit ordered cubic arrangements of topological defects. Blue-phase…”
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  3. 3

    Buried Structure in Block Copolymer Films Revealed by Soft X‑ray Reflectivity by Sunday, Daniel F, Thelen, Jacob L, Zhou, Chun, Ren, Jiaxing, Nealey, Paul. F, Kline, R. Joseph

    Published in ACS nano (22-06-2021)
    “…Interactions between polymers and surfaces can be used to influence properties including mechanical performance in nanocomposites, the glass transition…”
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  4. 4

    Block copolymers and conventional lithography by Stoykovich, Mark P., Nealey, Paul F.

    Published in Materials today (Kidlington, England) (01-09-2006)
    “…The lithographic process is arguably the key enabling technology for the digital age. Hundreds of millions of devices can be fabricated on a single chip…”
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  5. 5

    Directed Self-Assembly of Polystyrene‑b‑poly(propylene carbonate) on Chemical Patterns via Thermal Annealing for Next Generation Lithography by Yang, Guan-Wen, Wu, Guang-Peng, Chen, Xuanxuan, Xiong, Shisheng, Arges, Christopher G, Ji, Shengxiang, Nealey, Paul F, Lu, Xiao-Bing, Darensbourg, Donald J, Xu, Zhi-Kang

    Published in Nano letters (08-02-2017)
    “…Directed self-assembly (DSA) of block copolymers (BCPs) combines advantages of conventional photolithography and polymeric materials and shows competence in…”
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  6. 6

    Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly by Ruiz, Ricardo, Kang, Huiman, Detcheverry, François A, Dobisz, Elizabeth, Kercher, Dan S, Albrecht, Thomas R, de Pablo, Juan J, Nealey, Paul F

    “…Self-assembling materials spontaneously form structures at length scales of interest in nanotechnology. In the particular case of block copolymers, the…”
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  7. 7

    Hierarchical patterns of three-dimensional block-copolymer films formed by electrohydrodynamic jet printing and self-assembly by Onses, M. Serdar, Song, Chiho, Williamson, Lance, Sutanto, Erick, Ferreira, Placid M., Alleyne, Andrew G., Nealey, Paul F., Ahn, Heejoon, Rogers, John A.

    Published in Nature nanotechnology (01-09-2013)
    “…Self-assembly of block-copolymers provides a route to the fabrication of small (size, <50 nm) and dense (pitch, <100 nm) features with an accuracy that…”
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  8. 8

    Microscale-Resolution Thermal Mapping Using a Flexible Platform of Patterned Quantum Sensors by Andrich, Paolo, Li, Jiajing, Liu, Xiaoying, Heremans, F. Joseph, Nealey, Paul F., Awschalom, David D.

    Published in Nano letters (08-08-2018)
    “…Temperature sensors with micro- and nanoscale spatial resolution have long been explored for their potential to investigate the details of physical systems at…”
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  9. 9

    Laser Writing Block Copolymer Self-Assembly on Graphene Light-Absorbing Layer by Jin, Hyeong Min, Lee, Seung Hyun, Kim, Ju Young, Son, Seung-Woo, Kim, Bong Hoon, Lee, Hwan Keon, Mun, Jeong Ho, Cha, Seung Keun, Kim, Jun Soo, Nealey, Paul F, Lee, Keon Jae, Kim, Sang Ouk

    Published in ACS nano (22-03-2016)
    “…Recent advance of high-power laser processing allows for rapid, continuous, area-selective material fabrication, typically represented by laser crystallization…”
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  10. 10

    Biophysical cues and cell behavior: the big impact of little things by Gasiorowski, Joshua Z, Murphy, Christopher J, Nealey, Paul F

    Published in Annual review of biomedical engineering (01-01-2013)
    “…The extracellular matrix is composed of a variety of proteins, polysaccharides, and glycosaminoglycans that self-assemble into a hierarchical order of…”
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  11. 11

    Modulation of osteogenic differentiation in hMSCs cells by submicron topographically-patterned ridges and grooves by Watari, Shinya, Hayashi, Kei, Wood, Joshua A, Russell, Paul, Nealey, Paul F, Murphy, Christopher J, Genetos, Damian C

    Published in Biomaterials (01-01-2012)
    “…Abstract Recent studies have shown that nanoscale and submicron topographic cues modulate a menu of fundamental cell behaviors, and the use of topographic cues…”
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  12. 12

    Molecular pathways for defect annihilation in directed self-assembly by Hur, Su-Mi, Thapar, Vikram, Ramírez-Hernández, Abelardo, Khaira, Gurdaman, Segal-Peretz, Tamar, Rincon-Delgadillo, Paulina A., Li, Weihua, Müller, Marcus, Nealey, Paul F., de Pablo, Juan J.

    “…Over the last few years, the directed self-assembly of block copolymers by surface patterns has transitioned from academic curiosity to viable contender for…”
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  13. 13

    Self‐Assembly Behavior of an Oligothiophene‐Based Conjugated Liquid Crystal and Its Implication for Ionic Conductivity Characteristics by Liu, Ziwei, Dong, Ban Xuan, Misra, Mayank, Sun, Yangyang, Strzalka, Joseph, Patel, Shrayesh N., Escobedo, Fernando A., Nealey, Paul F., Ober, Christopher K.

    Published in Advanced functional materials (01-01-2019)
    “…In this work, a joint experimental and computational study on the synthesis, self‐assembly, and ionic conduction characteristics of a new conjugated liquid…”
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  14. 14

    Effect of Composition of Substrate-Modifying Random Copolymers on the Orientation of Symmetric and Asymmetric Diblock Copolymer Domains by Han, Eungnak, Stuen, Karl O, La, Young-Hye, Nealey, Paul F, Gopalan, Padma

    Published in Macromolecules (09-12-2008)
    “…The ability of random copolymer brushes and cross-linked mats to induce the vertical orientation of domains in overlying films of lamellae- and…”
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  15. 15

    Fabrication of Lithographically Defined Chemically Patterned Polymer Brushes and Mats by Liu, Chi-Chun, Han, Eungnak, Onses, M. Serdar, Thode, Christopher J, Ji, Shengxiang, Gopalan, Padma, Nealey, Paul F

    Published in Macromolecules (12-04-2011)
    “…Chemically patterned surfaces comprised of polymer mats and brushes of well-defined chemistry were fabricated at the length scale of 10 nm. A key concept is…”
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  16. 16

    Perpendicularly Aligned, Anion Conducting Nanochannels in Block Copolymer Electrolyte Films by Arges, Christopher G, Kambe, Yu, Suh, Hyo Seon, Ocola, Leonidas E, Nealey, Paul F

    Published in Chemistry of materials (08-03-2016)
    “…Connecting structure and morphology to bulk transport properties, such as ionic conductivity, in nanostructured polymer electrolyte materials is a difficult…”
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  17. 17

    Defect Annihilation Pathways in Directed Assembly of Lamellar Block Copolymer Thin Films by Hur, Su-Mi, Thapar, Vikram, Ramírez-Hernández, Abelardo, Nealey, Paul F, de Pablo, Juan J

    Published in ACS nano (23-10-2018)
    “…Defects in highly ordered self-assembled block copolymers represent an important roadblock toward the adoption of these materials in a wide range of…”
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  18. 18

    Improved block copolymer domain dispersity on chemical patterns via homopolymer-blending and molecular transfer printing by Liu, Guoliang, Nealey, Paul F.

    Published in Polymer (Guilford) (05-05-2017)
    “…Herein we have investigated the domain width distributions of block copolymers and their ternary blends after directed assembly on chemically patterned…”
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  19. 19

    Perpendicular Orientation of Domains in Cylinder-Forming Block Copolymer Thick Films by Controlled Interfacial Interactions by Han, Eungnak, Stuen, Karl O, Leolukman, Melvina, Liu, Chi-Chun, Nealey, Paul F, Gopalan, Padma

    Published in Macromolecules (14-07-2009)
    “…We report the induction of perpendicularly oriented cylindrical domains in PS-b-PMMA block copolymer (BCP) films thicker than 100 nm by thermally annealing on…”
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  20. 20

    Directed Self-Assembly of Block Copolymers for Nanolithography: Fabrication of Isolated Features and Essential Integrated Circuit Geometries by Stoykovich, Mark P., Kang, Huiman, Daoulas, Kostas Ch, Liu, Guoliang, Liu, Chi-Chun, de Pablo, Juan J., Müller, Marcus, Nealey, Paul F.

    Published in ACS nano (01-10-2007)
    “…Self-assembling block copolymers are of interest for nanomanufacturing due to the ability to realize sub-100 nm dimensions, thermodynamic control over the size…”
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